Radiation source, metrology apparatus, lithographic system and device manufacturing method

Patent metadata

Field	Value
Publication number	US-9924585-B2
Application number	US-201415103721-A
Country	US
Kind code	B2
Filing date	Nov 14, 2014
Priority date	Dec 13, 2013
Publication date	Mar 20, 2018
Grant date	Mar 20, 2018

Abstract

A radiation source apparatus comprising: a container ( 400 ) for being pressurized with a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation ( 50 ), wherein said container is operable ( 66, 67 ) substantially to remove radiation with a wavelength of 10-400 nm from said plasma emitted radiation before said plasma emitted radiation exits said container as output radiation. In an embodiment the container comprises: an inlet radiation transmitting element ( 64 ) operable to transmit said driving radiation from outside said container to inside said container, and an outlet radiation transmitting element ( 65 ) operable to transmit at least some of said plasma emitted radiation from inside said container to outside said container as output radiation; wherein at least one of said inlet and outlet radiation transmitting elements comprises a plane parallel plate.

First claim

The invention claimed is:

1. A radiation source apparatus comprising:
a container arranged to be pressurized with a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation,
wherein said container is configured to remove all radiation with a wavelength of 10-400 nm from said plasma emitted radiation before said plasma emitted radiation exits said container as output radiation.

2. The radiation source apparatus of claim 1 , wherein said container further comprises an outlet radiation transmitting element operable to transmit at least some of said plasma emitted radiation from inside said container to outside said container.

3. The radiation source apparatus of claim 2 , wherein said outlet radiation transmitting element comprises a plane parallel plate.

4. The radiation source apparatus of claim 2 , wherein said outlet radiation transmitting element is positioned at least 10 mm from the plasma.

5. The radiation source apparatus of claim 2 , wherein said outlet radiation transmitting element is operable substantially to remove radiation with a wavelength of 10-400 nm from said plasma emitted radiation and/or radiation with a wavelength of 700-1000 nm from said plasma emitted radiation before the plasma emitted radiation exits said container as output radiation.

6. The radiation source apparatus of claim 5 , wherein said outlet radiation transmitting element comprises a coating for substantially reflecting and/or absorbing radiation with a wavelength of 10-400 nm from said plasma emitted radiation and/or radiation with a wavelength of 700-1000 nm from said plasma emitted radiation.

7. The radiation source apparatus of claim 6 , wherein said coating is on a side of said radiation transmitting element facing the plasma.

8. The radiation source apparatus of claim 5 , wherein said outlet radiation transmitting element is comprised of a material which absorbs radiation with a wavelength of 10-400 nm from said plasma emitted radiation and/or radiation with a wavelength of 700-1000 nm from said plasma emitted radiation.

9. The radiation source apparatus of claim 5 , wherein said coating comprises TiO 2 or said material is doped with TiO 2 .

10. The radiation source apparatus of claim 1 , further comprising two or more electrodes positioned on opposite sides of a plasma forming location at which said plasma is formed, for use in igniting the plasma prior to operation.

11. The radiation source apparatus of claim 1 , wherein at least part of an inner surface of the container is at least partly reflective to said plasma induced radiation.

12. The radiation source apparatus of claim 1 , further comprising a rotator for rotating the container around an axis.

13. The radiation source apparatus of claim 12 , wherein the rotator is configured to rotate the container at more than 100 revolutions per minute.

14. The radiation source apparatus of claim 12 , wherein the rotator is for rotating the container around an axis around which the container is substantially symmetrical.

15. The radiation source apparatus of claim 14 , wherein the driving radiation enters and/or the output radiation exits the container in a direction substantially parallel to the axis around which the container is rotated.

16. The radiation source apparatus of claim 1 , further comprising:
a driving system configured to generate and form said driving radiation into at least one beam focused on a plasma foaming location within the container, and
a collecting optical system configured to collect and form the output radiation into at least one beam of radiation.

17. The radiation source apparatus of claim 16 , wherein said driving system includes at least one laser for generating said beam of radiation.

18. The radiation source apparatus of claim 16 , wherein:
said driving radiation has wavelengths predominantly in a first range comprising infrared wavelengths, and
said plasma emitted radiation has wavelengths predominantly in a second range different from the first range, the second range comprising visible and/or ultraviolet radiation.

19. An inspection apparatus for measuring a property of a structure on a substrate, the apparatus comprising:
a support for the substrate having said structure thereon;
an optical system for illuminating the structure under predetermined illumination conditions and for detecting predetermined portions of radiation diffracted by the component target structures under said illumination conditions;
a processor arranged to process information characterizing the detected radiation to obtain a measurement of said property of the structure,
wherein said optical system includes a radiation source apparatus comprising,
a container arranged to be pressurized with a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation,
wherein said container is configured to remove all radiation with a wavelength of 10-400 nm from said plasma emitted radiation before said plasma emitted radiation exits said container as output radiation.

20. A lithographic system comprising:
a lithographic apparatus comprising:
an illumination optical system arranged to illuminate a pattern;
a projection optical system arranged to project an image of the pattern onto a substrate; and
an inspection apparatus comprising,
a support for the substrate having a structure thereon;
an optical system for illuminating the structure under predetermined illumination conditions and for detecting predetermined portions of radiation diffracted by the component target structures under said illumination conditions;
a processor arranged to process information characterizing the detected radiation to obtain a measurement of said property of the structure,
wherein said optical system includes a radiation source apparatus comprising, a container arranged to be pressurized with a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation, wherein said container is configured to remove all radiation with a wavelength of 10-400 nm from said plasma emitted radiation before said plasma emitted radiation exits said container as output radiation,

wherein the lithographic apparatus is arranged to use the measurement results from the inspection apparatus in applying the pattern to further substrates.

21. A method of measuring a property of structures that have been formed by a lithographic process on a substrate, the method comprising:
illuminating said structures using output radiation of a radiation source apparatus comprising a container arranged to be pressurized with a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation, wherein said container is configured to remove all radiation with a wavelength of 10-400 nm from said plasma emitted radiation before said plasma emitted radiation exits said container as output radiation;
detecting radiation diffracted by the structures; and
determining from properties of said diffracted radiation one or more properties of the structure.

22. A method of manufacturing devices wherein a device pattern is applied to a series of substrates using a lithographic process, the method comprising:
inspecting at least one composite target structure forme

Assignees

• Asml Netherlands Bv

Inventors

• Van Heumen Martijn Petrus Christianus

Classifications

• H01J65/04 Primary

  Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating {plasma display panels} · CPC title

• G01N21/9501 Primary

  Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20) · CPC title

• H01J61/35

  provided with coatings on the walls thereof; Selection of materials for the coatings (using coloured coatings H01J61/40; using luminescent coatings H01J61/42) · CPC title

• H01J61/54

  Igniting arrangements, e.g. promoting ionisation for starting · CPC title

• H01J65/00

  Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel · CPC title