Green laser line notch absorber

Patent metadata

Field	Value
Publication number	US-9958583-B1
Application number	US-201414278965-A
Country	US
Kind code	B1
Filing date	May 15, 2014
Priority date	May 15, 2014
Publication date	May 1, 2018
Grant date	May 1, 2018

Abstract

An optical notch filter includes a particle layer including nano-particles in a substrate material. The nano-particles are arranged in one or more arrays to provide a nano plasmonic absorption of radiation having a wavelength of 532 nm incident on the filter. The filter exhibits a radiation absorption profile with an absorption maxima of at least 99% at 532 nm for an angle of incidence of between +50° and −50°, and has a full width half maxima transmission of less than 15 nm.

First claim

What is claimed is:

1. An optical notch filter, comprising:
a particle layer including nano-particles in a substrate material,
wherein the nano-particles are arranged in one or more arrays having a checkerboard grid pattern and having a fixed spacing between the nano-particles to provide a nano plasmonic absorption of radiation having a wavelength of 532 nm incident on the filter, the checkerboard grid pattern comprising a first group of nano-particles extending along a vertical direction and arranged in vertical lines and a second group of nano-particles extending along a horizontal direction and arranged in horizontal lines, the filter exhibiting a radiation absorption profile with an absorption maxima of at least 99% at 532 nm for an angle of incidence of between +50° and −50°, and having a full width half maxima transmission of less than 15 nm.

2. The optical notch filter of claim 1 , wherein the nano-particles are formed of an Al material.

3. The optical notch filter of claim 1 , wherein the substrate material is formed of an insulating material.

4. The optical notch filter of claim 3 , wherein the substrate material is formed of at least one of a glass material and a polymer material.

5. The optical notch filter of claim 1 , wherein the filter exhibits the radiation absorption profile with the absorption maxima of at least 99.9% at 532 nm for the angle of incidence of between +50° and −50°.

6. The optical notch filter of claim 1 , wherein the filter is insensitive to a polarization of radiation incident on the filter.

7. The optical notch filter of claim 1 , wherein the particle layer comprises a plurality of sublayers, each sublayer including nano-particles arranged in an array in the substrate material.

8. The optical notch filter of claim 7 , wherein a number of sublayers is in a range of 5 to 25.

9. The optical notch filter of claim 8 , wherein the number of sublayers is in a range of 10 to 15.

10. An optical system comprising:
the optical notch filter of claim 1 ; and
a support holding the optical notch filter.

11. The optical system of claim 10 , wherein the optical system is a protective visor or protective eyewear.

12. The optical notch filter of claim 1 , wherein the one or more arrays is a single array.

13. An optical notch filter, comprising:
a particle layer including nano-particles in a substrate material,
wherein the nano-particles are arranged in one or more arrays having a checkerboard grid pattern and having a fixed spacing between the nano-particles to provide a nano plasmonic absorption of radiation having a wavelength of 532 nm incident on the filter, the checkerboard grid pattern comprising a first group of nano-particles extending along a vertical direction and arranged in vertical lines and a second group of nano-particles extending along a horizontal direction and arranged in horizontal lines,
wherein the filter exhibits a radiation absorption profile with an absorption maxima of at least 99% at 532 nm for an angle of incidence of between +60° and −60°, and has a full width half maxima transmission of less than 15 nm.

14. An optical notch filter, comprising:
a particle layer including nano-particles in a substrate material,
wherein the nano-particles are arranged in one or more arrays having a checkerboard grid pattern and having a fixed spacing between the nano-particles to provide a nano plasmonic absorption of radiation having a wavelength in a visible region incident on the filter, the checkerboard grid pattern comprising a first group of nano-particles extending along a vertical direction and arranged in vertical lines and a second group of nano-particles extending along a horizontal direction and arranged in horizontal lines, the filter exhibiting a radiation absorption profile with an absorption maxima of at least 99% at a wavelength in the visible region for an angle of incidence of between +50° and −50°, and having a full width half maxima transmission of less than 15 nm.

Assignees

• Brown Robert G
• Koenck Steven E
• Melzer James E
• Hendrick Wyatt L
• Rockwell Collins Inc

Inventors

• Brown Robert G
• Koenck Steven E
• Melzer James E
• Hendrick Wyatt L

Classifications

• G02B5/206 Primary

  comprising particles embedded in a solid matrix · CPC title

• G02B5/22

  Absorbing filters {(G02B5/201 - G02B5/208 take precedence)} · CPC title

• B82Y20/00

  Nanooptics, e.g. quantum optics or photonic crystals · CPC title

• Y10S977/834

  Optical properties of nanomaterial, e.g. specified transparency, opacity, or index of refraction · CPC title

• Y10S977/773

  Nanoparticle, i.e. structure having three dimensions of 100 nm or less · CPC title