Manufacturing method of semiconductor device
US-9006043-B2 · Apr 14, 2015 · US
US9923039B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9923039-B2 |
| Application number | US-201514596556-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 14, 2015 |
| Priority date | Jul 28, 2014 |
| Publication date | Mar 20, 2018 |
| Grant date | Mar 20, 2018 |
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A display device includes a substrate and first, second and third thin film transistor. The first thin film transistor is disposed over the substrate, and includes a first gate electrode which has a first transmittance. The second thin film transistor is disposed over the substrate, and includes a second gate electrode which has a second transmittance substantially different from the first transmittance. The third thin film transistor is disposed over the substrate, and includes a third gate electrode which has a third transmittance substantially different from the first transmittance.
Opening claim text (preview).
What is claimed is: 1. A display panel comprising: a substrate comprising a major surface which comprises a first region, a second region and a third region when viewed in a direction perpendicular to the major surface; a first semiconductor device disposed over the first region of the substrate and comprising: a first active layer portion; a gate insulation layer covering the first active layer portion; a first gate electrode disposed over the gate insulation layer, the first gate electrode of the first semiconductor device comprising a substantially transparent conductive material and having a first transmittance; and a first source electrode and a first drain electrode contacting the first active layer portion; a second semiconductor device disposed over the second region of the substrate and comprising a second gate electrode, the second gate electrode of the second semiconductor device having a second transmittance substantially different from the first transmittance; and a third semiconductor device disposed over the third region of the substrate and comprising a third gate electrode, the third gate electrode of the third semiconductor device having a third transmittance substantially different from the first transmittance. 2. The display panel of claim 1 , wherein the first transmittance is substantially greater than the second transmittance and the third transmittance. 3. The display panel of claim 2 , wherein the second transmittance is substantially identical to the third transmittance. 4. The display panel of claim 1 , wherein the second semiconductor device comprises: a second active layer portion; the gate insulation layer covering the second active layer portion; the second gate electrode disposed over the gate insulation layer, the second gate electrode comprising a first gate electrode layer portion comprising a substantially transparent conductive material and a second gate electrode layer portion comprising a substantially opaque conductive material disposed over the first gate electrode layer portion; and a second source electrode and a second drain electrode contacting the second active layer portion. 5. The display panel of claim 4 , wherein the third semiconductor device comprises: a third active layer portion; the gate insulation layer covering the third active layer portion; the third gate electrode disposed over the gate insulation layer, the third gate electrode comprising a third gate electrode layer portion comprising a substantially transparent conductive material and a fourth gate electrode layer portion comprising a substantially opaque conductive material disposed over the third gate electrode layer portion; and a third source electrode and a third drain electrode contacting the third active layer portion. 6. The display panel of claim 5 , wherein each of the substantially transparent conductive materials comprises at least one selected from the group consisting of indium tin oxide, indium zinc oxide, zinc oxide, tin oxide, gallium oxide and indium oxide. 7. The display panel of claim 5 , wherein each of the substantially opaque conductive materials comprises at least one selected from the group consisting of chromium (Cr) based-metal, aluminum (Al) based-metal, silver (Ag) based-metal, tin (Sn) based-metal, molybdenum (Mo) based-metal, iron (Fe) based-metal, platinum (Pt) based-metal and mercury (Hg) based-metal. 8. The display panel of claim 1 , wherein the second semiconductor device comprises: a second active layer portion; the gate insulation layer covering the second active layer portion; the second gate electrode disposed over the gate insulation layer, the second gate electrode comprising a substantially opaque conductive material; and a second source electrode and a second drain electrode contacting the second active layer portion. 9. The display panel of claim 8 , wherein the third semiconductor device comprises: a third active layer portion; the gate insulation layer covering the third active layer portion; the third gate electrode disposed over the gate insulation layer, the third gate electrode comprising a substantially opaque conductive material; and a third source electrode and a third drain electrode contacting the third active layer portion. 10. An organic light emitting display device comprising: the display panel of claim 1 ; a first electrode disposed over the substrate and contacting the third semiconductor device; an organic light emitting structure disposed over the first electrode; and a second electrode disposed over the organic light emitting structure.
Electricity · mapped topic
Electricity · mapped topic
Interconnections, e.g. scanning lines · CPC title
comprising manufacture, treatment or patterning of TFT semiconductor bodies · CPC title
wherein the TFTs are in active matrices · CPC title
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