Method to lower the dynamic surface tension of a composition

US9944786B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9944786-B2
Application numberUS-201615210748-A
CountryUS
Kind codeB2
Filing dateJul 14, 2016
Priority dateFeb 23, 2012
Publication dateApr 17, 2018
Grant dateApr 17, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention relates to a composition, comprising a binder resin, a block copolymer which comprises at least a block A and a block B, wherein the block A comprises monomer units derived from a compound selected from (meth)acrylic acid, a (meth)acrylic acid ester, a (meth)acrylamide, a vinyl aromatic compound, or any mixture thereof, the block B comprises monomer units derived from a compound selected from a fluorinated (meth)acrylic ester having the following formula (I): H 2 C═C(R 1 )(C(O)OR F-1 )  (I) wherein R1 is H or methyl; and R F-1 is an organic residue containing a perfluorinated C 4-6 alkyl group, a fluorinated alpha-olefin having the following formula (II): H 2 C═CH(R F-2 )  (II) wherein R F-2 is an organic residue containing a perfluorinated C 4-6 alkyl group, i.e., —(CF 2 ) 3-5 —CF 3 or any mixture thereof.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method to lower the dynamic surface tension of a composition in a high speed coating process, wherein the composition is one selected from the group consisting of a coating composition, an ink composition and an adhesive composition, the method comprising: adding from 0.05 to 15 wt % relative to the weight of the composition of a block copolymer; and applying the composition comprising the block copolymer to a substrate in a high speed-coating process; wherein the block copolymer comprises: a block A and a block B, wherein the block A comprises monomer units derived from a compound selected from (meth)acrylic acid, a (meth)acrylic acid ester, a (meth)acrylamide, a vinyl aromatic compound, or a mixture thereof, and the block B comprises monomer units derived from a compound selected from a fluorinated (meth)acrylic ester having the following formula (I): H 2 C═CR 1 (C(O)OR F-1 )  (I) wherein R1 is H or methyl; and R F-1 is an organic residue containing a perfluorinated C 4-6 alkyl group, a fluorinated alpha-olefin having the following formula (II): H 2 C═CH(R F-2 )  (II) wherein R F-2 is an organic residue containing a perfluorinated C 4-6 alkyl group, or a mixture thereof. 2. The method to lower the dynamic surface tension of a composition according to claim 1 , wherein the composition is one composition selected from the group consisting of a water-based coating composition, a powder coating composition, a solvent-borne ink, a water-borne ink, a UV ink and a UV coating. 3. The method to lower the dynamic surface tension of a composition according to claim 1 , wherein a number average molecular weight of the fluorinated block copolymer is from 6,000 to 50,000 g/mol.

Assignees

Inventors

Classifications

  • C08L53/00Primary

    Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers · CPC title

  • Polymers of esters of acrylic or methacrylic acid · CPC title

  • Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers · CPC title

  • from unsaturated acids or derivatives thereof · CPC title

  • containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds · CPC title

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What does patent US9944786B2 cover?
The present invention relates to a composition, comprising a binder resin, a block copolymer which comprises at least a block A and a block B, wherein the block A comprises monomer units derived from a compound selected from (meth)acrylic acid, a (meth)acrylic acid ester, a (meth)acrylamide, a vinyl aromatic compound, or any mixture thereof, the block B comprises monomer…
Who is the assignee on this patent?
Basf Se
What technology area does this patent fall under?
Primary CPC classification C08L53/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 17 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).