Method and device for controlling amount of hot dip galvanization adhesion

Patent metadata

Field	Value
Publication number	US-9896755-B2
Application number	US-201515117612-A
Country	US
Kind code	B2
Filing date	Feb 10, 2015
Priority date	Feb 10, 2014
Publication date	Feb 20, 2018
Grant date	Feb 20, 2018

Abstract

The present invention is provided with: a duct of which one end interconnects to a wiping nozzle ( 22, 23 ) and the other end is open; a first valve ( 17 ) that controls the actual gas pressure (P 1 ′) of the wiping nozzle ( 22, 23 ); a second valve ( 18 ) that controls the gas flow rate (Q 2 ) dissipating to outside the system from another branched duct; a wiping pressure setting unit ( 11 ) that sets the set gas pressure (P 1 ) of the wiping nozzle ( 22, 23 ); a first valve aperture setter ( 13 ) that sets the valve aperture of the first valve ( 17 ); a second valve aperture setter ( 14 ) that sets the valve aperture of the second valve ( 18 ); and a computation processing unit ( 12 ) that presents to the first valve aperture setter ( 13 ) the valve aperture at which the gas pressure (P 1 ′) matches a set gas pressure (P 1 ), and presents to the second valve aperture setter ( 14 ) the valve aperture at which the total gas flow rate (QT) supplied from a gas supply device ( 15 ) becomes uniform.

First claim

The invention claimed is:

1. A device for controlling an amount of hot dip galvanization adhesion, the device comprises:
a nozzle communicating with a gas supply device via a duct and configured to spray gas supplied from the gas supply device onto a steel plate to which molten metal adheres;
the duct branching in two directions and having a first branched portion communicating with the nozzle and a second branched portion being open;
a first valve configured to control an actual gas pressure P 1 ′ of the nozzle;
a second valve configured to control a gas flow rate Q 2 of the gas to be diffused from the second branched portion of the duct to an outside of a system;
a pressure setting unit configured to set a set gas pressure P 1 of the nozzle;
a first valve opening degree setter configured to set a valve opening degree MV 1 of the first valve, based on an instruction from a computation processing unit;
a second valve opening degree setter configured to set a valve opening degree MV 2 of the second valve, based on an instruction from the computation processing unit;
the computation processing unit configured to obtain the valve opening degree MV 1 at which the gas pressure P 1 ′ becomes equal to the set gas pressure P 1 , and instruct the first valve opening degree setter about the obtained valve opening degree MV 1 , the computation processing unit configured to obtain the valve opening degree MV 2 at which a total gas flow rate QT of the gas supplied from the gas supply device is constant, and instruct the second valve opening degree setter about the obtained valve opening degree MV 2 .

2. The device for controlling an amount of hot dip galvanization adhesion according to claim 1 , wherein:
the valve opening degree MV 1 and valve opening degree MV 2 are obtained by the configuration of the computational processing unit to:
calculate a CV coefficient CV 1 of the first valve from the set gas pressure P 1 , an actual gas pressure P 3 ′ supplied from the gas supply device, and a pressure loss coefficient of the nozzle;
calculate the valve opening degree MV 1 from the CV coefficient CV 1 and a characteristic function unique to the first valve;
calculate the gas flow rate Q 1 from the set gas pressure P 1 and the pressure loss coefficient;
calculate the gas flow rate Q 2 from the gas flow rate Q 1 and the total gas flow rate QT determined in advance from an ability of the gas supply device;
calculate a CV coefficient CV 2 of the second valve from the gas flow rate Q 2 and the gas pressure P 3 ′; and
calculates the valve opening degree MV 2 from the CV coefficient CV 2 and a characteristic function unique to the second valve.

3. The device for controlling an amount of hot dip galvanization adhesion according to claim 1 , wherein the computation processing unit has a table indicating relationships between the set gas pressure P 1 and each of the valve opening degree MV 1 and the valve opening degree MV 2 , and obtains the valve opening degree MV 1 and the valve opening degree MV 2 based on the table.

4. The device for controlling an amount of hot dip galvanization adhesion according to claim 1 , wherein
the nozzle includes a first nozzle and a second nozzle,
the first valve includes a first a-valve configured to control an actual gas pressure P 1 a ′ of the first nozzle and a first b-valve configured to control an actual gas pressure P 1 b ′ of the second nozzle,
the first valve opening degree setter includes a first a-valve opening degree setter configured to set a valve opening degree MV 1 a of the first a-valve and a first b-valve opening degree setter configured to set a valve opening degree MV 1 b of the first b-valve, and
the computation processing unit:
obtains the valve opening degree MV 1 a and the valve opening degree MV 1 b at which the gas pressure P 1 a ′ and the gas pressure P 1 b ′ become equal to the set gas pressure P 1 , and instructs the first a-valve opening degree setter and the first b-valve opening degree setter about the obtained valve opening degree MV 1 a and the obtained valve opening degree MV 1 b ; and
obtains the valve opening degree MV 2 at which the total gas flow rate QT is constant, and instructs the second valve opening degree setter about the obtained valve opening degree MV 2 .

5. The device for controlling an amount of hot dip galvanization adhesion according to claim 4 , wherein:
the valve opening degree MV 1 and valve opening degree MV 2 are obtained by the configuration of the computational processing unit to:
calculate a CV coefficient CV 1 a of the first a-valve and a CV coefficient CV 1 b of the first b-valve from the set gas pressure P 1 , an actual gas pressure P 3 ′ supplied from the gas supply device, and a pressure loss coefficient of the nozzle;
calculate the valve opening degree MV 1 a from the CV coefficient CV 1 a and a characteristic function unique to the first a-valve and calculates the valve opening degree MV 1 b from the CV coefficient CV 1 b and a characteristic function unique to the first b-valve;
calculate the gas flow rate Q 1 from the set gas pressure P 1 and the pressure loss coefficient;
calculate the gas flow rate Q 2 from the gas flow rate Q 1 and the total gas flow rate QT determined in advance from an ability of the gas supply device;
calculate a CV coefficient CV 2 of the second valve from the gas flow rate Q 2 and the gas pressure P 3 ′; and
calculate the valve opening degree MV 2 from the CV coefficient CV 2 and a characteristic function unique to the second valve.

6. The device for controlling an amount of hot dip galvanization adhesion according to claim 1 , wherein the device further comprises a pressure controller configured to calculate a valve opening degree correction value C 1 from a difference between the set gas pressure P 1 and the actual gas pressure P 1 ′ of the nozzle and perform control to add the valve opening degree correction value C 1 to the valve opening degree MV 1 set by the first valve opening degree setter.

7. The device for controlling an amount of hot dip galvanization adhesion according to claim 4 , wherein the device further comprises:
a first pressure controller configured to calculate a valve opening degree correction value C 1 a from a difference between the set gas pressure P 1 and the actual gas pressure P 1 a ′ of the nozzle and perform control to add the valve opening degree correction value C 1 a to the valve opening degree MV 1 a set by the first a-valve opening degree setter; and
a second pressure controller configured to calculate a valve opening degree correction value C 1 b from a difference between the set gas pressure P 1 and the actual gas pressure P 1 b ′ of the nozzle and perform control to add the valve opening degree correction value C 1 b to the valve opening degree MV set by the first b-valve opening degree setter.

8. The device for controlling an amount of hot dip galvanization adhesion according to claim 4 , wherein
the pressure setting unit includes a first pressure setting unit configured to set a set gas pressure P 1 a of the first nozzle and a second pressure setting unit configured to set a set gas pressure P 1 b of the second nozzle,
the computation processing unit:
obtains the valve opening degree MV 1 a and the valve opening degree MV at which the gas pressure P 1 a ′ and the gas pressure P 1 b ′ become equal to the set gas pressure P 1 a , and instructs the first a-valve opening degree setter and the first b-valve opening degree setter about the obtained valve opening degree MV 1 a and the obtained valve opening degree MV 1 b ; and
obtains the valve opening degree MV 2 at wh

Assignees

• Primetals Tech Japan Ltd
• Nisshin Steel Co Ltd

Inventors

• Suemori Hideaki
• Tanaka Masayoshi
• Kakemizu Norikatsu
• Yamamoto Takashi
• Morishita Hisao
• Yamashita Ryuuichi

Classifications

• C23C2/20 Primary

  Strips; Plates · CPC title

• C23C2/16

  using fluids under pressure, e.g. air knives · CPC title

• G05D5/03

  characterised by the use of electric means · CPC title

• C23C2/003

  Apparatus · CPC title

• C23C2/14

  Removing excess of molten coatings; Controlling or regulating the coating thickness · CPC title