Apparatus for treating substrate

US9895645B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9895645-B2
Application numberUS-201615014051-A
CountryUS
Kind codeB2
Filing dateFeb 3, 2016
Priority dateSep 21, 2015
Publication dateFeb 20, 2018
Grant dateFeb 20, 2018

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

An apparatus for treating a substrate, including a chamber; a substrate treater in the chamber; a purifier connected to the chamber, the purifier to purify polluted air in the chamber; a light source in the chamber, the light source to irradiate light; and a light-shield to block the light irradiated by the light source from arriving at the substrate treater.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus for treating a substrate, comprising: a sealable chamber; a substrate treater in the chamber; a purifier connected to the chamber, the purifier to purify polluted air in the chamber; a light or microwave source in the chamber, the light or microwave source to irradiate light or microwaves inside the chamber; and a light or microwave-shield to block the light or microwaves irradiated by the light or microwave source from arriving at the substrate treater, wherein the substrate treater is a printing device including a plurality of nozzles. 2. The apparatus as claimed in claim 1 , wherein: the polluted air contains moisture and oxygen, and the purifier includes a moisture absorption portion and an oxygen removal portion, the moisture absorption portion to remove the moisture from the polluted air and the oxygen removal portion to remove the oxygen from the polluted air. 3. The apparatus as claimed in claim 2 , wherein the moisture absorption portion includes a first filter, the first filter including a moisture absorbent. 4. The apparatus as claimed in claim 3 , wherein the moisture absorbent is a molecular sieve. 5. The apparatus as claimed in claim 2 , wherein the oxygen removal portion includes a second filter, the second filter including a copper catalyst. 6. The apparatus as claimed in claim 1 , wherein the light or microwave source emits ultraviolet light, infrared light, or microwaves. 7. The apparatus as claimed in claim 1 , wherein the light or microwave-shield is a film covering the plurality of nozzles. 8. The apparatus as claimed in claim 7 , wherein: the plurality of nozzles include jet orifices, and the light or microwave-shield covers entire surfaces of the plurality of nozzles except for the jet orifices. 9. The apparatus as claimed in claim 1 , wherein the light or microwave-shield is on a path of the light or microwaves irradiated by the light or microwave source, the light or microwave-shield to block the light or microwaves irradiated by the light or microwave source from being directly applied onto the substrate treater. 10. The apparatus as claimed in claim 1 , further comprising: openings formed at one side of the chamber; and gloves extending from the openings, respectively, into the chamber. 11. The apparatus as claimed in claim 1 , further comprising a heater in the chamber, the heater to heat inner surfaces of the chamber. 12. The apparatus as claimed in claim 1 , further comprising an entrance to open or close an inner space of the chamber. 13. The apparatus as claimed in claim 12 , further comprising a transferrer to transfer a target object to be treated in response to the target object being introduced through the entrance. 14. The apparatus as claimed in claim 12 , further comprising a sub-chamber connected to the entrance. 15. The apparatus as claimed in claim 14 , wherein the sub-chamber includes a sub-entrance and an atmosphere controller, the sub-entrance to open or close the sub-chamber and the atmosphere controller to adjust an atmosphere in the sub-chamber. 16. The apparatus as claimed in claim 15 , wherein the atmosphere controller includes a vacuum forming portion and a gas injection portion, the vacuum forming portion to form a vacuum in the sub-chamber and the gas injection portion to inject a gas into the sub-chamber. 17. The apparatus as claimed in claim 1 , wherein the light or microwave source emits infrared light or microwaves.

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9895645B2 cover?
An apparatus for treating a substrate, including a chamber; a substrate treater in the chamber; a purifier connected to the chamber, the purifier to purify polluted air in the chamber; a light source in the chamber, the light source to irradiate light; and a light-shield to block the light irradiated by the light source from arriving at the substrate treater.
Who is the assignee on this patent?
Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification B01D53/0407. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Feb 20 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).