What is claimed is:
1. An activation chamber disposed inside a treatment device for lowering electron affinity for vaporizing a surface treatment material and using the vaporized surface treatment material to perform a treatment to lower electron affinity on a photocathode material and/or re-treatment to lower electron affinity on a photocathode,
wherein the activation chamber is disposed inside a vacuum chamber of the treatment device for lowering electron affinity and includes a hole through which electrons pass, and the activation chamber itself is not a vacuum chamber.
2. The activation chamber according to claim 1 , wherein the activation chamber is formed of a material selected from conductive materials, and insulating materials.
3. The activation chamber according to claim 1 , further comprising drive means which is formed in the activation chamber for changing the position of a photocathode holder.
4. The activation chamber according to claim 3 , wherein the hole is large enough to allow the photocathode holder to be inserted therein.
5. The activation chamber according to claim 1 , further comprising direction control means for controlling the dispersion direction of vaporized surface treatment material.
6. The activation chamber according to claim 1 , further comprising heating means for heating the surface treatment material.
7. The activation chamber according to claim 1 , further comprising a shield for preventing vaporized surface treatment material from leaking outside the activation chamber.
8. A kit for lowering electron affinity, comprising:
the activation chamber according to claim 1 ; and
a surface treatment material.
9. The kit according to claim 8 , wherein the surface treatment material has heating means inserted therein.
10. The kit according to claim 8 , further comprising a photocathode holder with the photocathode or a photocathode material attached.
11. The kit according to claim 10 , further comprising a photocathode rod on which is formed a shield for preventing vaporized surface treatment material from leaking outside the activation chamber.
12. The kit according to claim 10 , further comprising a lid that is slidable with respect to the activation chamber,
wherein the photocathode holder with the photocathode or the photocathode material attached is formed on the lid.
13. A treatment device for lowering electron affinity, comprising:
the kit according to claim 8 ;
a vacuum chamber; and
a vacuum pump.
14. A photocathode electron-beam source comprising:
the treatment device for lowering electron affinity according to claim 13 ;
an anode; and
a light source.
15. An electron gun comprising the photocathode electron-beam source according to claim 14 .
16. A free-electron laser accelerator comprising the photocathode electron-beam source according to claim 14 .
17. A transmission electron microscope comprising the photocathode electron-beam source according to claim 14 .
18. A scanning electron microscope comprising the photocathode electron-beam source according to claim 14 .
19. An electron-beam holography microscope comprising the photocathode electron-beam source according to claim 14 .
20. An electron-beam lithography device comprising the photocathode electron-beam source according to claim 14 .
21. An electron-beam diffraction device comprising the photocathode electron-beam source according to claim 14 .
22. An electron-beam scanning device comprising the photocathode electron-beam source according to claim 14 .
23. An activation chamber for use in a treatment device for lowering electron affinity for vaporizing a surface treatment material and using the vaporized surface treatment material to perform a treatment to lower electron affinity on a photocathode material and/or re-treatment to lower electron affinity on a photocathode,
wherein the activation chamber is used in a vacuum chamber of the treatment device for lowering electron affinity and includes a hole through which electrons pass, and a hole through which light passes, and
the activation chamber itself is not a vacuum chamber.
24. A kit for lowering electron affinity, comprising:
an activation chamber for use in a treatment device for lowering electron affinity for vaporizing a surface treatment material and using the vaporized surface treatment material to perform a treatment to lower electron affinity on a photocathode material and/or re-treatment to lower electron affinity on a photocathode;
the surface treatment material; and
a photocathode holder with the photocathode or a photocathode material attached, wherein:
the activation chamber is used in a vacuum chamber of the treatment device for lowering electron affinity, and includes a hole through which electrons pass,
the activation chamber itself is not a vacuum chamber, and
the photocathode holder is fabricated of light-transmissive material or comprises a hole through which light passes.
25. The kit according to claim 24 , further comprising a lid that is slidable with respect to the activation chamber,
wherein the photocathode holder with the photocathode or the photocathode material attached is formed on the lid, and
wherein the lid and the photocathode holder are fabricated of a light-transmissive material or comprise a hole through which light passes.
26. A kit for lowering electron affinity, comprising:
an activation chamber for use in a treatment device for lowering electron affinity for vaporizing a surface treatment material and using the vaporized surface treatment material to perform a treatment to lower electron affinity on a photocathode material and/or re-treatment to lower electron affinity on a photocathode;
the surface treatment material; and
a photocathode holder with the photocathode or a photocathode material attached, wherein:
the activation chamber is used in a vacuum chamber of the treatment device for lowering electron affinity, and includes a hole through which electrons pass,
the activation chamber itself is not a vacuum chamber,
the kit further comprises a substrate between the photocathode material or the photocathode, and the photocathode holder, and
the substrate is fabricated of a light-transmissive material or comprises a hole through which light passes.
27. A treatment device, comprising:
a vacuum chamber; and
an activation chamber disposed in the vacuum chamber, wherein:
the treatment device is for lowering electron affinity for vaporizing a surface treatment material and using the vaporized surface treatment material to perform a treatment to lower electron affinity on a photocathode material and/or re-treatment to lower electron affinity on a photocathode, and
the activation chamber includes a hole through which electrons pass, and the activation chamber itself is not a vacuum chamber.
