Enhanced voltage standing wave ratio measurement
US-9461755-B2 · Oct 4, 2016 · US
US9958524B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9958524-B2 |
| Application number | US-201514737229-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 11, 2015 |
| Priority date | Jun 11, 2015 |
| Publication date | May 1, 2018 |
| Grant date | May 1, 2018 |
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A probe calibration device that includes a first offset element having a substantially rectangular first aperture. The probe calibration device includes a tuned pass element disposed adjacent to the first offset element. The tuned pass element has a non-rectangular second aperture. The probe calibration device includes a second offset element disposed adjacent to the tuned pass element and on a side opposite the first offset element. The second offset element has a substantially rectangular third aperture. The probe calibration device includes a backing element disposed adjacent to the second offset element. The first offset element, the tuned pass element, the second offset element and the backing element form a cavity.
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What is claimed is: 1. A probe calibration device comprising: a first offset element having a substantially rectangular first aperture; a tuned pass element distinct from the first offset element and disposed adjacent to the first offset element, the tuned pass element including a non-rectangular second aperture; a second offset element distinct from the tuned pass element and disposed adjacent to the tuned pass element and on a side opposite the first offset element, the second offset element having a substantially rectangular third aperture; and a backing element disposed adjacent to the second offset element, wherein the first offset element, the tuned pass element, the second offset element and the backing element form a probe calibration cavity that is closed off by the backing element, the probe calibration cavity dimensioned to provide a target electromagnetic response. 2. The probe calibration device of claim 1 , wherein a cross-sectional shape of the first aperture has substantially same dimensions as a cross-sectional shape of the third aperture. 3. The probe calibration device of claim 1 , wherein the first offset element and the second offset element have different thicknesses. 4. The probe calibration device of claim 1 , wherein a shape of the second aperture corresponds to two overlapping congruent right triangles. 5. The probe calibration device of claim 1 , wherein a first edge of the second aperture is aligned with a first edge of the first aperture, and wherein the first edge of the second aperture is aligned with a first edge of the third aperture. 6. The probe calibration device of claim 1 , wherein at least one of the first offset element, the tuned pass element, the second offset element, or the backing element includes metal. 7. The probe calibration device of claim 1 , further comprising: a guide section configured to align the first offset element, the tuned pass element, the second offset element, and the backing element; a first outer body section; and a second outer body section configured to couple to the first outer body section, wherein the first outer body section and the second outer body section, when coupled, at least partially enclose the guide section, the first offset element, the tuned pass element, and the second offset element. 8. The probe calibration device of claim 7 , wherein the first outer body section is dimensioned and configured to receive the guide section. 9. The probe calibration device of claim 7 , wherein the guide section includes a slot along an interior surface, wherein the first offset element includes a protrusion along an outer surface, wherein the tuned pass element includes a protrusion along an outer surface, wherein the second offset element includes a protrusion along an outer surface, wherein the backing element includes a protrusion along an outer surface, and wherein the protrusions of the first offset element, the tuned pass element, the second offset element, and the backing element intersect and are dimensioned and configured to fit into the slot of the guide section. 10. A method of calibrating a probe, the method comprising: applying energy to a probe coupled to a calibration device, the calibration device comprising: a first offset element having a substantially rectangular first aperture; a tuned pass element distinct from the first offset element and disposed adjacent to the first offset element, the tuned pass element including a non-rectangular second aperture; a second offset element distinct from the tuned pass element and disposed adjacent to the tuned pass element and on a side opposite the first offset element, the second offset element having a substantially rectangular third aperture; and a backing element disposed adjacent to the second offset element, wherein the first offset element, the tuned pass element, the second offset element and the backing element form a cavity; and measuring electromagnetic energy returned by the probe in response to application of the energy to the probe when the probe is coupled to the calibration device. 11. The method of claim 10 , further comprising controlling a frequency of a null of the electromagnetic energy returned by the probe and a magnitude of the electromagnetic energy returned by the probe at the frequency of the null based on dimensions of the cavity. 12. The method of claim 10 , further comprising controlling a frequency of a null of the electromagnetic energy returned by the probe and a magnitude of the electromagnetic energy returned by the probe at the frequency of the null based on a size of the second aperture of the tuned pass element and based on a thickness of the first offset element, the second offset element, or both. 13. The method of claim 10 , wherein measuring the electromagnetic energy returned by the probe comprises measuring a plurality of electromagnetic responses of the probe when the probe is coupled to the calibration device, wherein each of the plurality of electromagnetic responses is measured using a different thickness of the first offset element, a different size of the second aperture of the tuned pass element, a different thickness of the second offset element, or a combination thereof. 14. A method of manufacturing a calibration device, the method comprising: obtaining: a first offset element having a substantially rectangular first aperture; a tuned pass element distinct from the first offset element and including a non-rectangular second aperture; a second offset element distinct from the tuned pass element and having a substantially rectangular third aperture; and a backing element; and assembling the first offset element, the tuned pass element, the second offset element, and the backing element such that the tuned pass element is adjacent to the first offset element and the second offset element and such that the backing element is disposed adjacent to the second offset element, wherein the first offset element, the tuned pass element, the second offset element and the backing element form a probe calibration cavity that is closed off by the backing element, the probe calibration cavity dimensioned to provide a target electromagnetic response. 15. The method of claim 14 , wherein a cross-sectional shape of the first aperture has substantially same dimensions as a cross-sectional shape of the second aperture. 16. The method of claim 14 , wherein edges of the first aperture and edges of the second aperture are aligned. 17. The method of claim 14 , wherein the first offset element and the second offset element have different thicknesses. 18. The method of claim 14 , wherein the first offset element, the tuned pass element, and the second offset element are fabricated using electrical discharge machining (EDM). 19. The method of claim 14 , wherein at least one of the first offset element, the tuned pass element, the second offset element, or the backing element includes metal. 20. The method of claim 14 , where the first offset element, the tuned pass element, the second offset element, and the backing element are formed of metal.
High frequency probes · CPC title
Calibration or calibration artifacts (G01B3/30, G01B9/02072 take precedence) · CPC title
Calibrating; Standards or reference devices, e.g. voltage or resistance standards, "golden" references (G01R33/0035, G01R35/002 take precedence) · CPC title
Measuring reflection coefficients; Measuring standing-wave ratio · CPC title
Transitions between hollow waveguides of different shape, e.g. between a rectangular and a circular waveguide · CPC title
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