Bump-forming material, method for producing electronic component, method for producing semiconductor device, and semiconductor device

Patent metadata

Field	Value
Publication number	US-9926422-B2
Application number	US-201715414942-A
Country	US
Kind code	B2
Filing date	Jan 25, 2017
Priority date	Mar 9, 2016
Publication date	Mar 27, 2018
Grant date	Mar 27, 2018

Abstract

A material includes a base resin; a solvent; and a foaming agent and a photosensitizer, and/or a substance that serves as a foaming agent and a photosensitizer.

First claim

What is claimed is:

1. A material comprising:
a base resin;
a solvent; and
a foaming agent and a photosensitizer, and/or a substance that serves as a foaming agent and a photosensitizer.

2. The material according to claim 1 , wherein the base resin is a phenolic resin, an epoxy resin, an acrylic resin, a melamine resin, a polyurethane resin, a polyimide resin or a silicone resin or any combination thereof.

3. The material according to claim 1 , wherein the foaming agent is decomposed or evaporated by performing heating at a temperature of 400° C. or lower or performing irradiation with infrared rays.

4. The material according to claim 1 , wherein the foaming agent is a thermally decomposable resin that has a molecular weight of 10 to 100,000.

5. The material according to claim 1 , wherein the foaming agent is either an acrylic-based resin or a polystyrene-based resin.

6. The material according to claim 1 , wherein an amount of the foaming agent contained is 0.1 parts by mass to 200 parts by mass with respect to 100 parts by mass of the base resin.

7. The material according to claim 1 , wherein the solvent contains an alcohol solvent, a chain ester solvent, a cyclic ester solvent, a ketone solvent, a chain ether solvent or a cyclic ether solvent or any combination thereof.

8. The material according to claim 1 , further comprising a crosslinker.

9. The material according to claim 8 , wherein the crosslinker contains a urea derivative, a melamine derivative or a uril derivative or any combination thereof.

10. The material according to claim 1 , further comprising a reducing agent that has a carboxyl group.

11. The material according to claim 10 , wherein the reducing agent contains acrylic acid, methacrylic acid, oxalic acid or formic acid or any combination thereof.

12. A method for producing an electronic component, the method comprising:
forming a pattern that has an opening on a substrate by using a material; and
forming a bump by filling the opening of the pattern with a bump metal,
wherein the material contains a base resin and a solvent, and further contains a foaming agent and a photosensitizer, and/or a substance that serves a foaming agent and a photosensitizer.

13. A semiconductor device comprising:
a first substrate;
a second substrate configured to be bonded to the first substrate via a bonded part in which two bumps are bonded to each other; and
a porous film configured to be interposed between the first substrate and the second substrate, the porous film containing a decomposition residue derived from a photosensitizer.

14. The semiconductor device according to claim 13 , wherein the semiconductor device is a sensor.

Assignees

• Fujitsu Ltd

Inventors

• Kon Junichi

Classifications

• H10W99/00

  Subject matter not provided for in other groups of this subclass · CPC title

• H10W90/732

  between stacked chips · CPC title

• H10W90/722

  between stacked chips · CPC title

• H10W72/07352

  changes in structures or sizes · CPC title

• H10W72/07341

  Controlling the bonding environment, e.g. atmosphere composition or temperature · CPC title