Ethylene-based polymers formed using asymmetrical polyenes

US9944733B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9944733-B2
Application numberUS-201415100526-A
CountryUS
Kind codeB2
Filing dateDec 23, 2014
Priority dateDec 26, 2013
Publication dateApr 17, 2018
Grant dateApr 17, 2018

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A composition comprising an ethylene-based polymer, the ethylene-based polymer having the following properties: a) at least one incorporated structure derived from a polyene selected from the group consisting of i) through x), as described herein; and b) a Mw(abs) versus I 2 relationship: Mw(abs)<A+B(I2), wherein A=2.40×10 5 g/mole and B=−8.00×10 3 (g/mole)/(dg/min). A composition comprising an ethylene-based polymer, the ethylene-based polymer comprising at least one incorporated structure derived from a polyene selected from the group consisting of i) through x), as described herein, wherein the polymer is formed in a reactor configuration comprising at least one tubular reactor.

First claim

Opening claim text (preview).

We claim: 1. A composition comprising an ethylene-based polymer, the ethylene-based polymer comprising ethylene and at least one asymmetrical polyene as the only monomeric units, comprising the following properties: a) at least one incorporated structure derived from a polyene selected from the group consisting of the following i) through x): wherein n is from 1 to 50;…

Assignees

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Classifications

  • Chemistry & Metallurgy · mapped topic

  • C08F10/02Primary

    Chemistry & Metallurgy · mapped topic

  • Chemistry & Metallurgy · mapped topic

  • Chemistry & Metallurgy · mapped topic

  • Chemistry & Metallurgy · mapped topic

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What does patent US9944733B2 cover?
A composition comprising an ethylene-based polymer, the ethylene-based polymer having the following properties: a) at least one incorporated structure derived from a polyene selected from the group consisting of i) through x), as described herein; and b) a Mw(abs) versus I 2 relationship: Mw(abs)<A+B(I2), wherein A=2.40×10 5 g/mole and B=−8.00×10 3 (g/mole)/(dg/min). A composition comprising…
Who is the assignee on this patent?
Dow Global Technologies Llc
What technology area does this patent fall under?
Primary CPC classification C08F10/02. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 17 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).