Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for forming

Patent metadata

Field	Value
Publication number	US-9890255-B2
Application number	US-201314429512-A
Country	US
Kind code	B2
Filing date	Jul 15, 2013
Priority date	Dec 31, 2012
Publication date	Feb 13, 2018
Grant date	Feb 13, 2018

Abstract

Disclosed is modified hydrogenated polysiloxazane prepared by reacting hydrogenated polysiloxazane with a silane compound selected from polysilane, polycyclosilane, and a silane oligomer. The modified hydrogenated polysiloxazane has a small mole ratio of nitrogen atoms relative to silicon atoms and may remarkably deteriorate a film shrinkage ratio when included in a composition for forming a silica-based insulation layer to form a silica-based insulation layer.

First claim

What is claimed is:

1. A modified hydrogenated polysiloxazane prepared by reacting a hydrogenated polysiloxazane with a silane compound selected from a polysilane, a polycyclosilane, and a silane oligomer, wherein the modified hydrogenated polysiloxazane has an oxygen content of 0.2 to 3 wt %, based on a total weight of the modified hydrogenated polysiloxazane.

2. The modified hydrogenated polysiloxazane of claim 1 , wherein the modified hydrogenated polysiloxazane has an atom number ratio (N/Si) of a nitrogen atom relative to a silicon atom of less than or equal to 0.95.

3. The modified hydrogenated polysiloxazane of claim 1 , wherein the modified hydrogenated polysiloxazane includes structural units represented by the following Chemical Formulae 1 to 3:

wherein, in the above Chemical Formulae 1 to 3, R 1 and R 2 are each independently selected from H, SiH 3 , and NH 2 , and R 3 is H or SiH 3 .

4. The modified hydrogenated polysiloxazane of claim 1 , wherein the modified hydrogenated polysiloxazane has a weight average molecular weight of 1,000 to 30,000.

5. A composition for forming a silica-based insulation layer comprising the modified hydrogenated polysiloxazane as claimed in claim 1 .

6. The composition for forming a silica-based insulation layer of claim 5 , wherein the modified hydrogenated polysiloxazane has an atom number ratio (N/Si) of a nitrogen atom relative to a silicon atom of less than or equal to 0.95.

7. The composition for forming a silica-based insulation layer of claim 5 , wherein the modified hydrogenated polysiloxazane includes structural units represented by the following Chemical Formulae 1 to 3:

wherein, in the above Chemical Formulae 1 to 3, R 1 and R 2 are each independently selected from H, SiH 3 , and NH 2 , and R 3 is H or SiH 3 .

8. The composition for forming a silica-based insulation layer of claim 5 , wherein the modified hydrogenated polysiloxazane has a weight average molecular weight ranging from 1000 to 30000.

9. The composition for forming a silica-based insulation layer of claim 5 , wherein the modified hydrogenated polysiloxazane is included in an amount of 0.1 to 50 wt % based on the composition.

10. A method of preparing a composition for forming a silica-based insulation layer, the method comprising
reacting a hydrogenated polysiloxazane with a silane compound in a solvent while heating, or adding a halosilane compound and a silane compound to a mixture of pyridine and water and performing coammonolysis, to synthesize a modified hydrogenated polysiloxazane in a solution,
wherein the silane compound is selected from a polysilane, a polycyclosilane, and a silane oligomer.

11. The method of claim 10 , wherein:
the modified hydrogenated polysiloxazane is synthesized by performing the coammonolysis, and
the halosilane compound is selected from dichlorosilane, trichlorosilane, tetrachlorosilane, and a mixture thereof.

12. The method of claim 10 , wherein the silane compound has a structure represented by the following Chemical Formula 4:

wherein, in the above Chemical Formula 4,
R 1 and R 2 are each independently selected from H, SiH 3 , NH 2 , Cl, Br, and I,
R 3 and R 4 are each independently selected from H, SiH 3 , NH 2 , Cl, Br, and I, or are fused to each other to provide a ring, and
a is an integer ranging from 1 to 30.

13. The method of claim 10 , wherein:
the modified hydrogenated polysiloxazane is synthesized by performing the coammonolysis, and
the silane compound is cyclopentasilane.

14. The method of claim 10 , further comprising substituting a solvent of the solution with a nonpolar solvent.

15. The method of claim 14 , wherein the nonpolar solvent is xylene or n-butylether.

16. A composition for forming a silica-based insulation layer prepared according to the method as claimed in claim 10 .

17. A silica-based insulation layer manufactured using the composition for forming a silica-based insulation layer as claimed in claim 16 .

18. A silica-based insulation layer manufactured using a composition for forming a silica-based insulation layer, the composition for forming a silica-based insulation layer including a modified hydrogenated polysiloxazane, the modified hydrogenated polysiloxazane being prepared by reacting a hydrogenated polysiloxazane with a silane compound selected from a polysilane, a polycyclosilane, and a silane oligomer.

19. A method of manufacturing a silica-based insulation layer, the method comprising:
applying the composition for forming a silica-based insulation layer according to claim 6 on a substrate;
soft-baking the substrate applied with the composition for forming a silica-based insulation layer at a temperature of greater than or equal to 50° C. and less than or equal to 200° C.; and
heating the soft-baked substrate at a temperature of greater than or equal to 200° C. and less than or equal to 1,000° C., under an oxygen atmosphere or a standard pressure atmosphere including water vapor having a partial pressure of greater than or equal to 0.1 kPa.

Assignees

• Cheil Ind Inc
• Cheil Ind Inc

Inventors

• Song Hyun Ji
• Park Eun Su
• Lim Sang Hak
• Kwak Taek Soo
• Kim Go Un
• Kim Mi Young
• Kim Bo Sun
• Kim Bong Hwan
• Na Yoong Hee
• Bae Jin Hee
• Seo Jin Woo
• Yun Hui Chan
• Lee Han Song
• Jeon Jong Dae
• Han Kwen Woo
• Hong Seung Hee
• Hwang Byeong Gyu

Classifications

• H10P14/69215

  the material being a silicon oxide, e.g. SiO2 · CPC title

• H10P14/6689

  the compound being a silazane · CPC title

• H10P14/6682

  the compound being a silane, e.g. disilane, methylsilane or chlorosilane · CPC title

• H10P14/6522

  introduced into a nitride material, e.g. changing SiN to SiON · CPC title

• H10P14/6348

  Liquid ALD · CPC title