Monolithic weighing system

Patent metadata

Field	Value
Publication number	US-9927284-B2
Application number	US-201514884890-A
Country	US
Kind code	B2
Filing date	Oct 16, 2015
Priority date	Apr 16, 2013
Publication date	Mar 27, 2018
Grant date	Mar 27, 2018

Abstract

A monolithic weighing system including a base ( 12 ), a load holder ( 26 ), which is articulated on the base ( 12 ) through a parallel link arrangement ( 16, 20 ), and a lever ( 28 ), which is articulated on the load holder ( 26 ) and which has an attachment point for a force compensating arrangement and a target area ( 32 ) for an optical position sensor ( 34 ). The target area ( 32 ) has a slotted diaphragm ( 36 ) in a thin walled lever section of the lever ( 28 ) in the deflection plane thereof. A position sensor pedestal ( 38 a, b ), which is integrally connected to the base ( 12 ), is arranged laterally adjacent to the target area ( 32 ). The position sensor pedestal has a pedestal aperture ( 40 a, b ), which extends perpendicularly to the deflection plane. The slotted diaphragm ( 36 ) of the target area ( 32 ) is laser-machined through the pedestal aperture ( 40 a, b ).

First claim

What is claimed is:

1. A monolithic weighing system, comprising:
a base,
a load holder, which is articulated on the base through a parallel link arrangement, and
a lever, which is articulated on the load holder and which has an attachment point for a force compensating arrangement and a target area for an optical position sensor,
wherein the target area has a slotted diaphragm in a thin walled lever section of the lever in a deflection plane of the lever,
wherein a position sensor pedestal, which is integrally connected to the base, is arranged laterally adjacent to the target area,
wherein the position sensor pedestal has a pedestal aperture, which extends perpendicularly to the deflection plane,
wherein a side wall of the base is arranged adjacent to the position sensor pedestal that has the pedestal aperture, and the side wall of the base has a base aperture that overlaps with the pedestal aperture, and
wherein the slotted diaphragm of the target area is laser-machined through the pedestal aperture and the base aperture.

2. A monolithic weighing system, comprising:
a base,
a load holder, which is articulated on the base through a parallel link arrangement, and
a lever, which is articulated on the load holder and which has an attachment point for a force compensating arrangement and a target area for an optical position sensor,
wherein the target area has a slotted diaphragm in a thin walled lever section of the lever in a deflection plane of the lever,
wherein a position sensor pedestal, which is integrally connected to the base, is arranged laterally adjacent to the target area,
wherein the position sensor pedestal has a pedestal aperture, which extends perpendicularly to the deflection plane,
wherein the slotted diaphragm of the target area is laser-machined through the pedestal aperture,
wherein a respective position sensor pedestal is arranged on each side of the target area and each position sensor pedestal has a pedestal aperture, such that the pedestal apertures and the target area are aligned with each other, and
wherein the position sensor pedestals are disposed between two side walls of the base, and each of the side walls has a base aperture that overlaps with the pedestal aperture that is disposed closest to the respective base aperture.

3. The monolithic weighing system, as claimed in claim 2 , wherein a photo emitter, which is aligned with the target area, is inserted into the pedestal aperture of a first of the two position sensor pedestals, and a photo detector, which is aligned with the target area, is inserted into the pedestal aperture of a second of the two position sensor pedestals.

4. The monolithic weighing system, as claimed in claim 2 , wherein the slotted diaphragm of the target area is laser-machined through both the pedestal aperture and the base aperture.

Assignees

• Sartorius Lab Instr Gmbh & Co Kg

Inventors

• Graf Winfried

Classifications

• G01G7/02 Primary

  by electromagnetic action · CPC title

• G01G23/361 Primary

  using photoelectric cells · CPC title