Solar cells with improved lifetime, passivation and/or efficiency

US9899542B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9899542-B2
Application numberUS-201615213273-A
CountryUS
Kind codeB2
Filing dateJul 18, 2016
Priority dateDec 22, 2014
Publication dateFeb 20, 2018
Grant dateFeb 20, 2018

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A method of fabricating a solar cell can include forming a dielectric region on a silicon substrate. The method can also include forming an emitter region over the dielectric region and forming a dopant region on a surface of the silicon substrate. In an embodiment, the method can include heating the silicon substrate at a temperature above 900 degrees Celsius to getter impurities to the emitter region and drive dopants from the dopant region to a portion of the silicon substrate.

First claim

Opening claim text (preview).

What is claimed is: 1. A solar cell, the solar cell having a front side which faces the sun during normal operation and a back side opposite the front side, the solar cell comprising: a dielectric region over a silicon substrate, wherein a portion of the silicon substrate has a dopant concentration of approximately less than or equal to 2×10 18 cm −3 , a first emitter region having metal impurities formed over the dielectric region; a first metal contact formed over the first emitter region; a second emitter region having metal impurities; and a second metal contact formed over the second emitter region, wherein the first emitter region and first metal contact are formed on a side of the solar cell opposite a side of the solar cell on which the second emitter region and second metal contact are formed, and wherein the second metal contact has a staggered orientation with the first metal contact with respect to a vertical axis between the second metal contact and the first metal contact. 2. The solar cell of claim 1 , wherein the first emitter region and first metal contact are formed on the front side of the solar cell and the second emitter region and second metal contact are formed on the back side of the solar cell. 3. The solar cell of claim 2 , wherein the portion of the silicon substrate having a dopant concentration of approximately less than or equal to 2×10 18 cm −3 is on the front side of the solar cell. 4. The solar cell of claim 2 , wherein the first emitter region is a doped polysilicon region. 5. The solar cell of claim 1 , wherein the first emitter region and first metal contact are formed on the back side of the solar cell and the second emitter region and second metal contact are formed on the front side of the solar cell. 6. The solar cell of claim 5 , wherein the portion of the silicon substrate having a dopant concentration of approximately less than or equal to 2×10 18 cm −3 is on the front side of the solar cell. 7. The solar cell of claim 5 , wherein the first emitter region is a doped polysilicon region. 8. The solar cell of claim 1 , wherein the portion of the silicon substrate having a dopant concentration of approximately less than or equal to 2×10 18 cm −3 is on the front side of the solar cell. 9. A solar cell, the solar cell having a front side which faces the sun during normal operation and a back side opposite the front side, the solar cell comprising: a dielectric region over a silicon substrate; a first emitter region having metal impurities formed over the dielectric region; a first metal contact formed over the first emitter region; a second emitter region having metal impurities; and a second metal contact formed over the second emitter region, wherein the first emitter region and first metal contact are formed on a side of the solar cell opposite a side of the solar cell on which the second emitter region and second metal contact are formed, and wherein the second metal contact has a staggered orientation with the first metal contact with respect to a vertical axis between the second metal contact and the first metal contact. 10. The solar cell of claim 9 , wherein the first emitter region and first metal contact are formed on the front side of the solar cell and the second emitter region and second metal contact are formed on the back side of the solar cell. 11. The solar cell of claim 9 , wherein the first emitter region is a doped polysilicon region. 12. The solar cell of claim 9 , wherein the first emitter region and first metal contact are formed on the back side of the solar cell and the second emitter region and second metal contact are formed on the front side of the solar cell.

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What does patent US9899542B2 cover?
A method of fabricating a solar cell can include forming a dielectric region on a silicon substrate. The method can also include forming an emitter region over the dielectric region and forming a dopant region on a surface of the silicon substrate. In an embodiment, the method can include heating the silicon substrate at a temperature above 900 degrees Celsius to getter impurities to the emitte…
Who is the assignee on this patent?
Sunpower Corp
What technology area does this patent fall under?
Primary CPC classification H01L31/02008. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 20 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).