Chip-type electronic component
US-2024038754-A1 · Feb 1, 2024 · US
US9905365B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9905365-B2 |
| Application number | US-201615215237-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 20, 2016 |
| Priority date | Jul 21, 2015 |
| Publication date | Feb 27, 2018 |
| Grant date | Feb 27, 2018 |
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Composite electronic including coil, capacitor and intermediate parts, wherein coil part includes coil-conductor and magnetic-layer, capacitor part includes internal electrodes and dielectric-layer, which contains SrO—TiO2 or ZnO—TiO2 based oxide, intermediate part between coil and capacitor parts, intermediate part includes intermediate material layer, which contains ZnO, TiO2 and boron, ZnO contained in intermediate material layer 50-85 parts by mole and TiO2 contained the intermediate material layer 15-50 parts by mole when total content of ZnO and TiO2 in intermediate material layer is 100 parts by mole, content boron in intermediate material layer is 0.1-5.0 parts by weight of B2O3 when total of ZnO and TiO2 in intermediate material layer set to 100 parts by weight, part of ZnO and TiO2 intermediate material layer constitute ZnO—TiO2 compound, which in intermediate material layer is 50 wt % or more when total weight of ZnO and TiO2 in intermediate material layer is set to 100 wt %.
Opening claim text (preview).
The invention claimed is: 1. A composite electronic device comprising a coil part, a capacitor part and an intermediate part, wherein the coil part includes a coil conductor and a magnetic layer, the capacitor part includes internal electrodes and a dielectric layer, the dielectric layer contains a SrO—TiO 2 based oxide, the intermediate part is located between the coil part and the capacitor part, the intermediate part includes an intermediate material layer, the intermediate material layer contains ZnO, TiO 2 , boron and Cu, a content of ZnO contained in the intermediate material layer is 50 to 85 parts by mole and a content of TiO 2 contained in the intermediate material layer is 15 to 50 parts by mole when a total of the content of ZnO and the content of TiO 2 contained in the intermediate material layer is set to 100 parts by mole, a content of boron contained in the intermediate material layer is 0.1 to 5.0 parts by weight in terms of B 2 O 3 when a total of the content of ZnO and the content of TiO 2 contained in the intermediate material layer is set to 100 parts by weight, a content of Cu contained in the intermediate material layer is 20.0 parts by weight or less in terms of CuO, a part of ZnO and TiO 2 contained in the intermediate material layer constitute a ZnO—TiO 2 compound, at least a part of Cu contained in the intermediate material layer is dissolved in the ZnO—TiO 2 compound, and a content of the ZnO—TiO 2 compound contained in the intermediate material layer is 50 wt % or more when a total weight of ZnO and TiO 2 contained in the intermediate material layer is set to 100 wt %. 2. The composite electronic device according to claim 1 , wherein the intermediate material layer contains Mn, a content of Mn contained in the intermediate material layer is 3.0 parts by weight or less in terms of MnO, and at least a part of Mn contained in the intermediate material layer is dissolved in the ZnO—TiO 2 compound. 3. The composite electronic device according to claim 1 , wherein the magnetic layer contains a NiCuZn based ferrite or a CuZn based ferrite. 4. The composite electronic device according to claim 1 , wherein the intermediate part includes a mixed layer, the mixed layer is located between the magnetic layer and the intermediate material layer, and the mixed layer is composed of a mixed material formed by mixing at least a part of the magnetic components contained in the magnetic layer and at least a part of the components contained in the intermediate material layer. 5. The composite electronic device according to claim 1 , wherein the coil conductor and the internal electrodes contain Ag as a conductive material. 6. The composite electronic device according to claim 1 , wherein a thickness of the intermediate material layer is 5 to 75 μm. 7. The composite electronic device according to claim 1 , wherein a content of ZnO contained in the intermediate material layer is 55 to 80 parts by mole when a total of the content of ZnO and the content of TiO 2 contained in the intermediate material layer is set to 100 parts by mole. 8. The composite electronic device according to claim 1 , wherein a content of ZnO contained in the intermediate material layer is 60 to 75 parts by mole when a total of the content of ZnO and the content of TiO 2 contained in the intermediate material layer is set to 100 parts by mole. 9. The composite electronic device according to claim 1 , wherein the boron contained in the intermediate material layer is present as a vitreous boron component. 10. The composite electronic device according to claim 1 , wherein a thickness of the intermediate material layer is 10 to 50 μm.
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