Photoimageable polyolefin compositions containing photobase generators

US9952507B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9952507-B2
Application numberUS-201615042240-A
CountryUS
Kind codeB2
Filing dateFeb 12, 2016
Priority dateFeb 18, 2015
Publication dateApr 24, 2018
Grant dateApr 24, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Embodiments in accordance with the present invention encompass self-imageable polymer compositions containing a variety of photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. The compositions of this invention can be tailored to form positive tone or negative tone images depending upon the intended application in aqueous developable medium. The images formed therefrom exhibit improved properties including low wafer stress and better thermo-mechanical properties, among other property enhancements.

First claim

Opening claim text (preview).

What is claimed is: 1. A photoimageable composition comprising: a) a polymer consisting of one or more repeating units of formula (VIIIA) derived from a monomer of formula (VIII): wherein represents a position at which the bonding takes place with another repeat unit; R 18 is selected from the group consisting of (C 6 -C 18 )alkyl; perfluoro(C 1 -C 18 )alkyl; (C 6 -C 10 )aryl(C 1 -C 6 )alkyl; —(CH 2 ) a —C(CF 3 ) 2 OR; —(CH 2 ) a —CO 2 R 2 ; a group of formula (A): —(CH 2 ) b —(OCH 2 —CH 2 ) c —OR  (A); and a group of formula (B): wherein: a is an integer from 0 to 4; b is an integer from 0 to 10; c is an integer 0, 1, 2, 3 or 4; R is selected from the group consisting of hydrogen, linear or branched (C 1 -C 6 )alkyl, (C 5 -C 8 )cycloalkyl, (C 6 -C 10 )aryl and (C 7 -C 12 )aralkyl; and R 2 is selected from the group consisting of hydrogen and (C 1 -C 4 )alkyl; b) a photobase generator selected from the group consisting of: a compound of formula (IV): a compound of formula (V): a compound of formula (VI): a compound of formula (VIIA): a compound of formula (VIIB): a compound of formula (VIIC): wherein R 13 and R 14 each independently of each other selected from the group consisting of hydrogen, linear or branched (C 1 -C 8 )alkyl and (C 6 -C 10 )aryl; or R 13 and R 14 taken together with the nitrogen atom to which they are attached form a 5 to 7 membered monocyclic ring or 6 to 12 membered bicyclic ring, said rings optionally containing one or more heteroatoms selected from O and N, and said rings optionally substituted with a group selected from the group consisting of linear or branched (C 1 -C 8 )alkyl, (C 6 -C 10 )aryl, halogen, hydroxy, linear or branched (C 1 -C 8 )alkoxy and (C 6 -C 10 )aryloxy; and R 15 , R 16 and R 17 are the same or different and each independently of one another selected from the group consisting of hydrogen, linear or branched (C 1 -C 16 )alkyl, (C 6 -C 10 )aryl, (C 6 -C 10 )aryl(C 1 -C 3 )alkyl, hydroxy, halogen, linear or branched (C 1 -C 12 )alkoxy and (C 6 -C 10 )aryloxy; and a) a carrier solvent. 2. The composition of claim 1 , wherein the polymer consisting of one or more repeat units derived from the corresponding monomer of formula (VIII) selected from the group consisting of: norbornenyl-2-trifluoromethyl-3,3,3-trifluoropropan-2-ol; trioxanonanenorbornene; tetraoxadodecanenorbornene; 5-(3-methoxybutoxy)methyl-2-norbornene; 5-(3-methoxypropanoxy)methyl-2-norbornene; ethyl 3-(bicyclo[2.2.1]hept-2-en-2-yl)propanoate; bicyclo[2.2.1]hept-5-ene-2-carboxylic acid; and norbornenylpropanoic acid. 3. The composition of claim 1 , wherein the polymer consisting of one or more repeat units derived from the corresponding monomers selected from the group consisting of: norbornenyl-2-trifluoromethyl-3,3,3-trifluoropropan-2-ol; and norbornenylpropanoic acid. 4. The composition of claim 1 , wherein the photobase generator is selected from the group consisting of: 2-benzyl-2-(dimethylamino)-1-(4-morpholinophenyl)butan-1-one; 2-(dimethylamino)-2-(4-methylbenzyl)-1-(4-morpholinophenyl)butan-1-one; 2-nitrobenzyl 4-hydroxypiperidine-1-carboxylate; 4,5-dimethoxy-2-nitrobenzyl 2,6-dimethylpiperidine-1-carboxylate; 1-(9,10-dioxo-9,10-dihydroanthracen-2-yl)ethyl cyclohexylcarbamate; 1-(9,10-dioxo-9,10-dihydroanthracen-2-yl)ethyl 1H-imidazole-1-carboxylate; diaminomethaniminium 2-(3-benzoylphenyl)propanoate; and (Z)—N-(((bis(dimethylamino)methylene)amino)(isopropylamino)-methylene)propan-2-aminium 2-(3-benzoylphenyl)propanoate. 5. The composition of claim 1 further comprises one or more additives selected from the group consisting of: a crosslinking agent; an antioxidant; and an adhesion promoter. 6. The composition of claim 5 , wherein the crosslinking agent is selected from: 2,2′-(((2-ethyl-2-((oxiran-2-ylmethoxy)methyl)propane-1,3-diyl)bis(oxy))-bis(methylene))bis(oxirane); and triglycidyl ether of poly(oxypropylene)epoxide ether of glycerol. 7. A microelectronic or optoelectronic device comprising one or more of a redistribution layer (RDL) structure, a chip-stack structure, or a CMOS image sensor dam structure, where said structure further comprises a composition according to any one of claims 1 to 6 .

Assignees

Inventors

Classifications

  • the macromolecular compound being present in a chemically amplified positive photoresist composition · CPC title

  • with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title

  • G03F7/0045Primary

    with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

  • G03F7/038Primary

    Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title

  • the macromolecular compound having a backbone with alicyclic moieties · CPC title

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What does patent US9952507B2 cover?
Embodiments in accordance with the present invention encompass self-imageable polymer compositions containing a variety of photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. The compositions of this invention can be tailored…
Who is the assignee on this patent?
Promerus Llc
What technology area does this patent fall under?
Primary CPC classification G03F7/0045. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 24 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).