Active matrix substrate and manufacturing method of the same
US-2015001530-A1 · Jan 1, 2015 · US
Mask
US9891518B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9891518-B2 |
| Application number | US-201414547399-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 19, 2014 |
| Priority date | Jul 18, 2014 |
| Publication date | Feb 13, 2018 |
| Grant date | Feb 13, 2018 |
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- Title
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Abstract
Official abstract text for this publication.
A mask, comprising an opaque region, a first semi-transparent region, and a second semi-transparent region. The transmittance of the second semi-transparent region is less than that of the first semi-transparent region. The mask solves the over-etching problem caused by the difference between the thicknesses of photoresist in different regions.
First claim
Opening claim text (preview).
What is claimed is: 1. A mask, comprising: a substrate; an opaque region; a first semi-transparent region; a second semi-transparent region; a semi-transparent film layer provided at portions of the substrate corresponding to the first semi-transparent region and the second semi-transparent region; and a light shielding layer provided in the portion of the semi-transparent film layer corresponding to the second semi-transparent region; wherein the light shielding layer is disposed below the substrate and covered by the portion of the semi-transparent film layer corresponding to the second semi-transparent region, and has a width 1-2 μm less than resolution size of the exposure machine, to allow light from a light source to be diffracted by the light shielding layer when it irradiates on the second semi-transparent region. 2. The mask according to claim 1 , wherein transmittance of the second semi-transparent region is less than that of the first semi-transparent region, and the portions of semi-transparent film layer that cover the first semi-transparent region and the second semi-transparent region have same transmittance. 3. The mask according to claim 2 , wherein the light shielding layer is made of metal material.
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Frequently asked questions
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- What does patent US9891518B2 cover?
- A mask, comprising an opaque region, a first semi-transparent region, and a second semi-transparent region. The transmittance of the second semi-transparent region is less than that of the first semi-transparent region. The mask solves the over-etching problem caused by the difference between the thicknesses of photoresist in different regions.
- Who is the assignee on this patent?
- Boe Technology Group Co Ltd, Beijing Boe Optoelectronics Tech Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification G03F1/54. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Feb 13 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).