Method for synthesis of polymer containing multiple epoxy groups

US9920160B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9920160-B2
Application numberUS-201515305090-A
CountryUS
Kind codeB2
Filing dateApr 29, 2015
Priority dateSep 3, 2014
Publication dateMar 20, 2018
Grant dateMar 20, 2018

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for a synthesis of a polymer containing multiple epoxy groups includes steps of: under protection of nitrogen or argon, with a photosensitive free radical initiator under an ultraviolet light irradiation, initiating a mixture of a dithiol compound and alkynyl glycidyl ether or other alkynyl-containing compounds to proceed a thiol-yne polymerization, so as to obtain the polymer. The number of the epoxy groups is able to be adjusted through changing a type of a dithiol monomer, a mixing ratio of the dithiol monomer, and a mixing ratio between the alkynyl glycidyl ether and other alkynyl compounds. The present invention has advantages of: fast reaction, convenient process, easy post-processing, a large number of the epoxy groups, and adjustable and controllable content. The obtained polymer has a wide potential application in fields of coating, adhesive, ink, encapsulating material, resin for composite material, additive, high performance material, function material, and so on.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for a synthesis of a polymer containing multiple epoxy groups comprises steps of: under protection of nitrogen or argon, successively adding 1 mole of substance A, 0.5-10 moles of solvent, 0.9-1.1 moles of substance B, and 0.005-0.05 moles of photosensitive free radical initiator into a reactor; irradiating with an ultraviolet light for 0.5-4.0 hours; and, after precipitating, separating, and drying, obtaining the polymer containing the multiple epoxy groups; wherein: the substance A is obtained through mixing at least one member selected from the group consisting of 1,3-propanedithiol, 1,4-butanedithiol, 1,5-pentanedithiol, 1,6-hexanedithiol, 1,8-octanedithiol, 3,6-dioxa-1,8-octanedithiol, bis(2-mercaptoethyl) ether, butylene glycol bis (3-mercaptopropionate), 2,3-dimercapto-1-propanol and 1,4-dithiothreitol in any proportion; the substance B is alkynyl glycidyl ether or a mixture of the alkynyl glycidyl ether and a substance C; and, the substance C is obtained through mixing at least one member selected from the group consisting of 1-octyne, 1-hexyne, undecyne, hexadecyne, propyl cyclohexyl pentyne, 4-ethylphenylacetylene, propylphenylacetylene, butylphenylacetylene, ethyl cyclohexyl phenyl acetylene, butyl cyclohexyl phenyl acetylene, pentylphenylacetylene, pentyl cyclohexyl phenyl acetylene, dimethylphenylacetylene, 3,3-dimethylacetylene, 3-aminophenylacetylene, butynol, cyanoacetylene, pentyloxyphenylacetylene, 3-hydroxy-1-heptyne, 3-ethyl-3-hydroxyheptyne, phenyl propargyl sulfide, 5-hydroxypentyne, diethylpentyne, and ethyl propargyl ether in any proportion; the photosensitive free radical initiator is obtained through mixing at least one member selected from the group consisting of benzoin dimethyl ether, 1-hydroxycyclohexyl phenyl ketone, benzophenone, 4-chlorobenzophenone, 4-methylbenzophenone, 4-phenylbenzophenone, isopropylthioxanthone, 2-hydroxy-2-methylpropiophenone, 2-methyl-4-(methylthio)-2-morpholinopropiophenone, methyl phenylglyoxylate, methyl 2-benzoylbenzoate, 2-ethylhexyl 4-(dimethylamino)benzoate, ethyl 4-(N,N-dimethylamino)benzoate, phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide, diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide, ethyl phenyl(2,4,6-trimethylbenzoyl)phosphinate, a mixture of the benzophenone and the 1-hydroxycyclohexyl phenyl ketone with a mass ratio of 1:1, and a mixture of the 1-hydroxycyclohexyl phenyl ketone and the 2-hydroxy-2-methylpropiophenone with a mass ratio of 1:4 in any proportion; and the solvent is obtained through mixing at least one member selected from the group consisting of methylbenzene, benzene, chloroform, dichloromethane, tetrahydrofuran, 1,4-dioxane, ethyl acetate, butyl acetate, N-methylpyrrolidone, N,N-dimethylformamide, and N,N-dimethylacetamide in any proportion.

Assignees

Inventors

Classifications

  • obtained by polymerisation of unsaturated mono-epoxy compounds · CPC title

  • containing sulfur · CPC title

  • C08G59/022Primary

    characterised by the preparation process or apparatus used · CPC title

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What does patent US9920160B2 cover?
A method for a synthesis of a polymer containing multiple epoxy groups includes steps of: under protection of nitrogen or argon, with a photosensitive free radical initiator under an ultraviolet light irradiation, initiating a mixture of a dithiol compound and alkynyl glycidyl ether or other alkynyl-containing compounds to proceed a thiol-yne polymerization, so as to obtain the polymer. The num…
Who is the assignee on this patent?
Univ Zhejiang
What technology area does this patent fall under?
Primary CPC classification C08G59/022. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 20 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).