High output group III nitride light emitting diodes

US9905731B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9905731-B2
Application numberUS-79636510-A
CountryUS
Kind codeB2
Filing dateJun 8, 2010
Priority dateSep 22, 2004
Publication dateFeb 27, 2018
Grant dateFeb 27, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A light emitting diode is disclosed that includes a silicon carbide substrate and a light emitting structure formed from the Group III nitride material system on the substrate. The diode has an area greater than 100,000 square microns and has a radiant flux at 20 milliamps current of at least 29 milliwatts at its dominant wavelength between 390 and 540 nanometers.

First claim

Opening claim text (preview).

The invention claimed is: 1. A light emitting diode comprising: a light emitting layer that comprises a Group III nitride material system; a first ohmic contact on said light emitting layer; a silver-based layer between said first ohmic contact and said light emitting layer, said silver-based layer including a first face of said silver-based layer adjacent said first ohmic contact, a second face of said silver-based layer adjacent and directly contacting said light emitting layer and a sidewall of said silver-based layer that extends between said first and second faces; a barrier layer between said first ohmic contact layer and said silver-based layer and directly contacting said first ohmic contact layer, said barrier layer extending on said first face of said silver-based layer and further extending on said sidewall of said silver-based layer to directly contact said light emitting layer; a transparent conductive substrate on said light emitting layer opposite said silver-based layer; and a second ohmic contact directly on said transparent conductive substrate opposite said light emitting layer. 2. A light emitting diode according to claim 1 wherein said transparent conductive substrate comprises a silicon carbide single crystal substrate. 3. A light emitting diode according to claim 2 further comprising a buffer layer between said silicon carbide substrate and said light emitting layer, said buffer layer comprising the Group III nitride material system. 4. A light emitting diode according to claim 3 further comprising at least two layers of opposite conductivity type comprising the Group III nitride material system for providing carriers for recombination and light emission under an applied current. 5. A light emitting diode according to claim 4 wherein said light emitting layer includes at least one layer of indium gallium nitride. 6. A light emitting diode according to claim 2 wherein said silicon carbide substrate is n-type and has a polytype selected from the 3C, 4H, 6H, and 15R polytypes of silicon carbide. 7. A light emitting diode according to claim 1 wherein said light emitting layer comprises a doped semiconductor layer, said silver-based layer is directly on said doped semiconductor layer and said barrier layer is directly on said first face of said silver-based layer and completely encloses said sidewall of said silver-based layer. 8. A light emitting diode according to claim 7 wherein said doped semiconductor layer is a p-type semiconductor layer. 9. A light emitting diode according to claim 1 wherein said transparent conductive substrate includes an oblique sidewall. 10. A light emitting diode according to claim 9 ; wherein said second ohmic contact is directly on a face of said transparent conductive substrate that is opposite said light emitting layer, and wherein said second ohmic contact extends on only a first portion of said face and exposes a second portion of said face.

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What does patent US9905731B2 cover?
A light emitting diode is disclosed that includes a silicon carbide substrate and a light emitting structure formed from the Group III nitride material system on the substrate. The diode has an area greater than 100,000 square microns and has a radiant flux at 20 milliamps current of at least 29 milliwatts at its dominant wavelength between 390 and 540 nanometers.
Who is the assignee on this patent?
Edmond John Adam, Bergmann Michael J, Emerson David T, and 2 more
What technology area does this patent fall under?
Primary CPC classification H01L33/32. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 27 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).