Method for producing a reflection-reducing layer system and reflection-reducing layer system

Patent metadata

Field	Value
Publication number	US-9939556-B2
Application number	US-201615008392-A
Country	US
Kind code	B2
Filing date	Jan 27, 2016
Priority date	Jan 27, 2015
Publication date	Apr 10, 2018
Grant date	Apr 10, 2018

Abstract

A method for producing a reflection-reducing layer system on a substrate and a reflection-reducing layer system are disclosed. According to an embodiment the method includes depositing a refractive index gradient layer on the substrate by co-evaporation of an inorganic material and an organic material, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction, depositing an organic layer above the refractive index gradient layer, and producing a nanostructure in the organic layer by a plasma etching process.

First claim

What is claimed is:

1. A method for producing a reflection-reducing layer system on a substrate, the method comprising:
depositing a refractive index gradient layer on the substrate by coevaporation of an inorganic material and an organic material, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction;
depositing an organic layer above the refractive index gradient layer; and
producing a nanostructure in the organic layer by a plasma etching process.

2. The method according to claim 1 , wherein the nanostructure has a plurality of structure elements whose heights are on average between 80 nm and 130 nm and whose spacings are on average less than 100 nm.

3. The method according to claim 1 , wherein the inorganic material of the refractive index gradient layer has a refractive index n 1 where 1.37≤n 1 ≤1.46, and wherein the organic material of the refractive index gradient layer has a refractive index n 2 >n 1 where 1.6≤n 2 ≤1.9.

4. The method according to claim 1 , wherein the refractive index of the refractive index gradient layer at an interface with the substrate is matched to a refractive index of the substrate.

5. The method according to claim 1 , wherein the organic material is a UV-absorbing material.

6. The method according to claim 1 , wherein the organic layer has at least regionally an effective refractive index of between 1.05 and 1.38.

7. The method according to claim 1 , further comprising, prior to depositing the organic layer, depositing an inorganic intermediate layer on the refractive index gradient layer.

8. The method according to claim 1 , further comprising, after producing the nanostructure, applying a protective layer having a thickness of between 10 nm and 50 nm to the nanostructure.

9. The method according to claim 1 , wherein the entire reflection-reducing layer system is produced in a vacuum process.

10. The method according to claim 1 , wherein the organic layer is deposited by plasma ion assisted deposition using a plasma ion source, and wherein the nanostructure is subsequently produced by increasing the ion energy and/or changing a process gas of the plasma ion source.

11. The method according to claim 1 , wherein the organic layer comprises melamine.

Assignees

• Fraunhofer Ges Forschung

Inventors

• Schulz Ulrike
• Rickelt Friedrich
• Munzert Peter
• Heiβe Hanno
• Knopf Heiko
• Füchsel Kevin
• Kaiser Norbert

Classifications

• C23C14/06

  characterised by the coating material ({C23C14/0021} , C23C14/04 take precedence) · CPC title

• B29C59/14

  by plasma treatment {(plasma tubes per se H01J)} · CPC title

• B05D3/148

  affecting the surface properties of the coating · CPC title

• C23C14/10

  Glass or silica · CPC title

• B05D3/145

  After-treatment · CPC title