Optical interferometric system for measurement of a full-field thickness of a plate-like object in real time

US9952034B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9952034-B2
Application numberUS-201715609862-A
CountryUS
Kind codeB2
Filing dateMay 31, 2017
Priority dateJun 28, 2016
Publication dateApr 24, 2018
Grant dateApr 24, 2018

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

An optical interferometric system for measurement of a full-field thickness of a plate-like object in real time includes two light sources, two screens, two image capturing devices, and an image processing module. The light sources radiate incident lights toward a reference point on the plate-like object in respective directions to produce respective interference fringe patterns (IFPs). The image capturing devices capture light intensity distribution images respectively of the IFPS imaged respectively on the screens. The image processing module calculates a fringe order at the reference point according to the light intensity distribution images, and obtains a full-field thickness distribution of the plate-like object according to the fringe order.

First claim

Opening claim text (preview).

What is claimed is: 1. An optical interferometric system for measurement of a full-field thickness of a plate-like object in real time, said optical interferometric system comprising: a first light source for radiating a first incident light in a first direction toward a reference point located on a surface of the plate-like object to produce a first interference fringe pattern (IFP); a second light source for radiating a second incident light in a second direction different from the first direction toward the reference point to produce a second IFP, the first incident light and the second incident light being coherent, having spherical wavefronts, and radiating the plate-like object with the spherical wavefronts; a first screen and a second screen for allowing the first and second IFPs to be imaged thereon, respectively; a first image capturing device and a second image capturing device that are disposed to face said first screen and second screen, respectively, and that are configured to respectively capture first and second light intensity distribution images respectively of the first and second IFPs imaged respectively on said first and second screens; and an image processing module that is electrically connected to said first image capturing device and said second image capturing device, and that is configured to convert the first and second light intensity distribution images into digital data, calculate a fringe order at the reference point according to digital data, and obtain a full-field distribution of the thickness of the plate-like object according to the fringe order. 2. The optical interferometric system of claim 1 , wherein said image processing module is configured to calculate the fringe order by obtaining a first relative phase of the first IFP and a second relative phase of the second IFP, and calculating the fringe order based on the first and second relative phases. 3. The optical interferometric system of claim 2 , wherein said image processing module is configured to calculate the fringe order N 1 at the reference point located at coordinates (x 0 , y 0 ) based upon N 1 ⁡ ( x 0 , y 0 ) = round ⁢ { A 2 ⁡ ( x , y ) ⁢ φ rel ⁢ _ ⁢ ⁢ 2 ⁡ ( x , y ) - A 1 ⁡ ( x , y ) ⁢ φ rel ⁢ ⁢ _ ⁢ 1 ⁡ ( x , y ) 2 ⁢ ⁢ π ⁡ [ A 1 ⁡ ( x , y ) - A 2 ⁡ ( x , y ) ] } , ⁢ A

Assignees

Inventors

Classifications

  • G01B11/06Primary

    for measuring thickness {; e.g. of sheet material (thickness measurement by thermal means G01B21/085)} · CPC title

  • contacting different points on same face of object · CPC title

  • by beating two waves of a same source but of different frequency and measuring the phase shift of the lower frequency obtained · CPC title

  • Multiple detectors for detecting interferometer signals · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9952034B2 cover?
An optical interferometric system for measurement of a full-field thickness of a plate-like object in real time includes two light sources, two screens, two image capturing devices, and an image processing module. The light sources radiate incident lights toward a reference point on the plate-like object in respective directions to produce respective interference fringe patterns (IFPs). The ima…
Who is the assignee on this patent?
Univ Nat Tsing Hua
What technology area does this patent fall under?
Primary CPC classification G01B11/06. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 24 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).