Fixture for in situ electromigration testing during X-ray microtomography

Patent metadata

Field	Value
Publication number	US-9952272-B2
Application number	US-201514958354-A
Country	US
Kind code	B2
Filing date	Dec 3, 2015
Priority date	Dec 10, 2014
Publication date	Apr 24, 2018
Grant date	Apr 24, 2018

Abstract

Systems and fixtures for mounting, under mechanical constraint, wire-like or fiber-like samples of a high aspect ratio and down to 100 micrometers in diameter are disclosed. A region of interest along the length of the sample resides between and beyond a mechanical constraint on either side, allowing access to the region of interest for a wide number of characterization probes. The fixture may provide electrical isolation between two retaining blocks by means of a dielectric support member. The design may achieve minimal thermal expansion along the length of the sample by the material selection for the dielectric support member. Electrical contact may be introduced to the sample through conductive constraints in the retaining blocks. The fixture may have a minimal size perpendicular to the length axis of the sample to facilitate high probe fluxes when a diverging probe is used. The fixture may provide high x-ray transparency between the retaining blocks. The systems and fixtures as described therefore may provide a means for performing electrical and thermal testing on samples, including but not limited to solder butt-joints, across multimodal in situ characterization and imaging techniques to analyze dynamic electromigration.

First claim

What is claimed is:

1. A fixture for mounting a sample for in situ imaging during electrical and thermal testing, comprising:
a first retaining block having formed therein an first sample conduit extending from a top surface of the first retaining block to a bottom surface of the first retaining block along a first conduit axis;
a second retaining block having formed therein a second sample conduit extending from a top surface of the second retaining block to a bottom surface of the second retaining block along a second conduit axis that is aligned with the first conduit axis;
a first conductive constraint selectively insertable in the first retaining block perpendicular to the first conduit axis to constrain the sample extending through the first sample conduit;
a second conductive constraint selectively insertable in the second retaining block perpendicular to the second conduit axis to constrain the sample extending through the second sample conduit; and
a dielectric support coupling the first retaining block to the second retaining block, the dielectric support extending at least from the bottom surface of the first retaining block to the top surface of the second retaining block to define a sample region therebetween;
wherein the bottom surface of the first retaining block faces the top surface of the second retaining block across the sample region, and
wherein the sample region is dimensioned to provide in situ imaging of the sample extending into the first sample conduit into the sample region and into the second sample conduit.

2. The fixture of claim 1 , wherein at least one of the first and second retaining blocks includes an auxiliary mounting.

3. The fixture of claim 1 , further comprising a heater for heating the sample to a predetermined temperature during accelerated electromigration testing, wherein the heater is coupled to the auxiliary mounting.

4. The fixture of claim 3 , wherein the dielectric support member is formed of a material having a substantially zero thermal expansion coefficient up to the predetermined temperature.

5. The fixture of claim 1 , wherein the dielectric support member is formed of a lithium aluminum silicon oxide glass ceramic.

6. The fixture of claim 1 , wherein the first and second retaining blocks are formed from a conductive material.

7. The fixture of claim 6 , wherein the first and second retaining blocks are formed from aluminum.

8. The fixture of claim 1 , wherein at least one of the first and second retaining blocks includes an electrical lead conduit extending from the top surface of the retaining block to the bottom surface of the retaining block along an electrical lead conduit axis.

9. The fixture of claim 8 , wherein at least one of the first and second retaining blocks includes an electrical lead constraint selectively insertable into the electrical lead conduit.

10. The fixture of claim 1 , wherein the first retaining block further comprises a first beveled edge extending from the top surface to the bottom surface of the first retaining block, and the second retaining block further comprises a second beveled edge extending from the top surface to the bottom surface of the second retaining block.

11. The fixture of claim 10 , wherein a distance between the sample region and at least one of the first beveled edge or the second beveled edge for electron back-scatter diffraction is at least 4 mm.

12. A system for in situ imaging of microstructures of a sample during electromigration testing, the system comprising:
a fixture for mounting the sample, the fixture comprising:
a first retaining block having formed therein an first sample conduit extending from a top surface of the first retaining block to a bottom surface of the first retaining block along a first conduit axis;
a second retaining block having formed therein a second sample conduit extending from a top surface of the second retaining block to a bottom surface of the second retaining block along a second conduit axis that is aligned with the first conduit axis;
a first conductive constraint selectively insertable in the first retaining block perpendicular to the first conduit axis to constrain the sample extending through the first sample conduit;
a second conductive constraint selectively insertable in the second retaining block perpendicular to the second conduit axis to constrain the sample extending through the second sample conduit; and
a dielectric support coupling the first retaining block to the second retaining block, the dielectric support extending at least from the bottom surface of the first retaining block to the top surface of the second retaining block to define a sample region therebetween;
wherein the bottom surface of the first retaining block faces the top surface of the second retaining block across the sample region, and
wherein the sample region is dimensioned to provide in situ imaging of the sample extending into the first sample conduit into the sample region and into the second sample conduit; and

a fixture support connecting the fixture to a rotation stage.

13. The system of claim 12 , further comprising a heater for heating the sample to a predetermined temperature during accelerated electromigration testing.

14. The system of claim 12 , further comprising a power supply connected to the first and second retaining blocks to provide an electrical current across the sample.

15. The system of claim 12 , further comprising an x-ray source and an x-ray detector.

16. The system of claim 12 , further comprising a scanning electron microscope.

17. The system of claim 11 , further comprising an optical microscope.

Assignees

• Chawla Nikhilesh
• Mertens James E
• Univ Arizona State

Inventors

• Chawla Nikhilesh
• Mertens James E

Classifications

• G01R31/2858

  Measuring of material aspects, e.g. electro-migration [EM], hot carrier injection · CPC title

• G01R31/1218 Primary

  using optical methods; using charged particle, e.g. electron, beams or X-rays · CPC title

• H01J37/28 Primary

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J2237/2008

  specially adapted for studying electrical or magnetical properties of objects · CPC title

• H01J2237/2007

  Holding mechanisms · CPC title