Halogen free synthesis of aminosilanes by catalytic dehydrogenative coupling

Patent metadata

Field	Value
Publication number	US-9920078-B2
Application number	US-201615245559-A
Country	US
Kind code	B2
Filing date	Aug 24, 2016
Priority date	Sep 27, 2013
Publication date	Mar 20, 2018
Grant date	Mar 20, 2018

Abstract

Compounds and method of preparation of Si—X and Ge—X compounds (X═N, P, As and Sb) via dehydrogenative coupling between the corresponding unsubstituted silanes and amines (including ammonia) or phosphines catalyzed by metallic catalysts is described. This new approach is based on the catalytic dehydrogenative coupling of a Si—H and a X—H moiety to form a Si—X containing compound and hydrogen gas (X═N, P, As and Sb). The process can be catalyzed by transition metal heterogenous catalysts such as Ru(0) on carbon, Pd(0) on MgO) as well as transition metal organometallic complexes that act as homogeneous catalysts. The —Si—X products produced by dehydrogenative coupling are inherently halogen free. Said compounds can be useful for the deposition of thin films by chemical vapor deposition or atomic layer deposition of Si-containing films.

First claim

We claim:

1. A halogen free precursor compound having the formula:

where E=Si; n 1 =1; n 2 =1; k=1; R 1 and R 2 =silyl; R 3 and R 4 are independently selected from H, linear or branched C 1 to C 6 alkyl, linear or branched C 1 to C 8 alkenyl, linear or branched C 1 to C 8 alkynyl, C 6 to C 10 aryl, linear or branched C 1 to C 6 alkyl ether; and the detectable amount of halogen is less than 5 ppm.

2. The halogen free precursor compound of claim 1 , wherein R 3 and R 4 ═C 1 to C 6 alkyl.

3. The halogen free precursor compound of claim 2 , wherein R 3 and R 4 =Et.

4. The halogen free precursor compound of claim 2 , wherein R 3 and R 4 =iPr.

5. A method of preparing a precursor compound having the formula:

where E=Si, n 1 =1; n 2 =1; k=1; R 1 and R 2 =silyl; R 3 and R 4 are independently selected from H, linear or branched C 1 to C 6 alkyl, linear or branched C 1 to C 8 alkenyl, linear or branched C 1 to C 8 alkynyl, C 6 to C 10 aryl, linear or branched C 1 to C 6 alkyl ether; the amino groups may be bound to any E atom, comprising:
a) contacting the reactants R 1 R 2 NH and R 3 R 4 NH and E k H 2(k+1) in the presence of a transition metal catalyst forming a reaction mixture;
b) optionally adding a solvent to the reaction mixture;
c) maintaining the reaction mixture at a temperature between about 0° C. to about 300° C.;
d) allowing the reaction to proceed to form the (R 1 R 2 N) n1 (R 3 R 4 N) n2 E k H (2(k+1)−n1−n2) precursor compound;
e) separating the (R 1 R 2 N) n1 (R 3 R 4 N) n2 E k H (2(k+1)−n1−n2) precursor compound from the reaction mixture;

wherein the reaction mixture temperature may vary during the synthesis and is maintained such that the temperature of the reaction mixture is not allowed to drop below about 0° C. and not exceed about 300° C.

6. The method of claim 5 , wherein the catalyst is selected from the group consisting of Ru, Pd, Rh, Ir, Fe, Ni, Pt, Cr, Cu and Au.

7. The method of claim 5 , wherein R 3 and R 4 ═C 1 to C 6 alkyl.

8. The method of claim 7 , wherein R 3 and R 4 =Et.

9. The method of claim 7 , wherein R 3 and R 4 =iPr.

Assignees

• Air Liquide

Inventors

• Sanchez Antonio
• Itov Gennadiy
• Zhang Peng
• Stephens Matthew Damien
• Khandelwal Manish

Classifications

• H10P14/6687

  the compound comprising silicon and nitrogen · CPC title

• H10P14/20

  of semiconductor materials · CPC title

• B01J23/26

  Chromium · CPC title

• C07F7/025 Primary

  without C-silicon linkages · CPC title

• C23C16/442

  using fluidised bed process · CPC title