Methods of coating surfaces using initiated plasma-enhanced chemical vapor deposition

Patent metadata

Field	Value
Publication number	US-9884341-B2
Application number	US-201213571814-A
Country	US
Kind code	B2
Filing date	Aug 10, 2012
Priority date	Aug 12, 2011
Publication date	Feb 6, 2018
Grant date	Feb 6, 2018

Abstract

Disclosed is an organic coating with a high degree of global planarization. Further disclosed is an iPECVD-based method of coating a substrate with an organic layer having a high degree of global planarization. Disclosed is a flexible, alternating organic and inorganic multi-layer coating with low water permeability, a high-degree of transparency, and a high-degree of global planarization. Also disclosed is an iPECVD-based method of coating a substrate with the alternating organic and inorganic multi-layer coating.

First claim

What is claimed is:

1. A method of coating a substrate, comprising:
(a) introducing into a partially evacuated vessel containing the substrate a gaseous initiator at a first flow rate, and a first gaseous monomer at a second flow rate, thereby forming a first mixture;
(b) introducing energy from a microwave plasma power source into said first mixture at a first power, wherein the first power is about 10 W to about 100 W, thereby depositing a first layer on the substrate at a first deposition rate, wherein the first layer is organic;
(c) introducing into the vessel a first auxiliary gas at a third flow rate, and a second gaseous monomer at a fourth flow rate, thereby forming a second mixture; and
(d) introducing energy into said second mixture at a second power, wherein the second power is about 800 W to about 1000 W, thereby depositing a second layer over the first layer at a second deposition rate, wherein the second layer is inorganic, to form a multi-layered coating on the substrate;
wherein
the vessel further comprises a variable plasma source, a stage for holding the substrate, and the substrate positioned on said stage;
the first gaseous monomer is a siloxane;
the second gaseous monomer is a siloxane;
the gaseous initiator is selected from a group consisting of peroxides, aryl ketones, and alkyl azo compounds;
the first layer is deposited on the substrate by initiated plasma enhanced chemical vapor deposition (iPECVD); and
a pressure in the partially evacuated vessel is in the range of about 0.01 Torr to about 0.45 Torr.

2. The method of claim 1 , further comprising repeating steps (a)-(d), wherein the multi-layer coating comprises alternating organic and inorganic layers.

3. The method of claim 1 , wherein the number of layers of the multi-layered coating is from about 2 to about 8.

4. The method of claim 1 , wherein the first gaseous monomer is 1,3,5-trivinyl-1,1,3,5,5-pentamethyltrisiloxane or trivinyltrimethyl cyclotrisiloxane.

5. The method of claim 1 , wherein the second gaseous monomer is 1,3,5-trivinyl-1,1,3,5,5-pentamethyltrisiloxane or trivinyltrimethyl cyclotrisiloxane.

6. The method of claim 1 , wherein the gaseous initiator is a peroxide.

7. The method of claim 1 , wherein the pressure in the partially evacuated vessel is from about 0.05 Torr to about 0.4 Torr.

8. The method of claim 1 , wherein the first flow rate is from about 30 sccm to about 0.01 sccm.

9. The method of claim 1 , wherein the second flow rate is from about 30 sccm to about 0.01 sccm.

10. The method of claim 1 , wherein the third flow rate is from about 5 sccm to about 750 sccm.

11. The method of claim 1 , wherein the fourth flow rate is from about 30 sccm to about 0.01 sccm.

12. The method of claim 1 , further comprising adjusting a temperature of the stage.

13. The method of claim 1 , wherein the stage is moveable.

14. The method of claim 1 , further comprising discharging in timed pulses the energy introduced into the first mixture at the first power, thereby creating a duty cycle.

15. The method of claim 14 , wherein each of the timed pulses t ON , is from about 1 ns to about 10 s.

16. The method of claim 1 , wherein the first deposition rate is from about 1 nm/minute to about 100 nm/minute.

17. The method of claim 1 , wherein the second deposition rate is from about 1 nm/minute to about 100 nm/minute.

18. The method of claim 1 , wherein the energy introduced into said second mixture is from a microwave power source.

19. The method of claim 1 , wherein the first gaseous monomer is 1,3,5-trivinyl-1,1,3,5,5-pentamethyltrisiloxane.

20. The method of claim 1 , wherein the second gaseous monomer is 1,3,5-trivinyl-1,1,3,5,5-pentamethyltrisiloxane.

21. The method of claim 1 , wherein the gaseous initiator is tert-butyl peroxide (TBPO).

22. The method of claim 1 , wherein the first gaseous monomer is 1,3,5-trivinyl-1,1,3,5,5-pentamethyltrisiloxane; the second gaseous monomer is 1,3,5-trivinyl-1,1,3,5,5-pentamethyltrisiloxane; and the gaseous initiator is tert-butyl peroxide (TBPO).

23. The method of claim 1 , further comprising discharging in timed pulses the energy introduced into the second mixture at the second power, thereby creating a duty cycle.

24. The method of claim 23 , wherein each of the timed pulses, t ON , is from about 1 ns to about 10 s.

Assignees

• Gleason Karen K
• Coclite Anna M
• Massachusetts Inst Technology

Inventors

• Gleason Karen K
• Coclite Anna M

Classifications

• B05D1/62 Primary

  Plasma-deposition of organic layers (plasma deposition in general C23C14/00, C23C16/00) · CPC title

• Y10T428/24355

  Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.] · CPC title

• B05D7/52

  Two layers · CPC title