Interposer substrate and method for fabricating the same

US9911626B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9911626-B2
Application numberUS-201414514981-A
CountryUS
Kind codeB2
Filing dateOct 15, 2014
Priority dateJul 31, 2014
Publication dateMar 6, 2018
Grant dateMar 6, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of fabricating an interposer substrate provides a carrier having a first wiring layer. The first wiring layer has a plurality of first conductive pillars. A first insulating layer is formed on the carrier. The first conductive pillars are exposed from the first insulating layer. External connection pillars are formed above the first conductive pillars and electrically connected to the first conductive pillars. Then the carrier is removed. The process of fabricating the via can be bypassed in the process by forming a coreless interposer substrate on the carrier, such that the overall cost of the process can be decreased, and the process is simple. The interposer substrate is also provided.

First claim

Opening claim text (preview).

What is claimed is: 1. An interposer substrate, comprising: an insulating body; at least a wiring layer formed on one surface of the insulating body; a plurality of conductive pillars embedded in the insulating body and connected to the wiring layer; and a plurality of external connection pillars disposed on and in direct contact with the conductive pillars, protruding from an outermost surface of the insulating body opposite to the one surface of the insulating body and being free from being embedded in the insulating body, wherein the first conductive pillars electrically connect the external connection pillars and the wiring layer, and the external connection pillars are copper pillars. 2. The interposer substrate of claim 1 , wherein the insulating body is formed of molding compound, primer or dielectric material. 3. The interposer substrate of claim 1 , wherein the wiring layer has a surface lower than the one surface of the insulating body. 4. The interposer substrate of claim 1 , wherein an end surface of each of the first conductive pillars is flush with the outermost surface of the insulating body. 5. The interposer substrate of claim 1 , further comprising a supporting structure disposed on the one surface of the insulating body.

Assignees

Inventors

Classifications

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • between stacked chips · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • on active surfaces of flip-chip devices, e.g. underfills · CPC title

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What does patent US9911626B2 cover?
A method of fabricating an interposer substrate provides a carrier having a first wiring layer. The first wiring layer has a plurality of first conductive pillars. A first insulating layer is formed on the carrier. The first conductive pillars are exposed from the first insulating layer. External connection pillars are formed above the first conductive pillars and electrically connected to the …
Who is the assignee on this patent?
Phoenix Pioneer Technology Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10W70/05. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 06 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).