Amine treated maleic anhydride polymers with pendent silyl group, compositions and applications thereof
US-2015079507-A1 · Mar 19, 2015 · US
US9952507B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9952507-B2 |
| Application number | US-201615042240-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 12, 2016 |
| Priority date | Feb 18, 2015 |
| Publication date | Apr 24, 2018 |
| Grant date | Apr 24, 2018 |
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Embodiments in accordance with the present invention encompass self-imageable polymer compositions containing a variety of photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. The compositions of this invention can be tailored to form positive tone or negative tone images depending upon the intended application in aqueous developable medium. The images formed therefrom exhibit improved properties including low wafer stress and better thermo-mechanical properties, among other property enhancements.
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What is claimed is: 1. A photoimageable composition comprising: a) a polymer consisting of one or more repeating units of formula (VIIIA) derived from a monomer of formula (VIII): wherein represents a position at which the bonding takes place with another repeat unit; R 18 is selected from the group consisting of (C 6 -C 18 )alkyl; perfluoro(C 1 -C 18 )alkyl; (C 6 -C 10 )aryl(C 1 -C 6 )alkyl; —(CH 2 ) a —C(CF 3 ) 2 OR; —(CH 2 ) a —CO 2 R 2 ; a group of formula (A): —(CH 2 ) b —(OCH 2 —CH 2 ) c —OR (A); and a group of formula (B): wherein: a is an integer from 0 to 4; b is an integer from 0 to 10; c is an integer 0, 1, 2, 3 or 4; R is selected from the group consisting of hydrogen, linear or branched (C 1 -C 6 )alkyl, (C 5 -C 8 )cycloalkyl, (C 6 -C 10 )aryl and (C 7 -C 12 )aralkyl; and R 2 is selected from the group consisting of hydrogen and (C 1 -C 4 )alkyl; b) a photobase generator selected from the group consisting of: a compound of formula (IV): a compound of formula (V): a compound of formula (VI): a compound of formula (VIIA): a compound of formula (VIIB): a compound of formula (VIIC): wherein R 13 and R 14 each independently of each other selected from the group consisting of hydrogen, linear or branched (C 1 -C 8 )alkyl and (C 6 -C 10 )aryl; or R 13 and R 14 taken together with the nitrogen atom to which they are attached form a 5 to 7 membered monocyclic ring or 6 to 12 membered bicyclic ring, said rings optionally containing one or more heteroatoms selected from O and N, and said rings optionally substituted with a group selected from the group consisting of linear or branched (C 1 -C 8 )alkyl, (C 6 -C 10 )aryl, halogen, hydroxy, linear or branched (C 1 -C 8 )alkoxy and (C 6 -C 10 )aryloxy; and R 15 , R 16 and R 17 are the same or different and each independently of one another selected from the group consisting of hydrogen, linear or branched (C 1 -C 16 )alkyl, (C 6 -C 10 )aryl, (C 6 -C 10 )aryl(C 1 -C 3 )alkyl, hydroxy, halogen, linear or branched (C 1 -C 12 )alkoxy and (C 6 -C 10 )aryloxy; and a) a carrier solvent. 2. The composition of claim 1 , wherein the polymer consisting of one or more repeat units derived from the corresponding monomer of formula (VIII) selected from the group consisting of: norbornenyl-2-trifluoromethyl-3,3,3-trifluoropropan-2-ol; trioxanonanenorbornene; tetraoxadodecanenorbornene; 5-(3-methoxybutoxy)methyl-2-norbornene; 5-(3-methoxypropanoxy)methyl-2-norbornene; ethyl 3-(bicyclo[2.2.1]hept-2-en-2-yl)propanoate; bicyclo[2.2.1]hept-5-ene-2-carboxylic acid; and norbornenylpropanoic acid. 3. The composition of claim 1 , wherein the polymer consisting of one or more repeat units derived from the corresponding monomers selected from the group consisting of: norbornenyl-2-trifluoromethyl-3,3,3-trifluoropropan-2-ol; and norbornenylpropanoic acid. 4. The composition of claim 1 , wherein the photobase generator is selected from the group consisting of: 2-benzyl-2-(dimethylamino)-1-(4-morpholinophenyl)butan-1-one; 2-(dimethylamino)-2-(4-methylbenzyl)-1-(4-morpholinophenyl)butan-1-one; 2-nitrobenzyl 4-hydroxypiperidine-1-carboxylate; 4,5-dimethoxy-2-nitrobenzyl 2,6-dimethylpiperidine-1-carboxylate; 1-(9,10-dioxo-9,10-dihydroanthracen-2-yl)ethyl cyclohexylcarbamate; 1-(9,10-dioxo-9,10-dihydroanthracen-2-yl)ethyl 1H-imidazole-1-carboxylate; diaminomethaniminium 2-(3-benzoylphenyl)propanoate; and (Z)—N-(((bis(dimethylamino)methylene)amino)(isopropylamino)-methylene)propan-2-aminium 2-(3-benzoylphenyl)propanoate. 5. The composition of claim 1 further comprises one or more additives selected from the group consisting of: a crosslinking agent; an antioxidant; and an adhesion promoter. 6. The composition of claim 5 , wherein the crosslinking agent is selected from: 2,2′-(((2-ethyl-2-((oxiran-2-ylmethoxy)methyl)propane-1,3-diyl)bis(oxy))-bis(methylene))bis(oxirane); and triglycidyl ether of poly(oxypropylene)epoxide ether of glycerol. 7. A microelectronic or optoelectronic device comprising one or more of a redistribution layer (RDL) structure, a chip-stack structure, or a CMOS image sensor dam structure, where said structure further comprises a composition according to any one of claims 1 to 6 .
the macromolecular compound being present in a chemically amplified positive photoresist composition · CPC title
with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title
with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title
Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title
the macromolecular compound having a backbone with alicyclic moieties · CPC title
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