Array substrate and manufacturing method thereof
US-12185597-B2 · Dec 31, 2024 · US
US9953870B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9953870-B2 |
| Application number | US-201715488514-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 16, 2017 |
| Priority date | Jun 28, 2011 |
| Publication date | Apr 24, 2018 |
| Grant date | Apr 24, 2018 |
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A 3D integrated circuit device, including: a first transistor; a second transistor; and a third transistor, where the third transistor is overlaying the second transistor and the third transistor is controlled by a third control line, where the second transistor is overlaying the first transistor and the second transistor is controlled by a second control line, where the first transistor is part of a control circuit controlling the second control line and the third control line, and where the second transistor and the third transistor are self-aligned.
Opening claim text (preview).
What is claimed is: 1. A 3D integrated circuit device, comprising: a first transistor; a second transistor; and a third transistor, wherein said third transistor is overlaying said second transistor and said third transistor is controlled by a third control line, wherein said second transistor is overlaying said first transistor and said second transistor is controlled by a second control line, wherein said first transistor is part of a control circuit controlling said second control line and said third control line, wherein said second transistor and said third transistor are self-aligned. 2. The device according to claim 1 , wherein said second transistor is aligned to said first transistor with less than 100 nm and greater than 5 nm misalignment. 3. The device according to claim 1 , further comprising: a third memory cell comprising said third transistor; a second memory cell comprising said second transistor; and memory periphery circuits comprising said first transistor, wherein said memory periphery circuits control at least said third memory cell and second memory cell. 4. The device according to claim 1 , wherein said second transistor is connected to said third transistor with an ohmic connection. 5. The device according to claim 1 , wherein said second transistor is a junction-less transistor. 6. The device according to claim 1 , wherein said second transistor comprises a schottky barrier. 7. The device according to claim 1 , wherein said second transistor comprises a second source and a second drain, wherein said third transistor comprises a third source and a third drain, wherein said second source is connected to said third source and said second drain is connected to said third drain, each with an ohmic connection. 8. A 3D integrated circuit device, comprising: a first transistor; a second transistor; and a third transistor, wherein said third transistor is overlaying said second transistor and said third transistor is controlled by a third control line, wherein said second transistor is overlaying said first transistor and said second transistor is controlled by a second control line, wherein said second transistor comprises a schottky barrier, and wherein said second transistor and said third transistor are self-aligned. 9. The device according to claim 8 , wherein said second transistor is aligned to said first transistor with less than 100 nm and greater than 5 nm misalignment. 10. The device according to claim 8 , further comprising: a third memory cell comprising said third transistor; a second memory cell comprising said second transistor; and memory periphery circuits comprising said first transistor, wherein said memory periphery circuits control at least said third memory cell and second memory cell. 11. The device according to claim 8 , wherein said second transistor is connected to said third transistor with an ohmic connection. 12. The device according to claim 8 , wherein said second transistor is a junction-less transistor. 13. The device according to claim 8 , wherein said first transistor is part of a control circuit controlling said second control line and said third control line. 14. The device according to claim 8 , wherein said second transistor comprises a second source and a second drain, wherein said third transistor comprises a third source and a third drain, wherein said second source is connected to said third source and said second drain is connected to said third drain, each with an ohmic connection. 15. A 3D integrated circuit device, comprising: a first transistor; a first memory cell comprising a second transistor; and a second memory cell comprising a third transistor, wherein said third transistor is overlaying said second transistor and said second transistor is overlaying said first transistor, wherein said first transistor is part of a control circuit controlling said first memory cell and second memory cell, wherein said second transistor is self-aligned to said third transistor, and wherein said second transistor is connected to said third transistor with an ohmic connection. 16. The device according to claim 15 , wherein said first transistor, said second transistor and said third transistor are aligned to each other with less than 100 nm and greater than 5 nm misalignment. 17. The device according to claim 15 , further comprising: memory periphery circuits comprising said first transistor, wherein said memory periphery circuits control at least said first memory cell and second memory cell. 18. The device according to claim 15 , wherein said second transistor is a junction-less transistor. 19. The device according to claim 15 , wherein said second transistor comprises a schottky barrier. 20. The device according to claim 15 , wherein said second transistor comprises a second source and a second drain, wherein said third transistor comprises a third source and a third drain, wherein said second source is connected to said third source and said second drain is connected to said third drain, each with an ohmic connection.
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