Direct light differential measurement system
US-2024423517-A1 · Dec 26, 2024 · US
US9952096B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9952096-B2 |
| Application number | US-201314404834-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 3, 2013 |
| Priority date | Jun 5, 2012 |
| Publication date | Apr 24, 2018 |
| Grant date | Apr 24, 2018 |
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A spectral encoder includes a thin layer of lossy dielectric material whose thickness varies transversely from 0 to a thickness of about λ/4n (e.g., <100 nm), where λ is the wavelength of incident radiation and n is the dielectric material's refractive index. The dielectric layer reflects (and/or transmits) light at a wavelength that depends on the layer's thickness. Because the dielectric layer's thickness varies, different parts of the dielectric layer may reflect (transmit) light at different wavelengths. For instance, shining white light on a dielectric layer with a linearly varying thickness may produce a rainbow-like reflected (and/or transmitted) beam. Thus, the spectral encoder maps different wavelengths to different points in space. This mapping can be characterized by a transfer matrix which can be used to determine the spectrum of radiation incident on the spectral encoder from the spatial intensity distribution of the radiation reflected (and/or transmitted) by the spectral encoder.
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The invention claimed is: 1. A device with a working wavelength of λ, comprising: a reflector that is reflective at the working wavelength of λ, the reflector comprising a substrate having an unpolished surface and a reflective layer disposed over the unpolished surface of the substrate; and a dielectric layer disposed over the reflector, wherein a refractive index of the dielectric layer is n at λ, an extinction coefficient of the dielectric layer is k at λ, k is equal to or greater than 0.5 in at least one state of the dielectric layer, and a thickness h of the dielectric layer is less than λ/4n such that the reflector and the dielectric layer form a resonator at λ. 2. The device of claim 1 , wherein the reflective layer is a metal layer. 3. The device of claim 1 , wherein the reflector has a reflectivity less than 100% at λ. 4. The device of claim 1 , wherein the substrate is semi-transparent at the working wavelength of λ. 5. The device of claim 1 , wherein the substrate comprises at least one of sapphire, a semiconductor, a metal, glass, or a conducting oxide. 6. The device of claim 1 , wherein the dielectric layer comprises at least one of a semiconductor, a metal-dielectric alloy, an organic material, or a phase-change material. 7. The device of claim 1 , wherein the thickness h of the dielectric layer, the extinction coefficient k of the dielectric layer, and a reflectivity of the reflector are configured such that incident light at wavelength λ, is absorbed by the device. 8. The device of claim 7 , wherein the device is colored based on absorption of incident light at wavelength λ. 9. The device of claim 7 , wherein the device is a reflection optical filter. 10. The device of claim 7 , wherein the device is a transmission optical filter. 11. The device of claim 1 , wherein the thickness h of the dielectric layer varies as a function of position across the device. 12. The device of claim 11 , wherein the thickness h of the dielectric layer is patterned to represent an image. 13. The device of claim 12 , wherein the image is one of a logo, a bar code, or a tag. 14. The device of claim 1 , wherein the device is one of a metal-insulator-metal diode, a p-n junction photodetector, a p-i-n junction photodetector, a Schottky photodiode, a photovoltaic cell, a thermoelectric photodetector, a bolometer, and an optical memory. 15. The device of claim 1 , further comprising a conductive layer disposed over the dielectric layer such that the conductive layer, the dielectric layer, and the reflector form a junction. 16. The device of claim 1 , wherein the dielectric layer comprises a tunable material having a first state with an extinction coefficient k 1 at λ and a second state with an extinction coefficient k 2 equal to or greater than 0.5 at λ, such that the device has a tunable absorption at λ. 17. The device of claim 16 , wherein the tunable material is an oxide of a metal. 18. The device of claim 16 , further comprising an actuator configured to tune the tunable material to switch between the first state and the second state. 19. The device of claim 18 , wherein the actuator is configured to tune the tunable material by at least one of temperature, voltage, current, optical intensity, pressure, and magnetic field. 20. The device of claim 1 , wherein the dielectric layer comprises a tunable material, and further comprising an actuator configured to tune the tunable material to vary between a range of values of the extinction coefficient k. 21. The device of claim 1 , wherein the extinction coefficient k of the dielectric layer is larger than 0.5 in at least one state of the dielectric layer. 22. The device of claim 1 , wherein the thickness h of the dielectric layer is less than λ/8n. 23. The device of claim 1 , wherein the wavelength λ is in a range of 350 nm to 800 nm. 24. The device of claim 1 , wherein the wavelength λ is an ultraviolet wavelength or an infrared wavelength. 25. The device of claim 1 , wherein the reflector comprises a Bragg reflector. 26. A method comprising: modulating incident light comprising a wavelength of λ by exposing an optical device to the incident light, the optical device comprising: a reflector that is reflective at the working wavelength of λ, the reflector comprising a substrate having an unpolished surface and a reflective layer disposed over the unpolished surface of the substrate; and a dielectric layer disposed over the reflector, wherein a refractive index of the dielectric layer is n at λ, an extinction coefficient of the dielectric layer is k at λ, wherein k is equal to or greater than 0.5 in at least one state of the dielectric layer, and a thickness h of the dielectric layer is less than λ/4n. 27. The method of claim 26 , wherein the dielectric layer comprises a tunable material, and the method further comprises applying at least one of heat, voltage, current, optical pulse, pressure, and magnetic field to the dielectric layer to switch between states of the tunable material. 28. The method of claim 26 , wherein the thickness h of the dielectric layer varies as a function of position along the reflector such that the incident light is modulated differently at different positions along the reflector. 29. The method of claim 26 , wherein the thickness h of the dielectric layer is patterned to represent an image, and modulating the incident light comprises displaying the image. 30. The method of claim 29 , wherein the image is one of a logo, a bar code, and a tag. 31. The method of claim 26 , wherein the reflector has a reflectivity less than 100% at λ. 32. The method of claim 26 , wherein modulating the incident light comprises absorbing the incident light. 33. The method of claim 26 , wherein modulating the incident light comprises reflecting the incident light.
Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows · CPC title
Absorbing filters {(G02B5/201 - G02B5/208 take precedence)} · CPC title
containing organic substances, e.g. dyes, inks or pigments · CPC title
Electricity · mapped topic
Filters in general, e.g. dichroic, band · CPC title
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