Microchip-type optical measuring apparatus and optical position adjusting method thereof

Patent metadata

Field	Value
Publication number	US-9915935-B2
Application number	US-201314386499-A
Country	US
Kind code	B2
Filing date	Jan 28, 2013
Priority date	Mar 30, 2012
Publication date	Mar 13, 2018
Grant date	Mar 13, 2018

Abstract

To provide a microchip-type optical measuring apparatus which is able to automatically perform position adjustment of a microchip with respect to an optical axis of laser with high accuracy.
A microchip-type optical measuring apparatus includes an irradiation detection unit which detects light generated by irradiating a microchip with laser, a position adjustment unit which changes a relative position of the microchip with respect to the irradiation detection unit, and a control unit which outputs a movement signal for a position in which an integrated value or an average value of a detected intensity of the light in a preset region becomes high to the position adjustment unit.

First claim

The invention claimed is:

1. A microchip-type optical measuring apparatus, comprising:
an irradiation detector configured to detect light generated by irradiating a microchip with a laser;
a position adjustment unit comprising at least one motor, wherein the position adjustment unit is configured to change a relative position of the microchip with respect to the irradiation detector; and
a processor configured to output a movement signal for a position selected based on an integrated value or an average value of a detected intensity of the light in at least one region, wherein:
the processor is configured to use a stochastic method to estimate a distribution parameter of a probability distribution for modeling a relationship between the detected position of the light and the integrated value or the average value of the detected intensity of the light in the at least one region.

2. The microchip-type optical measuring apparatus according to claim 1 , wherein the processor is configured to:
generate the movement signal for the selected position based on a result of using the stochastic method to estimate the distribution parameter.

3. The microchip-type optical measuring apparatus according to claim 2 , wherein the processor is configured to select the probability distribution according to an irradiation profile of the laser.

4. The microchip-type optical measuring apparatus according to claim 1 , wherein the processor is configured to output the movement signal for the selected position based on a variation coefficient of the integrated value or the average value of the detected intensity of the light at a plurality of points.

5. The microchip-type optical measuring apparatus according to claim 4 , wherein the processor is configured to output a movement signal for an area based on an area average of the integrated value of the detected intensity in a plurality of areas.

6. The microchip-type optical measuring apparatus according to claim 5 , wherein the processor is configured to output the movement signal for the selected position based on the integrated value of the detected intensity at the plurality of points.

7. The microchip-type optical measuring apparatus according to claim 6 , wherein the processor is configured to output a movement signal for a first position based on the integrated value of the detected intensity in the area, or for a second position based on the variation coefficient in the area.

8. The microchip-type optical measuring apparatus according to claim 7 , wherein the processor is configured to output the movement signal for the second position to the position adjustment unit when the first position and the second position are different from each other.

9. The microchip-type optical measuring apparatus according to claim 8 , wherein the microchip-type optical measuring apparatus is a microchip-type microparticle measuring apparatus.

10. An optical position adjusting method of a microchip-type optical measuring apparatus, comprising acts of:
detecting light which is generated from a microchip by laser irradiation, from a plurality of positions on the microchip; and
specifying a position based on an integrated value or an average value of a detected intensity of the light in at least one region, wherein:
the position is specified based on a probability distribution for modeling a relationship between a detected position of the light and the integrated value or the average value of the detected intensity of the light; and
a distribution parameter of the probability distribution is estimated based on a stochastic method.

11. The optical position adjusting method according to claim 10 , wherein:
the position is specified based on a result of estimating the distribution parameter.

12. The optical position adjusting method according to claim 11 , wherein the probability distribution comprises a two-dimensional distribution.

13. The optical position adjusting method according to claim 12 , further comprising acts of:
estimating the distribution parameter of the probability distribution based on the stochastic method; and
specifying the position based on the integrated value or the average value of the detected intensity of the light.

14. The optical position adjusting method according to claim 10 ,
wherein the position is set to a position based on a variation coefficient of the integrated value or the average value of the detected intensity of the light at a plurality of points.

15. The optical position adjusting method according to claim 14 , wherein:
the position is specified further based on an area average of the integrated value of the detected intensity of the light in a plurality of areas.

16. The optical position adjusting method according to claim 15 , further comprising an act of:
specifying a first position based on the integrated value of the detected intensity in a selected area.

17. The optical position adjusting method according to claim 16 ,
wherein the position is specified based on a second position specified based on the variation coefficient in the area.

18. The optical position adjusting method according to claim 17 , further comprising an act of:
setting a relative position of the microchip with respect to the laser to the first position or the second position.

19. The optical position adjusting method according to claim 18 , wherein the relative position is set to the second position when the first position and the second position are different from each other.

20. An optical position adjusting method of a microchip-type optical measuring apparatus, comprising acts of:
detecting light which is generated from a microchip by laser irradiation, from a plurality of positions in an area on the microchip;
specifying a position based on an area average of an integrated value of a detected intensity of the light;
specifying a first position based on the integrated value or an average value of the detected intensity in the area, wherein:
the first position is specified based on a probability distribution for modeling a relationship between a detected position of the light and the integrated value or the average value of the detected intensity in the area; and
a distribution parameter of the probability distribution is estimated based on a stochastic method;

specifying a second position based on a variation coefficient of the integrated value or the average value of the detected intensity in the area; and
setting a relative position of the microchip with respect to the laser to the first position or the second position.

Assignees

• Sony Corp

Inventors

• Muraki Yosuke
• Otsuka Fumitaka

Classifications

• G06N7/01

  Probabilistic graphical models, e.g. probabilistic networks · CPC title

• G01N2015/1452

  Adjustment of focus; Alignment · CPC title

• G05B19/27 Primary

  using an absolute digital measuring device · CPC title

• G01N15/1484

  microstructural devices · CPC title

• G01N15/1434 Primary

  Optical arrangements · CPC title