Apparatus and methods for on-the-fly digital exposure image data modification

Patent metadata

Field	Value
Publication number	US-9927723-B2
Application number	US-201615080473-A
Country	US
Kind code	B2
Filing date	Mar 24, 2016
Priority date	Mar 24, 2015
Publication date	Mar 27, 2018
Grant date	Mar 27, 2018

Abstract

Embodiments of the present disclosure generally relate to apparatus and methods for performing photolithography processes. In one embodiment, a system including multiple interferometers for accurately measuring the location of a substrate during operation is provided. The system may include two chucks, and the two chucks are aligned in a first direction. The interferometers are placed along the first direction to measure the location of the substrate with respect to the first direction. The reduced distance between the interferometers and the chuck improves the accuracy of the measurement of the location of the substrate. In another embodiment, mask pattern data is provided to the system, and the mask pattern data is modified based on location and position information of the substrate. By controlling the mask pattern data with the location and position information of the substrate, less positional errors of the pattern formed on the substrate can be achieved.

First claim

The invention claimed is:

1. A system, comprising:
a slab;
two chucks disposed on the slab, wherein each chuck has a first side facing the other chuck, a second side opposite the first side, a third side connecting the first and second sides, and a fourth side opposite the third side;
a first mirror disposed on the third side of each chuck, wherein the first mirror has a reflecting surface substantially perpendicular to the third side;
a second mirror disposed on the fourth side of each chuck, wherein the second mirror has a reflecting surface substantially perpendicular to the fourth side;
a first interferometer disposed on the slab at a location adjacent the third side of one of the two chucks during operation, wherein the first interferometer is aligned with the reflecting surface of the first mirror disposed on one of the two chucks; and
a second interferometer disposed on the slab at a location adjacent the fourth side of one of the two chucks during operation, wherein the second interferometer is aligned with the reflecting surface of the second mirror disposed on one of the two chucks.

2. The system of claim 1 , further comprising a laser source and a plurality of beam splitters, wherein the laser source and the plurality of beam splitters are capable of directing a laser beam to the first and second interferometers.

3. The system of claim 2 , further comprising a wavelength tracker.

4. The system of claim 1 , wherein the first and second interferometers are high stability plane mirror interferometers.

5. A system, comprising:
a slab;
two chucks disposed on the slab, wherein the two chucks are aligned in a first direction, and wherein each chuck has a first side facing the other chuck, a second side opposite the first side, a third side connecting the first and second sides, and a fourth side opposite the third side;
a first mirror disposed on the third side of each chuck, wherein the first mirror has a reflecting surface substantially perpendicular to the third side;
a second mirror disposed on the fourth side of each chuck, wherein the second mirror has a reflecting surface substantially perpendicular to the fourth side;
a first interferometer disposed on the slab adjacent the third side of one of the two chucks during operation, wherein the first interferometer is aligned with the reflecting surface of the first mirror disposed on one of the two chucks;
a second interferometer disposed on the slab adjacent the fourth side of one of the two chucks during operation, wherein the second interferometer is aligned with the reflecting surface of the second mirror disposed on one of the two chucks, wherein the first interferometer and the second interferometer are aligned in a second direction substantially perpendicular to the first direction;
a third interferometer disposed on the slab adjacent the third side of the other of the two chucks during operation, wherein the third interferometer is aligned with the reflecting surface of the first mirror disposed on the other of the two chucks; and
a fourth interferometer disposed on the slab adjacent the fourth side of the other of the two chucks during operation, wherein the fourth interferometer is aligned with the reflecting surface of the second mirror disposed on the other of the two chucks.

6. The system of claim 5 , further comprising a fifth interferometer disposed adjacent the third side of one of the two chucks during operation.

7. The system of claim 6 , further comprising a third mirror coupled to the third side of each chuck.

8. A method, comprising:
moving a substrate under an image projection system in a first direction, wherein the substrate is disposed on a chuck;
providing mask pattern data to the image projection system;
providing location and position information of the substrate to a controller, wherein at least a portion of the location information is obtained by a first interferometer and a second interferometer, wherein the first interferometer is aligned with a reflecting surface of a first mirror disposed on a first side of the chuck, wherein the reflecting surface of the first mirror is substantially perpendicular to the first side of the chuck, wherein the second interferometer is aligned with a reflecting surface of a second mirror disposed on a second side of the chuck opposite the first side, wherein the reflecting surface of the second mirror is substantially perpendicular to the second side; and
modifying the mask pattern data using the location and position information.

9. The method of claim 8 , wherein the mask pattern data is divided into a plurality of partitions.

10. The method of claim 9 , wherein the image projection system includes a digital micro-mirror device, wherein each digital micro-mirror device includes a plurality of mirrors and a plurality of memory cells, and wherein each mirror has a corresponding memory cell.

11. The method of claim 10 , wherein each partition of the plurality of partitions of the mask pattern data is loaded into the plurality of memory cells during one process sequence of the digital micro-mirror device, and wherein modifying the mask pattern data comprises modifying one or more partitions of the mask pattern data.

12. The method of claim 11 , wherein a surface of the substrate is patterned using a plurality of process sequences of the digital micro-mirror device.

13. The method of claim 8 , wherein the position information is obtained by a camera attached to the image projection system.

14. The method of claim 8 , further comprising moving the substrate under the image projection system in a second direction, wherein the second direction is substantially perpendicular to the first direction, wherein the location information and the position information each includes a component in the first direction and a component in the second direction.

Assignees

• Applied Materials Inc

Inventors

• Johnston Benjamin M
• Laidig Thomas L
• Chen Jang Fung
• White John

Classifications

• G01B11/14

  for measuring distance or clearance between spaced objects or spaced apertures (G01B11/26 takes precedence; rangefinders G01C3/00) · CPC title

• G03F7/70775 Primary

  Position control, e.g. interferometers or encoders for determining the stage position · CPC title

• G03F7/70733

  Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask · CPC title

• G03F7/70275

  Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems · CPC title