Simultaneous multi-angle spectroscopy

Patent metadata

Field	Value
Publication number	US-9921104-B2
Application number	US-201615344825-A
Country	US
Kind code	B2
Filing date	Nov 7, 2016
Priority date	Jun 11, 2016
Publication date	Mar 20, 2018
Grant date	Mar 20, 2018

Abstract

Methods and systems for performing simultaneous spectroscopic measurements of semiconductor structures over a broad range of angles of incidence (AOI), azimuth angles, or both, are presented herein. Spectra including two or more sub-ranges of angles of incidence, azimuth angles, or both, are simultaneously measured over different sensor areas at high throughput. Collected light is linearly dispersed across different photosensitive areas of one or more detectors according to wavelength for each subrange of AOIs, azimuth angles, or both. Each different photosensitive area is arranged on the one or more detectors to perform a separate spectroscopic measurement for each different range of AOIs, azimuth angles, or both. In this manner, a broad range of AOIs, azimuth angles, or both, are detected with high signal to noise ratio, simultaneously. This approach enables high throughput measurements of high aspect ratio structures with high throughput, precision, and accuracy.

First claim

What is claimed is:

1. A metrology system comprising:
one or more illumination sources configured to generate an amount of broadband illumination light;
an illumination optics subsystem configured to direct the amount of illumination light from the illumination source to a measurement spot on a surface of a specimen under measurement at multiple angles of incidence, multiple azimuth angles, or a combination thereof;
a collection optics subsystem configured to collect an amount of collected light from the measurement spot on the surface of the specimen, the collection optics subsystem having a measurement pupil;
one or more detectors each having a planar, two-dimensional surface sensitive to incident light; and
a pupil segmentation and dispersion device configured to segment an image of the measurement pupil into two or more pupil segments and disperse the two or more pupil segments onto the one or more detectors over spatially distinct areas, wherein each pupil segment includes signal information associated with distinct sub-ranges of the multiple angles of incidence, multiple azimuth angles, or a combination thereof.

2. The metrology system of claim 1 , wherein the pupil segmentation and dispersion device comprises:
a first diffractive element having an incidence surface located in an optical path of the collection optics subsystem at or near an image plane of the measurement pupil, wherein a first pupil segment is a portion of the collected light incident on the incidence surface of the first diffractive element; and
a second diffractive element having an incidence surface located in the optical path of the collection optics subsystem at or near the image plane of the measurement pupil, wherein a second pupil segment is a portion of the collected light incident on the incidence surface of the second diffractive element, wherein a normal to the incidence surface of the first diffractive element is oriented at a first angle with respect to a normal to the incidence surface of the second diffractive element.

3. The metrology system of claim 2 , wherein each of the first diffractive element and the second diffractive element is a reflective grating structure, a transmissive grating structure, or a dispersive prism structure.

4. The metrology system of claim 3 , wherein an axis angle associated with the first angle between the first diffractive element and the second diffractive element is oriented parallel to a blaze direction of the first diffractive element.

5. The metrology system of claim 3 , wherein an axis angle associated with the first angle between the first diffractive element and the second diffractive element is oriented perpendicular to a blaze direction of the first diffractive element.

6. The metrology system of claim 3 , wherein an axis angle associated with the first angle between the first diffractive element and the second diffractive element is oriented at an oblique angle with respect to a blaze direction of the first diffractive element.

7. The metrology system of claim 2 , wherein the pupil segmentation and dispersion device further comprises:
a third diffractive element having an incidence surface located in the optical path of the collection optics subsystem near the image plane of the measurement pupil, wherein a third pupil segment is a portion of the collected light incident on the incidence surface of the third diffractive element, wherein a normal to the incidence surface of the first diffractive element is oriented at a second angle with respect to a normal to the incidence surface of the third diffractive element.

8. The metrology system of claim 7 , wherein an axis angle associated with the second angle between the first diffractive element and the third diffractive element is equal in magnitude and opposite the direction of the axis angle associated with the first angle between the first diffractive element and the second diffractive element.

9. The metrology system of claim 3 , wherein a grating pitch of the first diffractive element is different from a grating pitch of the second diffractive element.

10. The metrology system of claim 1 , wherein the pupil segmentation and dispersion device is configurable within the metrology system, interchangeable with another pupil segmentation and dispersion device, or both.

11. The metrology system of claim 1 , wherein a first of the one or more detectors includes two or more different surface areas each having different photosensitivity, wherein the two or more different surface areas are aligned with a direction of wavelength dispersion across the surface of the first detector.

12. The metrology system of claim 1 , wherein a second of the one or more detectors measures background noise.

13. The metrology system of claim 1 , wherein the amount of broadband illumination light includes a range of wavelengths including infrared, visible, and ultraviolet wavelengths.

14. The metrology system of claim 1 , wherein the metrology system is configured as a spectroscopic ellipsometer, a spectroscopic reflectometer, or a combination thereof.

15. The metrology system of claim 1 , further comprising:
a computing system configured to generate an estimated value of a parameter of interest of the specimen under measurement based on an analysis of the output of the one or more detectors.

16. A metrology system comprising:
an illumination optics subsystem configured to direct the amount of broadband illumination light from an illumination source to a measurement spot on a surface of a specimen under measurement at multiple angles of incidence, multiple azimuth angles, or a combination thereof;
a collection optics subsystem configured to collect an amount of collected light from the measurement spot on the surface of the specimen, the collection optics subsystem having a measurement pupil;
one or more detectors each having a planar, two-dimensional surface sensitive to incident light;
a first diffractive element having an incidence surface located in an optical path of the collection optics subsystem near an image plane of the measurement pupil, wherein a first pupil segment is a portion of the collected light incident on the incidence surface of the first diffractive element, wherein the first diffractive element disperses the first pupil segment over a first photosensitive area of the one or more detectors; and
a second diffractive element having an incidence surface located in the optical path of the collection optics subsystem near the image plane of the measurement pupil, wherein a second pupil segment is a portion of the collected light incident on the incidence surface of the second diffractive element, wherein the second diffractive element disperses the second pupil segment over a second photosensitive area of the one or more detectors that is spatially distinct from the first photosensitive area, and wherein a normal to the incidence surface of the first diffractive element is oriented at a first angle with respect to a normal to the incidence surface of the second diffractive element.

17. The metrology system of claim 16 , wherein each of the first diffractive element and the second diffractive element is a reflective grating structure, a transmissive grating structure, or a dispersive prism structure.

18. The metrology system of claim 16 , wherein a first of the one or more detectors includes two or more different surface areas each having different photosensitivity, wherein the two or more different surface areas are aligned with a direction of wavelength dispersion across the surface o

Assignees

• Kla Tencor Corp

Inventors

• Krishnan Shankar
• Buettner Alexander
• Purrucker Kerstin
• Wang David Y

Classifications

• G03F7/70625

  Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness · CPC title

• G01J3/0224

  using polarising or depolarising elements · CPC title

• G01N21/255 Primary

  Details, e.g. use of specially adapted sources, lighting or optical systems · CPC title

• G01J3/18

  using diffraction elements, e.g. grating (gratings per se G02B) · CPC title

• G01N21/27

  using photo-electric detection (G01N21/31 takes precedence){; circuits for computing concentration (logarithmic circuits G06G7/24; photometric circuits in general G01J)} · CPC title