Process for producing water-absorbing polymer particles with high free swell rate

US9950306B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9950306-B2
Application numberUS-201213544485-A
CountryUS
Kind codeB2
Filing dateJul 9, 2012
Priority dateJul 14, 2011
Publication dateApr 24, 2018
Grant dateApr 24, 2018

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A process for producing water-absorbing polymer particles with high free swell rate by polymerizing a monomer solution or suspension comprising an ethylenically unsaturated monomer bearing acid groups, a crosslinker, an initiator and an ethylenically unsaturated ionic surfactant.

First claim

Opening claim text (preview).

The invention claimed is: 1. A process for producing water-absorbing polymer particles by polymerizing an aqueous monomer solution or suspension comprising a) at least one ethylenically unsaturated monomer which bears an acid group and is at least partly neutralized consisting essentially of acrylic acid neutralized to an extent of 25 to 95 mol %, b) at least one crosslinker, c) at least one initiator, d) optionally one or more water-soluble polymer, wherein the monomer solution comprises 0.005 to 1%, by weight, of at least one ethylenically unsaturated anionic surfactant having an ethylenically unsaturated group, a polypropylene glycol group as a nonpolar spacer, and a phosphate as an anionic group, and the polymerization is a solution polymerization, and the polymer particles having a centrifuge retention capacity of at least 15 g/g. 2. The process according to claim 1 , wherein the ethylenically unsaturated group in the ethylenically unsaturated anionic surfactant is an allyl ether, vinyl ether, acrylic ester, or methacrylic ester group. 3. The process according to claim 1 , wherein the ethylenically unsaturated anionic surfactant is a compound of the general formula (I) where R 1 is hydrogen, methyl, or ethyl, R 2 is methyl, and n is an integer from 3 to 20. 4. The process according to claim 1 , wherein the aqueous monomer solution, based on the unneutralized monomer a), comprises from 0.05 to 0.2% by weight of the ethylenically unsaturated anionic surfactant. 5. The process according to claim 1 , wherein monomer a) has been neutralized to an extent of 30 to 80 mol %. 6. The process according to claim 1 , wherein the aqueous monomer solution, based on the unneutralized monomer a), comprises from 0.1 to 1% by weight of the crosslinker b). 7. The process of claim 1 wherein the aqueous monomer solution, based on the unneutralized monomer a), comprises from 0.02 to 0.5% by weight of the ethylenically unsaturated anionic surfactant. 8. The process of claim 1 wherein the aqueous monomer solution, based on the unneutralized monomer a), comprises from 0.05 to 1% by weight of the ethylenically unsaturated anionic surfactant.

Assignees

Inventors

Classifications

  • C08F220/06Primary

    Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof · CPC title

  • obtained by reactions only involving carbon to carbon unsaturated bonds (macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds per se C08F) · CPC title

  • Processes for preparing, regenerating, or reactivating · CPC title

  • B01J20/26Primary

    Synthetic macromolecular compounds · CPC title

  • Cross-linked polymers · CPC title

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What does patent US9950306B2 cover?
A process for producing water-absorbing polymer particles with high free swell rate by polymerizing a monomer solution or suspension comprising an ethylenically unsaturated monomer bearing acid groups, a crosslinker, an initiator and an ethylenically unsaturated ionic surfactant.
Who is the assignee on this patent?
Braun Markus, Weismantel Matthias, Basf Se
What technology area does this patent fall under?
Primary CPC classification C08F220/06. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 24 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).