Method of producing cured product and method of forming pattern

Patent metadata

Field	Value
Publication number	US-9961776-B2
Application number	US-201214366250-A
Country	US
Kind code	B2
Filing date	Dec 12, 2012
Priority date	Dec 19, 2011
Publication date	May 1, 2018
Grant date	May 1, 2018

Abstract

The present invention provides a photo-curable composition that requires a small mold-releasing force in a method of producing a cured product and also provides a method of producing a cured product with a small mold-releasing force. The method of producing a cured product includes applying a photo-curable composition onto a base material; pressing a mold to the photo-curable composition to form a pattern in the photo-curable composition; irradiating the photo-curable composition provided with the pattern with first light to generate a cured product having the pattern; and releasing the mold from the cured product, wherein a gas-generating region is formed from a gas-generating agent between the cured product and the mold; the gas-generating region is irradiated with second light to generate a gas in the gas-generating region; and the mold is released from the cured product after the generation of the gas or simultaneously with the generation of the gas.

First claim

The invention claimed is:

1. A method of producing a circuit board, comprising:
applying a photo-curable composition onto a substrate to be processed;
pressing a mold to the photo-curable composition to form a pattern in the photo-curable composition;
irradiating the photo-curable composition provided with the pattern with first light to generate a cured product having the pattern;
forming a gas-generating region from a gas-generating agent between the cured product and the mold;
irradiating the gas-generating region with second light to generate a gas in the gas-generating region;
releasing the mold from the cured product after the generation of the gas or simultaneously with the generation of the gas; and
forming a circuit structure on the substrate to be processed on the basis of the pattern of the cured product,
wherein the gas-generating agent is a surfactant having a functional group for generating a gas.

2. The method of producing a circuit board according to claim 1 , wherein the circuit board is a semiconductor device.

3. A method of producing a cured product having a pattern of protrusions and depressions, comprising:
applying a photo-curable composition onto a base material;
bringing a mold having protrusions and depressions on its surface into contact with the photo-curable composition to form a pattern reversely corresponding to the protrusions and depressions of the mold in the photo-curable composition;
irradiating the photo-curable composition provided with the pattern with first light to generate a cured product having the pattern; and
releasing the mold from the cured product, wherein
a gas-generating region is formed from a gas-generating agent between the cured product and the mold;
the gas-generating region is irradiated with second light to generate a gas in the gas-generating region;
the mold is released from the cured product after the generation of the gas or simultaneously with the generation of the gas; and
the gas-generating agent is a fluorine-containing surfactant having a functional group for generating a gas.

4. The method of producing a cured product according to claim 3 , wherein the first light and the second light are different types from each other.

5. The method of producing a cured product according to claim 3 , wherein the irradiation with second light is performed after the irradiation with first light.

6. The method of producing a cured product according to claim 3 , wherein the mold is released from the cured product with a weaker peeling force than that necessary for releasing the mold from the cured product when the gas-generating region is not present.

7. A method of forming a pattern of protrusions and depressions in a cured product, comprising
applying a photo-curable composition onto a base material;
bringing a mold having protrusions and depressions on its surface into contact with the photo-curable composition to form a pattern reversely corresponding to the protrusions and depressions of the mold in the photo-curable composition;
irradiating the photo-curable composition provided with the pattern with first light to generate a cured product having the pattern; and
releasing the mold from the cured product, wherein
a gas-generating region is formed from a gas-generating agent between the cured product and the mold;
the gas-generating region is irradiated with second light to generate a gas in the gas-generating region;
the mold is released from the cured product after the generation of the gas or simultaneously with the generation of the gas; and
the gas-generating agent is a surfactant having a functional group for generating a gas, and the gas-generating region comprises a photocatalyst.

Assignees

• Canon Kk

Inventors

• Suzuki Tatsuya
• Ito Toshiki
• Mihara Chieko

Classifications

• H10P50/695 Primary

  characterised by the process involved to create the mask, e.g. lift-off masks or sidewalls or to modify the mask · CPC title

• H05K2203/0502

  Patterning and lithography · CPC title

• H01L21/3086

  Electricity · mapped topic

• H05K3/00 Primary

  Apparatus or processes for manufacturing printed circuits · CPC title

• G03F7/0002

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title