Substrates having voltage switchable dielectric materials
US-9226391-B2 · Dec 29, 2015 · US
US9881116B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9881116-B2 |
| Application number | US-201615152679-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 12, 2016 |
| Priority date | Nov 30, 2015 |
| Publication date | Jan 30, 2018 |
| Grant date | Jan 30, 2018 |
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A restricted region transform method and a restricted region transform device are disclosed. The method includes following steps: reading out bare board information of a printed circuit board and layout information of a plurality of components, wherein the layout information of the plurality of components corresponds to a plurality of physical restricted regions; setting a first region according to edge information in the bare board information; setting a plurality of second regions according to projections of the plurality of physical restricted regions on a surface of the printed circuit board; selecting every two second regions, which overlap each other, among the plurality of second regions, and the selected second regions constituting a restriction conflict set; and selectively amending the second regions in the restriction conflict set to remove one or more overlaps from the second regions in the restriction conflict set.
Opening claim text (preview).
What is claimed is: 1. A restricted region transform method, comprising: reading out bare board information of a printed circuit board and layout information of a plurality of components, wherein the layout information of the plurality of components corresponds to a plurality of physical restricted regions; setting a first region according to edge information in the bare board information; setting a plurality of second regions according to projections of the plurality of physical restricted regions on a surface of the printed circuit board; selecting overlapped second regions of the plurality of second regions and setting the selected second regions as a restriction conflict set; and selectively amending the second regions in the restriction conflict set to remove one or more overlaps between the second regions in the restriction conflict set. 2. The restricted region transform method according to claim 1 , wherein selectively amending the second regions in the restriction conflict set to remove the one or more overlaps between the second regions in the restriction conflict set comprises repeating steps of: selecting a first conflict region from the second regions in the restriction conflict set and selecting at least one second conflict region in the first conflict region; amending a regional edge of the first conflict region to become an inwardly-shrunk edge, which comprises an outer edge, an inner edge and a bridge edge connecting the outer edge to the inner edge, wherein the outer edge is a part of the regional edge of the first conflict region that has not been amended, and the inner edge is next to and is outside a regional edge of the at least one second conflict region; and removing the first conflict region that is amended, from the restriction conflict set. 3. The restricted region transform method according to claim 2 , wherein in the first conflict region, the at least one second conflict region is smaller than the first conflict region merely. 4. The restricted region transform method according to claim 3 , wherein the regional edge of the first conflict region does not interact with the regional edge of the at least one second conflict region. 5. The restricted region transform method according to claim 4 , wherein when an amount of the at least one second conflict region is more than one, the second conflict regions are separated from each other. 6. The restricted region transform method according to claim 4 , wherein when an amount of the at least one second conflict region is more than one, the regional edges of the second conflict regions have a junction therebetween. 7. The restricted region transform method according to claim 1 , wherein after the second regions in the restriction conflict set are selectively amended to remove the one or more overlaps between the second regions in the restriction conflict set, the restricted region transform method further comprises: combining the first region and the plurality of second regions into an ECAD restricted region. 8. A restricted region transform device, comprising: an information capturing module configured to read out bare board information of a printed circuit board and layout information of a plurality of components, wherein the layout information of the plurality of components corresponds to a plurality of physical restricted regions; a region setting module coupled to the information capturing module and configured to set a first region according to edge information in the bare board information and set a plurality of second regions according to projections of the plurality of physical restricted regions on a surface of the printed circuit board; and a conflict resolution module coupled to the region setting module and configured to select overlapped second regions of the plurality of second regions and set the selected second regions as a restriction conflict set, and configured to selectively amend the second regions in the restriction conflict set to remove one or more overlaps between the second regions in the restriction conflict set. 9. The restricted region transform device according to claim 8 , wherein the conflict resolution module repeats steps of selecting a first conflict region from the second regions in the restriction conflict set and at least one second conflict region from the first conflict region, amending a regional edge of the first conflict region to become an inwardly-shrunk edge, and removing the first conflict region that is amended, from the restriction conflict set; and wherein the inwardly-shrunk edge comprises an outer edge, an inner edge and a bridge edge connecting the outer edge to the inner edge, the outer edge is a part of the regional edge of the first conflict region that has not been amended, and the inner edge is next to and is outside a regional edge of the at least one second conflict region. 10. The restricted region transform device according to claim 9 , wherein in the first conflict region, the at least one second conflict region is smaller than the first conflict region merely.
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