Melt infiltration apparatus and method for molten metal control

US9884789B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9884789-B2
Application numberUS-201715401501-A
CountryUS
Kind codeB2
Filing dateJan 9, 2017
Priority dateMar 15, 2013
Publication dateFeb 6, 2018
Grant dateFeb 6, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method and apparatus for providing molten metal infiltration into a component is provided.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of infiltrating a material into a component, the method comprising: providing an infiltrant source having an infiltrant contained therein; providing a component in fluid communication with the infiltrant source; heating the infiltrant source, the infiltrant, the component and a barrier disposed between the infiltrant source and the component, the barrier having a higher melting point than the infiltrant; dissolving the barrier; and infusing the infiltrant into the component. 2. The method of claim 1 , wherein the barrier comprises a material selected from the group consisting of Si, Si/Zr alloy, SiC-coated Si, Zr/Si alloy, ZrB 2 and Ti. 3. The method of claim 1 , wherein the infiltrant comprises a material selected from the group consisting of Si, Si/C/B alloy, Zr/Si alloy, Zr and Ti/6Al/4V alloy. 4. The method of claim 1 , wherein the component comprises a porous body. 5. The method of claim 4 , wherein the component comprises a ceramic matrix composite. 6. The method of claim 1 further comprising dissolving a plurality of barriers disposed between the infiltrant source and the component, wherein each barrier has a higher melting point than the infiltrant. 7. The method of claim 1 , wherein the infiltrant source comprises a crucible having a drain for discharge of the infiltrant. 8. The method of claim 7 , wherein the barrier is received within the drain of the crucible. 9. The method of claim 1 , wherein the infiltrant source and the component are disposed adjacent to each other on a base plate. 10. The method of claim 1 , wherein a wick connects the infiltrant to the component. 11. The method of claim 10 , wherein the wick comprises carbon. 12. The method of claim 10 , wherein the wick comprises multiple branches in contact with the component. 13. The method of claim 12 , wherein the infiltrant is directed into the component at different times and temperatures through the multiple branches. 14. The method of claim 1 , wherein the barrier contacts a wick. 15. The method of claim 1 , wherein the barrier is applied to the component. 16. The method of claim 15 , wherein the barrier is applied to a bottom of the component. 17. The method of claim 15 , wherein the barrier is applied to a top of the component. 18. The method of claim 17 , wherein the infiltrant source is disposed on the component. 19. The method of claim 18 , wherein the barrier is in contact with a wick disposed on the component, the barrier being between the infiltrant source and the wick. 20. The method of claim 1 , wherein the heating is carried out at a temperature between about 1400° C. and 1500° C.

Assignees

Inventors

Classifications

  • Carbon, e.g. graphite · CPC title

  • with inorganic materials · CPC title

  • Aspects linked to processes or compositions used in powder metallurgy · CPC title

  • Liquid infiltration of green bodies or pre-forms · CPC title

  • characterised by the material treated · CPC title

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Frequently asked questions

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What does patent US9884789B2 cover?
A method and apparatus for providing molten metal infiltration into a component is provided.
Who is the assignee on this patent?
Rolls Royce Nam Tech Inc
What technology area does this patent fall under?
Primary CPC classification C04B41/5177. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 06 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).