Method and apparatus for creating perfect microwave absorbing skins

US9961812B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9961812-B2
Application numberUS-201414216768-A
CountryUS
Kind codeB2
Filing dateMar 17, 2014
Priority dateMar 15, 2013
Publication dateMay 1, 2018
Grant dateMay 1, 2018

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method and apparatus for producing a radio frequency absorber (RFA) or perfect microwave absorber (PMA) skin is described herein. A metamaterial layer may be applied to a low dielectric substrate. Resistive and capacitive components may then be added to the metamaterial layer. The metamaterial layer may then be formed into an RFA or PMA skin, which may then be applied to a multi-layered assembly for absorption of electromagnetic radiation in a frequency range such as the microwave frequency spectrum in a final product including but limited to cell phones, communication devices, or other electronic devices.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for producing a radio frequency absorber (RFA) skin, the method comprising: applying a metamaterial, wherein the metamaterial includes an all-dielectric material having a first dielectric constant, to a substrate with a second dielectric constant to create a metamaterial layer; adding resistive components to the metamaterial layer; adding capacitive components to the metamaterial layer; processing the metamaterial layer into a RFA skin; and applying the RFA skin in a plurality of layers to an assembly for absorption of electromagnetic radiation in a targeted frequency range. 2. The method of claim 1 , wherein Gravure printing is used to apply the metamaterial to the substrate. 3. The method of claim 1 , wherein pad printing is used to apply the metamaterial to the substrate. 4. The method of claim 1 , wherein direct write, dip-pen nanolithography (DPN) or e-jet printing is used to apply the metamaterial to the substrate. 5. The method of claim 1 , wherein the targeted frequency range is a microwave frequency range. 6. The method of claim 1 , wherein the plurality of layers are thermoformed into a single sub-assembly prior to inclusion in the assembly. 7. The method of claim 1 , wherein the substrate includes spheres with unequal dielectric constants dispersed uniformly within a matrix, wherein the dielectric constant of the matrix is at least two orders of magnitude smaller than the dielectric constant of the spheres. 8. The method of claim 7 , wherein the matrix and spheres are used in an overmold for cable connectors. 9. The method of claim 7 , wherein the matrix and spheres are used in a thermoset cable covering for a group of cables. 10. The method of claim 7 , wherein the matrix and spheres are used in a planar sheet in an EMI absorbant layer in the assembly. 11. The method of claim 7 , wherein the spheres have different radii. 12. A radio frequency absorber (RFA) skin, prepared by a process comprising the steps of: applying a metamaterial, wherein the metamaterial includes an all-dielectric material having a first dielectric constant, to a substrate with a second dielectric constant to create a metamaterial layer; adding resistive components to the metamaterial layer; adding capacitive components to the metamaterial layer; processing the metamaterial layer into a RFA skin; and applying the RFA skin in a plurality of layers to an assembly for absorption of electromagnetic radiation in a targeted frequency range. 13. The RFA skin of claim 12 , wherein Gravure printing is used to apply the metamaterial to the substrate. 14. The RFA skin of claim 12 , wherein pad printing is used to apply the metamaterial to the substrate. 15. The RFA skin of claim 12 , wherein direct write, dip-pen nanolithography (DPN) or e-jet printing is used to apply the metamaterial to the substrate. 16. The RFA skin of claim 12 , wherein the targeted frequency range is a microwave frequency range. 17. The RFA skin of claim 12 , wherein the plurality of layers are thermoformed into a single sub-assembly prior to inclusion in the assembly. 18. The RFA skin of claim 12 , wherein the substrate includes spheres with unequal dielectric constants dispersed uniformly within a matrix, wherein the dielectric constant of the matrix is at least two orders of magnitude smaller than the dielectric constant of the spheres. 19. The RFA skin of claim 18 , wherein the spheres have different radii. 20. A method for producing a perfect microwave absorber (PMA) skin, the method comprising: printing a metamaterial, wherein the metamaterial includes an all-dielectric material having a first dielectric constant, on a substrate with a second dielectric constant to create a metamaterial layer; adding resistive components to the metamaterial layer; adding capacitive components to the metamaterial layer; processing the metamaterial layer into a PMA skin; and applying the PMA skin in a plurality of layers to an assembly for absorption of electromagnetic radiation in a microwave frequency range.

Assignees

Inventors

Classifications

  • H01Q17/002Primary

    using short elongated elements as dissipative material, e.g. metallic threads or flake-like particles · CPC title

  • Antistatic or EM shielding layer · CPC title

  • Devices for absorbing waves radiated from an antenna; Combinations of such devices with active antenna elements or systems · CPC title

  • Magnetic materials · CPC title

  • with permanent bending or reshaping or surface deformation of self sustaining lamina · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9961812B2 cover?
A method and apparatus for producing a radio frequency absorber (RFA) or perfect microwave absorber (PMA) skin is described herein. A metamaterial layer may be applied to a low dielectric substrate. Resistive and capacitive components may then be added to the metamaterial layer. The metamaterial layer may then be formed into an RFA or PMA skin, which may then be applied to a multi-layered assem…
Who is the assignee on this patent?
Flextronics Ap Llc
What technology area does this patent fall under?
Primary CPC classification H01Q17/002. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 01 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).