Cold-matter system having ion pump integrated with channel cell

US9960025B1 · US · B1

Patent metadata
FieldValue
Publication numberUS-9960025-B1
Application numberUS-201414538568-A
CountryUS
Kind codeB1
Filing dateNov 11, 2014
Priority dateNov 11, 2013
Publication dateMay 1, 2018
Grant dateMay 1, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A cold-atom cell is formed by machining a block of silicon to define sites for an atom source chamber, an atom manipulation chamber, and an ion-pump chamber. A polished silicon panel is frit-bonded to an unpolished (due to machining) chamber wall (which would be difficult and costly to polish). The polished panel can then serve as a reflector or a sight for anodic bonding. A solid-phase atom source provides for vapor phase atoms in the source chamber. The source chamber also includes carbon and gold to regulate the atom pressure by sorbing and desorbing thermal atoms. The atom manipulation chamber includes components for magneto-optical trap and an atom chip, e.g., for forming a Bose-Einstein condensate. The ion-pump chamber serves as the site for an ion pump. By integrating the ion pump into the body of the cold-atom cell, a more compact, reliable, and robust cold-atom cell is achieved. In addition to the embodiment just described, several variations and alternatives are presented and within the scope of the claims.

First claim

Opening claim text (preview).

What is claimed is: 1. A cold-particle method comprising: releasing particles from a solid phase to a vapor phase, the releasing occurring within the bounds of a monolithic block of GCC material from which GCC material has been removed to form sites and channels, the GCC material consisting essentially of glass, ceramic, or crystalline material; regulating an amount of atoms in vapor phase using at least one material that sorbs and desorbs the particles; cooling the particles using at least one magneto-optical trap located within the bounds of the monolithic block; and sorbing at least some particles using a Penning trap of an ion pump, the Penning trap extending at least part way through the bounds of the monolithic block. 2. A cold-particle method as recited in claim 1 wherein the particles are alkali-metal atoms and the material that sorbs and desorbs the particles includes at least one of carbon, gold, bismuth, and antimony. 3. A cold-particle method as recited in claim 1 further comprising ushering the particles from a chamber containing the solid phase through an aperture of polished panel frit-bonded to an unpolished GCC wall through a channel coated with getter material and into a chamber including the magneto-optical trap. 4. A cold-particle method as recited in claim 3 further comprising opening a pump-out conductance channel to the ion pump from the chamber containing the solid phase, pumping out the chamber containing the solid phase, and closing the pump-out conductance channel.

Assignees

Inventors

Classifications

  • F04B37/14Primary

    to obtain high vacuum · CPC title

  • F04B37/04Primary

    Selection of specific absorption or adsorption materials · CPC title

  • H01J41/12Primary

    Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps · CPC title

  • using gettering substances · CPC title

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What does patent US9960025B1 cover?
A cold-atom cell is formed by machining a block of silicon to define sites for an atom source chamber, an atom manipulation chamber, and an ion-pump chamber. A polished silicon panel is frit-bonded to an unpolished (due to machining) chamber wall (which would be difficult and costly to polish). The polished panel can then serve as a reflector or a sight for anodic bonding. A solid-phase atom so…
Who is the assignee on this patent?
Coldquanta Inc, Coldquanta Inc
What technology area does this patent fall under?
Primary CPC classification F04B37/14. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue May 01 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).