Electron beam irradiation device

US9960007B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9960007-B2
Application numberUS-201615251554-A
CountryUS
Kind codeB2
Filing dateAug 30, 2016
Priority dateSep 11, 2015
Publication dateMay 1, 2018
Grant dateMay 1, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An electron beam irradiation device includes a stage, a main body unit, and a first mechanism. The main body unit includes a substrate, first members, and a first layer. The first members are arranged to be separated in a second direction intersecting a first direction and is provided at a first surface of the substrate opposing the stage. The first layer is provided between the stage and the first members and between the stage and the substrate. The first layer converts a light ray into an electron beam. The first mechanism is provided in the stage and moves the stage in the second direction. A distance of the movement is not less than a spacing between a center in the second direction of the first member and a center in the second direction of one other first member adjacent to the first member.

First claim

Opening claim text (preview).

What is claimed is: 1. An electron beam irradiation device, comprising: a stage to support an irradiation object to be placed thereon; a main body unit provided above the stage, the main body unit including a substrate to transmit a light ray, a plurality of first members arranged to be separated from each other in a second direction and provided at a first surface of the substrate opposing the stage so as to generate surface plasmon resonance when the light ray is transmitted through the substrate, the second direction intersecting a first direction, the first direction being from the stage toward the substrate, and a first layer provided between the stage and the plurality of first members and between the stage and the substrate, the first layer converting the light ray into an electron beam for irradiating the irradiation object; and a first mechanism provided in at least one of the stage or the main body unit, the first mechanism moving at least one of the stage or the main body unit relatively in the second direction, a distance of the movement being not less than a spacing between a center in the second direction of the first member and a center in the second direction of one other first member adjacent to the first member. 2. The device according to claim 1 , wherein the first mechanism repeats the movement with a first axis along the first direction as a center. 3. The device according to claim 1 , wherein the spacing is 2 micrometers or less. 4. The device according to claim 1 , wherein a wavelength of the light ray is not less than 100 nanometers and not more than 400 nanometers. 5. The device according to claim 1 , wherein the substrate has an upper surface, and the light ray enters from the upper surface. 6. The device according to claim 1 , wherein the first member includes at least one selected from the group consisting of gold, silver, titanium, aluminum, and chrome. 7. The device according to claim 1 , wherein the first layer includes at least one of gold or ruthenium. 8. An electron beam irradiation device, comprising: a stage to support an irradiation object to be placed thereon; a main body unit provided above the stage, the main body unit including a substrate to transmit a light ray, a plurality of first members arranged to be separated from each other in a second direction and provided at a first surface of the substrate opposing the stage so as to generate surface plasmon resonance when the light ray is transmitted through the substrate, the second direction intersecting a first direction, the first direction being from the stage toward the substrate, and a first layer provided between the stage and the plurality of first members and between the stage and the substrate, the first layer converting the light ray into an electron beam for irradiating the irradiation object; and a first mechanism provided between the stage and the main body unit, the first mechanism changing a direction of the electron beam by generating a magnetic field or an electric field. 9. The device according to claim 8 , wherein the first mechanism includes a first electron lens unit and a second electron lens unit, the electron beam being incident on the first electron lens unit, the second electron lens unit being provided between the first electron lens unit and the stage, and a focal point of the electron beam is positioned between the first electron lens unit and the second electron lens unit. 10. The device according to claim 8 , wherein a wavelength of the light ray is not less than 100 nanometers and not more than 400 nanometers. 11. An electron beam irradiation device, comprising: a stage to support an irradiation object to be placed thereon; a main body unit provided above the stage, the main body unit including a substrate to transmit a light ray, a plurality of first members arranged to be separated from each other in a second direction and provided at a first surface of the substrate opposing the stage so as to generate surface plasmon resonance when the light ray is transmitted through the substrate, the second direction intersecting a first direction, the first direction being from the stage toward the substrate, and a first layer provided between the stage and the plurality of first members and between the stage and the substrate, the first layer converting the light ray into an electron beam for irradiating the irradiation object; and a first mechanism provided in at least one of the stage or the main body unit, the first mechanism moving at least one of the stage or the main body unit relatively in the second direction. 12. The device according to claim 11 , wherein a length along the second direction of the main body unit is shorter than a length along the second direction of the stage. 13. The device according to claim 11 , further comprising a second mechanism provided between the main body unit and the stage, the second mechanism changing a direction of the electron beam by generating a magnetic field or an electric field. 14. The device according to claim 11 , wherein a wavelength of the light ray is not less than 100 nanometers and not more than 400 nanometers. 15. An electron beam irradiation device, comprising: a stage to support an irradiation object to be placed thereon; a main body unit provided above the stage, the main body unit including a substrate to transmit a light ray, a plurality of first members arranged to be separated from each other in a second direction and provided at a first surface of the substrate opposing the stage so as to generate surface plasmon resonance when the light ray is transmitted through the substrate, the second direction intersecting a first direction, the first direction being from the stage toward the substrate, and a first layer provided between the stage and the plurality of first members and between the stage and the substrate, the first layer converting the light ray into an electron beam for irradiating the irradiation object; and a first mechanism provided between the stage and the main body unit, the first mechanism moving an irradiation position of the electron beam in the second direction by deflecting the electron beam, a distance of the movement being not less than a spacing between a center in the second direction of the first member and a center in the second direction of one other first member adjacent to the first member. 16. The device according to claim 15 , wherein the first mechanism repeats the movement with a first axis along the first direction as a center. 17. The device according to claim 15 , further comprising a second mechanism provided between the first mechanism and the main body unit, the second mechanism changing a direction of the electron beam by generating a magnetic field or an electric field. 18. The device according to claim 15 , wherein the spacing is 2 micrometers or less. 19. The device according to claim 15 , wherein a wavelength of the light ray is not less than 100 nanometers and not more than 400 nanometers.

Assignees

Inventors

Classifications

  • Movement · CPC title

  • H01J37/073Primary

    Electron guns using field emission, photo emission, or secondary emission electron sources · CPC title

  • Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support · CPC title

  • G21K5/04Primary

    with beam-forming means · CPC title

  • Discharge tubes with provision for emergence of electrons or ions from the vessel ({irradiation devices G21K} ; particle accelerators H05H); Lenard tubes · CPC title

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What does patent US9960007B2 cover?
An electron beam irradiation device includes a stage, a main body unit, and a first mechanism. The main body unit includes a substrate, first members, and a first layer. The first members are arranged to be separated in a second direction intersecting a first direction and is provided at a first surface of the substrate opposing the stage. The first layer is provided between the stage and the f…
Who is the assignee on this patent?
Toshiba Memory Corp
What technology area does this patent fall under?
Primary CPC classification H01J37/073. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 01 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).