Method for producing patterns by ion implantation

Patent metadata

Field	Value
Publication number	US-9953807-B2
Application number	US-201715612680-A
Country	US
Kind code	B2
Filing date	Jun 2, 2017
Priority date	Jun 3, 2016
Publication date	Apr 24, 2018
Grant date	Apr 24, 2018

Abstract

A method for forming reliefs on the surface of a substrate, including a first implantation of ions in the substrate according to a first direction; a second implantation of ions in the substrate according to a second direction that is different from the first direction; at least one of the first and second implantations is carried out through at least one mask having at least one pattern; an etching of areas of the substrate having received by implantation a dose greater than or equal to a threshold, selectively to the areas of the substrate that have not received via implantation a dose greater than said threshold; the parameters of the first and second implantations being adjusted in such a way that only areas of the substrate that have been implanted both during the first implantation and during the second implantation receive a dose greater than or equal to said threshold.

First claim

The invention claimed is:

1. A method for forming reliefs on the surface of a substrate, comprising at least the following steps:
at least one first implantation of ions in the substrate according to a first direction;
at least one second implantation of ions in the substrate according to a second direction that is different from the first direction;
at least one of the first and second implantations is carried out through at least one mask having at least one pattern;
an etching of areas of the substrate having received by implantation a dose greater than or equal to a threshold, selectively to the areas of the substrate that have not received via implantation a dose greater than said threshold;
the parameters of the first and second implantations, including respective directions, being adjusted in such a way that only areas of the substrate that have been implanted both during the first implantation and during the second implantation receive a dose greater than or equal to said threshold.

2. The method according to claim 1 , wherein the first and second implantations are each carried out through at least one mask.

3. The method according to claim 2 , wherein the first and second implantations are carried out through the same mask, with the method comprising at least one additional implantation carried out through a mask that is different from the one used during the first and second implantations.

4. The method according to claim 2 , wherein at least one pattern of the mask used during the first implantation is different from at least one pattern of the mask used during the second implantation.

5. The method according to claim 1 , wherein at least one of the first and second implantations is carried out full wafer and without a mask.

6. The method according to claim 1 , wherein a sacrificial layer is arranged above the substrate and wherein at least one among the first and the second implantations is carried out through said sacrificial layer.

7. The method according to claim 6 , wherein the entire sacrificial layer is removed after the second implantation.

8. The method according to claim 6 , wherein the sacrificial layer is an anti-reflective coating.

9. The method according to claim 6 , wherein the thickness of the sacrificial layer is chosen and at least one among the first and the second implantations are carried out in such a way that first areas located under the mask are implanted both during the first implantation and during the second implantation, receive a dose greater than or equal to said threshold and extend solely in the sacrificial layer.

10. The method according to claim 6 , wherein the thickness of the sacrificial layer as well as at least one among the first and the second implantations are carried out in such a way that second areas located under the mask are implanted both during the first implantation and during the second implantation by receiving a dose that is greater than or equal to said threshold, with said second regions extending in the sacrificial layer and in the substrate.

11. The method according to claim 1 , wherein the substrate is crystalline and wherein at least one among the first and the second implantations is carried out in such a way as to render the implanted area amorphous.

12. The method according to claim 11 , wherein said implantation taken from the first and the second implantations and carried out in such a way as to render the implanted areas amorphous comprises the implantation of ions that are heavier than hydrogen (H), such as boron, argon (Ar) or silicon ions with an energy that is sufficient to render the implanted areas amorphous.

13. The method according to claim 11 , wherein at least one among the first and the second implantations is carried out in such a way as to chemically modify the substrate and wherein said implantation carried out in such a way as to render the implanted areas amorphous is the first implantation and wherein said implantation carried out in such a way as to chemically modify the substrate is the second implantation.

14. The method according to claim 1 , wherein at least one among the first and the second implantations is carried out in such a way as to chemically modify the substrate.

15. The method according to claim 14 , wherein said implantation taken from the first and the second implantations and carried out in such a way as to chemically modify the substrate comprises the implantation of hydrogen (H) and/or of oxygen ions in order to chemically modify the substrate.

16. The method according to claim 1 , wherein at least some of the areas receiving a dose greater than or equal to said threshold are located under a pattern of the mask during at least one of the first and second implantations.

17. The method according to claim 1 , wherein at least one of the first and second directions of implantation is perpendicular to a main plane in which extends the substrate.

18. The method according to claim 1 , wherein the directions of implantation of the first implantation and of the second implantation are inclined with respect to a direction perpendicular to a main plane in which extends the substrate.

19. The method according to claim 1 , wherein the substrate is made from a material comprising at least one of the following materials: silicon (Si), silicon-germanium (SiGe), sapphire, SiC, GaN or quartz.

20. The method according to claim 1 , wherein the substrate is porous.

21. The method according to claim 1 , wherein the parameters of the first and second implantations, in particular their respective directions, are adjusted in such a way that some areas of the substrate do not receive any dose during at least one among the first and the second implantations.

22. The method according to claim 1 , wherein the parameters of the first and second implantations, in particular their respective directions, are adjusted in such a way that during at least one among the first and the second implantations, ions penetrate into the substrate without passing through the mask.

Assignees

• Commissariat Energie Atomique

Inventors

• Landis Stefan
• Barnola Sebastien
• David Thibaut
• Nouri Lamia
• Posseme Nicolas

Classifications

• H10P50/644

  Anisotropic liquid etching (H10P50/61 takes precedence) · CPC title

• H10P30/222

  characterised by the angle between the ion beam and the crystal planes or the main crystal surface (characterised by the angle between the ion beam and the mask H10P30/221) · CPC title

• H01J2237/30461

  pre-calculated · CPC title

• H01J37/3175 Primary

  Projection methods, i.e. transfer substantially complete pattern to substrate · CPC title

• H01J2237/08

  Ion sources · CPC title