Microstructure synthesis by flow lithography and polymerization

US9910352B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9910352-B2
Application numberUS-201514702648-A
CountryUS
Kind codeB2
Filing dateMay 1, 2015
Priority dateOct 25, 2005
Publication dateMar 6, 2018
Grant dateMar 6, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

In a method for synthesizing polymeric microstructures, a monomer stream is flowed, at a selected flow rate, through a fluidic channel. At least one shaped pulse of illumination is projected to the monomer stream, defining in the monomer stream a shape of at least one microstructure corresponding to the illumination pulse shape while polymerizing that microstructure shape in the monomer stream by the illumination pulse. An article of manufacture includes a non-spheroidal polymeric microstructure that has a plurality of distinct material regions.

First claim

Opening claim text (preview).

We claim: 1. A method of forming a three-dimensional object, comprising the steps of: (a) providing a stream and a device, said device comprising a permeable device material and comprising a surface, with said stream within said surface defining a polymerizable region, and with said surface in fluid communication by way of the permeable device material with a species that can react to terminate active polymerization; (b) filling said polymerizable region with a polymerizable liquid, said polymerizable liquid contacting said surface; (c) irradiating said polymerizable region through said device to produce a solid polymerized region in said polymerizable region, while forming or maintaining a liquid lubricating layer comprised of said polymerizable liquid between said solid polymerized region and said surface, the polymerization of which liquid is inhibited by said species that can react to terminate active polymerization; (d) advancing said stream with said polymerized region contained therein away from said surface on said device to create a subsequent polymerizable region; and (e) continuing and/or repeating steps (c) through (d) to cause polymerization at directly adjacent volumes of the polymerizable liquid until the continued or repeated creation of solid polymerized regions forms said three-dimensional object. 2. The method of claim 1 , wherein said device is substantially transparent to a wavelength of illumination. 3. The method of claim 1 , wherein said advancing said stream is carried out while also maintaining the liquid lubricating layer at said surface. 4. The method of claim 3 , wherein said liquid lubricating layer is maintained by diffusion of species that can react to terminate active polymerization through said permeable device material. 5. The method of claim 1 , wherein the irradiating said polymerizable region is carried out with visible light, UV light, IR light, or another wavelength of light.

Assignees

Inventors

Classifications

  • including aperture · CPC title

  • Structurally defined web or sheet [e.g., overall dimension, etc.] · CPC title

  • made of organic materials, e.g. plastics (G02B1/08 takes precedence) · CPC title

  • Polymer or resin containing [i.e., natural or synthetic] · CPC title

  • of organic or organo-metallic materials {, e.g. graphene}(H01F1/44 takes precedence) · CPC title

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What does patent US9910352B2 cover?
In a method for synthesizing polymeric microstructures, a monomer stream is flowed, at a selected flow rate, through a fluidic channel. At least one shaped pulse of illumination is projected to the monomer stream, defining in the monomer stream a shape of at least one microstructure corresponding to the illumination pulse shape while polymerizing that microstructure shape in the monomer stream …
Who is the assignee on this patent?
Doyle Patrick Seamus, Pregibon Daniel Colin, Dendukuri Dhananjay, and 1 more
What technology area does this patent fall under?
Primary CPC classification G03F7/0037. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 06 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).