Article coated with DLC and manufacturing method thereof

US9896584B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9896584-B2
Application numberUS-201514721172-A
CountryUS
Kind codeB2
Filing dateMay 26, 2015
Priority dateMay 15, 2015
Publication dateFeb 20, 2018
Grant dateFeb 20, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of making an article coated with DLC, includes providing a substrate; depositing a transition layer on the substrate by means of magnetron sputter deposition (MSD); depositing a DLC layer without hydrogen (H) on the transition layer by means of filtered cathodic vacuum arc (FCVA); and doping a fluorine-doping (F-doping) layer on the DLC layer. The article has good film bonding force, high hardness, good wear resistance, good hydrophobicity and oleophobicity and high light transmittance, and the DLC layer has no H included.

First claim

Opening claim text (preview).

What is claimed is: 1. An article coated with diamond-like carbon (DLC), comprising: a substrate; a transition layer formed on the substrate; a DLC layer without hydrogen (H) formed on the transition layer; and a fluorine-doping (F-doping) layer formed on the DLC layer. 2. The article coated with DLC according to claim 1 , wherein the transition layer comprises silicon (Si), silicon dioxide (SiO 2 ), silicon nitride (SiN), and titanium (Ti), chromium (Cr), copper (Cu) and/or metal oxide. 3. The article coated with DLC according to claim 1 , wherein the transition layer has a thickness ranging from 5 Å to 20 Å, and the DLC layer has a thickness ranging from approximately 10 Å to 30 Å. 4. The article coated with DLC according to claim 1 , wherein the substrate comprises glass, sapphire, ceramic, polymer, metal and/or metal oxide. 5. The article coated with diamond-like carbon (DLC) according to claim 1 , wherein the transition layer is deposited on the substrate by means of magnetron sputter deposition (MSD). 6. The article coated with diamond-like carbon (DLC) according to claim 5 , wherein depositing the transition layer on the substrate by means of MSD comprises cleaning the substrate by means of ion beam etching (IBE) or ultrasonic waves. 7. The article coated with diamond-like carbon (DLC) according to claim 1 , wherein the DLC layer is deposited on the transition layer by means of filtered cathodic vacuum arc (FCVA). 8. The article coated with diamond-like carbon (DLC) according to claim 1 , wherein the DLC layer is deposited on the transition layer by rotating the substrate in a predetermined speed, and applying a bias voltage ranging from −50V to −100V to an anode, during the deposition. 9. The article coated with diamond-like carbon (DLC) according to claim 1 , wherein the F-doping layer is doped on the DLC layer by means of radio frequency chemical vapor deposition (RFCVD). 10. The article coated with diamond-like carbon (DLC) according to claim 9 , wherein the F-doping layer is doped on the DLC layer using carbon tetrafluoride (CF4) as doping gas, controlling the CF4flux ranging from 60 sccm to 100 sccm and controlling the doping time ranging from 10 min to 20min.

Assignees

Inventors

Classifications

  • C09D1/00Primary

    Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances · CPC title

  • Reactive treatment · CPC title

  • Carbon · CPC title

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Frequently asked questions

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What does patent US9896584B2 cover?
A method of making an article coated with DLC, includes providing a substrate; depositing a transition layer on the substrate by means of magnetron sputter deposition (MSD); depositing a DLC layer without hydrogen (H) on the transition layer by means of filtered cathodic vacuum arc (FCVA); and doping a fluorine-doping (F-doping) layer on the DLC layer. The article has good film bonding force, h…
Who is the assignee on this patent?
Sae Magnetics Hk Ltd
What technology area does this patent fall under?
Primary CPC classification C09D1/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 20 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).