Methods and apparatus for ultrathin catalyst layer for photoelectrode

US9920438B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9920438-B2
Application numberUS-201213544940-A
CountryUS
Kind codeB2
Filing dateJul 9, 2012
Priority dateJul 7, 2011
Publication dateMar 20, 2018
Grant dateMar 20, 2018

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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In exemplary implementations of this invention, a photoelectrode includes a semiconductor for photocarrier generation, and a catalyst layer for altering the reaction rate in an adjacent electrolyte. The catalyst layer covers part of the semiconductor. The thickness of the catalyst layer is less than 60% of its minority carrier diffusion distance. If the photoelectrode is a photoanode, it has an OEP that is more than the potential of the valance band edge but less than the potential of the Fermi level of the semiconductor. If it is a photocathode, it has an RHE potential that is less than the potential of the conduction band edge but more than the potential of the Fermi level of the semiconductor. The absolute value of difference (OEP minus potential of valence band edge, or RHE potential minus potential of conduction band edge) is greater than zero and less than or equal to 0.2V.

First claim

Opening claim text (preview).

What is claimed is: 1. A photoanode that includes: (a) a semiconductor for photocarrier generation; and (b) a catalyst layer for altering the rate of an electrochemical reaction in an electrolyte adjacent to the catalyst layer; wherein (i) the semiconductor primarily comprises a first material and the catalyst layer primarily comprises a second material, the first material being different than the second material, (ii) the catalyst layer covers a portion of the semiconductor's surface, (iii) the thickness of the catalyst layer is less than 60% of the minority carrier diffusion distance of the catalyst layer, (iv) the photoanode is adapted to have an OEP that is more than the potential of the valance band edge of the semiconductor and less than the potential of the Fermi level of the semiconductor, the absolute value of the difference between the OEP and the potential of the valence band edge being greater than zero and less than or equal to 0.2V, and (v) the interior of the semiconductor is doped with a first n-type dopant at a first dopant concentration, and an exterior region of the semiconductor that is not covered by the catalyst layer is doped with a second n-type dopant at a second dopant concentration, the second dopant concentration being greater than the first dopant concentration. 2. The photoanode of claim 1 , wherein the first n-type dopant and second n-type dopant both comprise phosphorous. 3. A photoelectrochemical cell, wherein: (a) the photoectrochemical cell includes a photoanode; (b) the photoanode includes a semiconductor for photocarrier generation and a catalyst layer for altering the rate of an electrochemical reaction in an electrolyte adjacent to the catalyst layer; (c) the semiconductor primarily comprises a first material and the catalyst layer primarily comprises a second material, the first material being different than the second material; (d) the catalyst layer covers a portion of the semiconductor's surface; (e) the thickness of the catalyst layer is less than 60% of the minority carrier diffusion distance of the catalyst layer; (f) the photoanode is adapted to have an OEP that is more than the potential of the valance band edge of the semiconductor and less than the potential of the Fermi level of the semiconductor, the absolute value of the difference between the OEP and the potential of the valence band edge being greater than zero and less than or equal to 0.2V; and (g) the interior of the semiconductor is doped with an n-type dopant, and an exterior region of the semiconductor that is not covered by the catalyst layer is doped with an n+dopant.

Assignees

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Classifications

  • characterised by shape or form · CPC title

  • Chemistry & Metallurgy · mapped topic

  • Dye sensitized solar cells · CPC title

  • comprising mixed oxides, e.g. ZnO covered TiO2 particles · CPC title

  • C25B1/003Primary

    Chemistry & Metallurgy · mapped topic

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What does patent US9920438B2 cover?
In exemplary implementations of this invention, a photoelectrode includes a semiconductor for photocarrier generation, and a catalyst layer for altering the reaction rate in an adjacent electrolyte. The catalyst layer covers part of the semiconductor. The thickness of the catalyst layer is less than 60% of its minority carrier diffusion distance. If the photoelectrode is a photoanode, it has an…
Who is the assignee on this patent?
Jun Kimin, Jacobson Joseph, Massachusetts Inst Technology
What technology area does this patent fall under?
Primary CPC classification C25B1/003. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 20 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).