Lithographic fragmentation technology

US9946159B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9946159-B2
Application numberUS-201615281250-A
CountryUS
Kind codeB2
Filing dateSep 30, 2016
Priority dateMar 29, 2016
Publication dateApr 17, 2018
Grant dateApr 17, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A fragmentation pattern is formed on a surface of a warhead using a lithographic process. A photoresistant material is coated on an interior surface of the warhead casing. A portion of the photoresistant material is selectively cured by projecting an image of the fragmentation pattern onto the photoresistant material. The uncured portion of the photoresistant material is removed and an etchant is applied to the exposed portion of the warhead casing surface thereby etching the fragmentation pattern. Alternatively, a protective coating is applied over the entire surface thereby creating the fragmentation pattern.

First claim

Opening claim text (preview).

We claim: 1. A method for etching a fragmentation pattern into a warhead comprising the steps of: applying a photosensitive material coating to an interior surface of a warhead casing; according to a desired fragmentation pattern, selectively curing a portion of the photosensitive material with light radiation; removing the uncured portion of the photosensitive material; and applying an etchant material to the interior surface of the warhead casing thereby etching the desired warhead pattern into the interior surface of the warhead to create a sufficient differential natural stress riser in the presence of an explosive blast. 2. The method of claim 1 wherein the step of selectively curing a portion of the photosensitive material with light radiation further comprises exposing a portion of the photosensitive material coating to light radiation thereby curing the exposed portion of the photosensitive material coating. 3. The method of claim 2 wherein the portion of the photosensitive material exposed to light radiation corresponds to positive image of the fragmentation pattern and the uncured portion of the photosensitive material corresponds to the negative image of the fragmentation pattern. 4. The method of claim 2 wherein the portion of the photosensitive material exposed to light radiation corresponds to negative image of the fragmentation pattern and the uncured portion of the photosensitive material corresponds to the positive image of the fragmentation pattern. 5. The method of claim 1 wherein the photosensitive material is selected from one of the following: a photoresist material and a light cure resin based polymer material. 6. The method of claim 1 wherein the step of applying the photosensitive material coating to the interior surface of the warhead casing further comprises the step of inserting a photosensitive material applicator into an opening of the warhead casing. 7. The method of claim 1 wherein the step of exposing a portion of the photosensitive material coating corresponding to the fragmentation pattern to light radiation further comprises the step of inserting a light source into an opening of the warhead casing. 8. The method of claim 4 wherein the light source further comprises a mask for blocking the transmission of light through the portions of the mask. 9. The method of claim 8 wherein the mask overlaid on the light source is sized and dimensioned to produce a light pattern on the interior surface of the warhead corresponding to the desired positive image of the fragmentation pattern. 10. The method of claim 1 wherein the light radiation is ultraviolet light radiation. 11. The method of claim 1 wherein the photosensitive material removal process is a chemical wash. 12. The method of claim 1 wherein the exposed interior surface of the warhead casing is exposed the etchant material until the fragmentation pattern is etched to a depth sufficient to create a differential natural stress riser in the presence of an explosive blast wave. 13. The method of claim 1 wherein the warhead casing is composed of HF-1 Steel. 14. The method of claim 1 further comprising the steps of: cleaning the interior surface of the warhead; dehydrating the interior surface of the warhead; and applying an adhesive promoter to the interior surface of the warhead. 15. A method for creating a fragmentation pattern on a warhead casing comprising the steps of: applying a photosensitive material coating to an interior surface of a warhead casing; according to a desired fragmentation pattern, selectively curing a portion of the photosensitive material with light radiation; removing the uncured portion of the photosensitive material; and depositing a stress protection coating to the interior surface of the warhead casing to create a sufficient differential natural stress riser in the presence of an explosive blast. 16. The method of claim 15 wherein the step of selectively curing a portion of the photosensitive material with light radiation further comprises exposing a portion of the photosensitive material coating to light radiation thereby curing the exposed portion of the photosensitive material coating. 17. The method of claim 16 wherein the portion of the photosensitive material exposed to light radiation corresponds to positive image of the fragmentation pattern and the uncured portion of the photosensitive material corresponds to the negative image of the fragmentation pattern. 18. The method of claim 16 wherein the portion of the photosensitive material exposed to light radiation corresponds to negative image of the fragmentation pattern and the uncured portion of the photosensitive material corresponds to the positive image of the fragmentation pattern. 19. The method of claim 15 wherein the photosensitive material is selected from one of the following: a photoresist material and a light cure resin based polymer material. 20. The method of claim 15 wherein the step of applying the photosensitive material coating to the interior surface of the warhead casing further comprises the step of inserting a photosensitive material applicator into an opening of the warhead casing. 21. The method of claim 15 wherein the step of exposing a portion of the photosensitive material coating corresponding to the fragmentation pattern to light radiation further comprises the step of inserting a light source into an opening of the warhead casing. 22. The method of claim 18 wherein the light source further comprises a mask for blocking the transmission of light through the portions of the mask. 23. The method of claim 8 wherein the mask overlaid on the light source is sized and dimensioned to produce a light pattern on the interior surface of the warhead corresponding to the desired positive image of the fragmentation pattern. 24. The method of claim 15 wherein the light radiation is ultraviolet light radiation. 25. The method of claim 15 wherein the warhead casing is composed of HF-1 Steel. 26. The method of claim 15 further comprising the steps of: cleaning the interior surface of the warhead; dehydrating the interior surface of the warhead; and applying an adhesive promoter to the interior surface of the warhead.

Assignees

Inventors

Classifications

  • Manufacture of ammunition; Dismantling of ammunition; Apparatus therefor (F42B5/188 takes precedence; manufacturing processes for hollow charges F42B1/036; manufacture of blasting cartridge initiators F42B3/195) · CPC title

  • F42B12/24Primary

    with grooves, recesses or other wall weakenings {(F42B12/26, F42B12/28 take precedence)} · CPC title

  • F42B12/32Primary

    the hull or case comprising a plurality of discrete bodies, e.g. steel balls, embedded therein {or disposed around the explosive charge} · CPC title

  • G03F7/30Primary

    Imagewise removal using liquid means · CPC title

  • Direct sintering or melting · CPC title

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What does patent US9946159B2 cover?
A fragmentation pattern is formed on a surface of a warhead using a lithographic process. A photoresistant material is coated on an interior surface of the warhead casing. A portion of the photoresistant material is selectively cured by projecting an image of the fragmentation pattern onto the photoresistant material. The uncured portion of the photoresistant material is removed and an etchant …
Who is the assignee on this patent?
Us Army
What technology area does this patent fall under?
Primary CPC classification F42B12/24. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Apr 17 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).