Systems for managing thermal energy within a thermal storage solution
US-2024318923-A1 · Sep 26, 2024 · US
US9929690B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9929690-B2 |
| Application number | US-201414529578-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 31, 2014 |
| Priority date | Oct 31, 2013 |
| Publication date | Mar 27, 2018 |
| Grant date | Mar 27, 2018 |
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A solar thermal photovoltaic device, and method of forming same, includes a solar absorber and a spectrally selective emitter formed on either side of a thermally conductive substrate. The solar absorber is configured to absorb incident solar radiation. The solar absorber and the spectrally selective emitter are configured with an optimized emitter-to-absorber area ratio. The solar thermal photovoltaic device also includes a photovoltaic cell in thermal communication with the spectrally selective emitter. The spectrally selective emitter is configured to permit high emittance for energies above a bandgap of the photovoltaic cell and configured to permit low emittance for energies below the bandgap.
Opening claim text (preview).
What is claimed is: 1. A solar thermal photovoltaic device comprising: a solar absorber formed on one side of a thermally conductive substrate in an active area, the solar absorber configured to absorb incident solar radiation; a spectrally selective emitter formed on another side of the thermally conductive substrate, the solar absorber and the spectrally selective emitter configured with an optimized emitter-to-absorber planar area ratio; a coating formed between the solar absorber and the thermally conductive substrate, the coating comprising a low emissivity material configured to reduce parasitic radiation from the solar thermal photovoltaic device in an inactive area around the solar absorber; and a photovoltaic cell in thermal communication with the spectrally selective emitter, the spectrally selective emitter configured to permit emittance for energies above a bandgap of the photovoltaic cell at a higher level than emittance for energies below the bandgap. 2. The solar thermal photovoltaic device of claim 1 , wherein the solar absorber comprises carbon nanotubes. 3. The solar thermal photovoltaic device of claim 2 , wherein the carbon nanotubes are vertically-aligned multiwall carbon nanotubes. 4. The solar thermal photovoltaic device of claim 2 , wherein the carbon nanotubes have an outer diameter ranging from about 10 nm to about 15 nm and length ranging from about 80 μm to about 100 μm. 5. The solar thermal photovoltaic device of claim 1 , wherein the spectrally selective emitter comprises a one-dimensional photonic crystal formed with alternating layers of Si and SiO 2 . 6. The solar thermal photovoltaic device of claim 1 , wherein the coating on the thermally conductive substrate is formed of tungsten. 7. The solar thermal photovoltaic device of claim 1 , further comprising a shield formed adjacent to the solar absorber in the inactive area or adjacent to the spectrally selective emitter in the inactive area, the shield configured to recycle parasitic radiation back to the solar thermal photovoltaic device. 8. The solar thermal photovoltaic device of claim 1 , wherein the spectrally selective emitter is configured to operate at a temperature ranging from about 800 K to about 1300 K. 9. The solar thermal photovoltaic device of claim 1 , further comprising a spring-loaded support coupled to a sidewall of the spectrally selective emitter, the thermally conductive substrate, and/or the solar absorber. 10. A method of forming a solar thermal photovoltaic device, the method comprising: forming a solar absorber on one side of a thermally conductive substrate in an active area, the solar absorber configured to absorb incident solar radiation; forming a spectrally selective emitter on another side of the thermally conductive substrate, the solar absorber and the spectrally selective emitter configured with an optimized emitter-to-absorber planar area ratio; forming a coating between the solar absorber and the thermally conductive substrate, the coating comprising a low emissivity material configured to reduce parasitic radiation from the solar thermal photovoltaic device in an inactive area around the solar absorber; and providing a photovoltaic cell in thermal communication with the spectrally selective emitter, the spectrally selective emitter configured to permit emittance for energies above a bandgap of the photovoltaic cell at a higher level than emittance for energies below the bandgap. 11. The method of claim 10 , wherein forming the solar absorber includes forming carbon nanotubes on the thermally conductive substrate. 12. The method of claim 11 , wherein forming carbon nanotubes includes forming vertically-aligned multiwall carbon nanotubes on the thermally conductive substrate. 13. The method of claim 11 , wherein the carbon nanotubes have an outer diameter ranging from about 10 nm to about 15 nm and length ranging from about 80 μm to about 100 μm. 14. The method of claim 10 , wherein forming the spectrally selective emitter includes forming a one-dimensional photonic crystal with alternating layers of Si and SiO 2 . 15. The method of claim 10 , wherein the coating on the thermally conductive substrate is formed of tungsten. 16. The method of claim 10 , further comprising: forming a shield adjacent to the solar absorber in the inactive area or adjacent to the spectrally selective emitter in the inactive area, the shield configured to recycle parasitic radiation back to the solar thermal photovoltaic device. 17. The method of claim 10 , wherein the spectrally selective emitter is configured to operate at a temperature ranging from about 800 K to about 1500 K. 18. The method of claim 10 , further comprising: providing a spring-loaded support coupled to a sidewall of the spectrally selective emitter, the thermally conductive substrate, and/or the solar absorber. 19. The solar thermal photovoltaic device of claim 1 , wherein the optimized emitter-to-absorber planar area ratio ranges from about 1 to about 20. 20. The method of claim 10 , wherein the optimized emitter-to-absorber planar area ratio ranges from about 1 to about 20.
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