Method for creating a component

US9880522B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9880522-B2
Application numberUS-201214367655-A
CountryUS
Kind codeB2
Filing dateDec 20, 2012
Priority dateDec 22, 2011
Publication dateJan 30, 2018
Grant dateJan 30, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for manufacturing a component in a substrate including: a) modifying a structure of at least one region of the substrate to make the at least one region more selective; and b) chemically etching the at least one region to selectively manufacture the component.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for manufacturing a timepiece component in a substrate, the method comprising: a) modifying a structure of at least one region of the substrate in order to increase an etching selectivity of said at least one region relative to another unmodified region of the substrate, said at least one region being underneath a surface of the substrate; and b) chemically etching said at least one region selectively, forming at least one recess, at least one reservoir, and at least one laterally closed channel in said at least one region of the substrate, the at least one recess being in fluid communication with the at least one reservoir via the at least one laterally closed channel, and the at least one reservoir being disposed at a portion of said at least one region that is deeper underneath the surface than a deepest portion of the at least one recess underneath the surface. 2. The manufacturing method according to claim 1 , the method further comprising: c) releasing the timepiece component from said substrate. 3. The manufacturing method according to claim 1 , wherein the structure of said at least one region is modified by a laser. 4. The manufacturing method according to claim 3 , wherein the substrate is made of a material transparent to the laser wavelength. 5. The manufacturing method according to claim 4 , wherein a pulse duration of the laser ranges from a femtosecond to a picosecond. 6. The manufacturing method according to claim 4 , wherein the substrate is made of single crystal material. 7. The manufacturing method according to claim 4 , wherein the substrate is made of polycrystalline material. 8. The manufacturing method according to claim 4 , wherein the substrate is made of polymer. 9. The manufacturing method according to claim 4 , wherein the substrate is made of an amorphous material or a ceramic or glass. 10. The manufacturing method according to claim 1 , wherein the timepiece component is a timepiece bearing. 11. The manufacturing method according to claim 10 , wherein the substrate includes a blind hole made prior to the structure modifying. 12. The manufacturing method according to claim 11 , wherein said at least one recess is part of the at least one reservoir and is configured to store a lubricant, said at least one recess extending at least from a surface of the blind hole. 13. The manufacturing method according to claim 12 , wherein said at least one recess is part of the at least one laterally closed channel, said channel connecting said at least one reservoir to said blind hole. 14. The manufacturing method according to claim 10 , wherein said bearing further includes said at least one recess. 15. The manufacturing method according to claim 14 , wherein said at least one recess includes a blind hole. 16. The manufacturing method according to claim 14 , wherein said at least one recess is part of the at least one reservoir and is configured to store a lubricant, said at least one recess extending at least from a surface of the blind hole. 17. The manufacturing method according to claim 16 , wherein said at least one recess is part of the at least one laterally closed channel, said channel connecting said at least one reservoir to said blind hole. 18. The method according to claim 14 , wherein said at least one recess is used to form an elastic structure. 19. The method according to claim 18 , wherein said elastic structure includes a central portion arranged so that a pivot-shank of an arbour can be inserted therein and at least one elastic arm extending from said central portion. 20. A timepiece component arranged to cooperate with an arbour, said component comprising: a hole into which a pivot-shank of said arbour is inserted; and at least one recess extending into said component from at least one surface of the hole, the at least one recess including at least one reservoir and at least one laterally closed channel, the at least one recess being in fluid communication with the at least one reservoir via the at least one laterally closed channel, and the at least one reservoir being disposed deeper underneath the at least one surface of the hole than a deepest portion of the hole into which the pivot-shank of said arbour is inserted. 21. The timepiece component according to claim 20 , wherein said at least one reservoir is configured to contain a liquid. 22. The timepiece component according to claim 21 , wherein said at least one laterally closed channel connects said at least one reservoir to said hole. 23. The timepiece component according to claim 22 , wherein the at least one recess includes at least two recesses, one of the at least two recesses includes the at least one reservoir configured to contain a liquid and another of the at least two recesses extends so as to form an elastic structure. 24. The timepiece component according to claim 21 , wherein the at least one recess includes at least two recesses, one of the at least two recesses includes the at least one reservoir configured to contain a liquid and another of the at least two recesses extends so as to form an elastic structure. 25. The timepiece component according to claim 20 , wherein said at least one recess extends so as to form an elastic structure. 26. The timepiece component according to claim 25 , wherein the at least one recess includes at least two recesses, one of the at least two recesses includes the at least one reservoir configured to contain a liquid and another of the at least two recesses forms the elastic structure. 27. The timepiece component according to claim 20 , wherein the at least one recess includes at least two recesses, one of the at least two recesses includes the at least one reservoir configured to contain a liquid and another of the at least two recesses extends so as to form an elastic structure.

Assignees

Inventors

Classifications

  • Lubrication {(self-lubricated plastic bearings G04B31/016; lubrication of the escape wheel G04B15/14; lubrication of synchronous clockworks G04C15/009; lubrication devices and lubricant containers G04D5/00)} · CPC title

  • G04B31/06Primary

    Manufacture or mounting processes · CPC title

  • Shock-damping bearings {(shock damping in the case G04B37/052, G04B37/055, G04B37/0418)} · CPC title

  • characterised by the material used · CPC title

  • Component parts or constructional details, e.g. construction of the lever or the escape wheel {(assembly and manufacture of the spring G04B1/145; assembly and manufacture of components, e.g. pinions, spindles G04B13/02; lubrication of clockwork bearings G04B31/008; oils for clockwork bearings in general G04B31/08)} · CPC title

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What does patent US9880522B2 cover?
A method for manufacturing a component in a substrate including: a) modifying a structure of at least one region of the substrate to make the at least one region more selective; and b) chemically etching the at least one region to selectively manufacture the component.
Who is the assignee on this patent?
Swatch Group Res & Dev Ltd, Swatch Group Res & Dev Ltd
What technology area does this patent fall under?
Primary CPC classification G04B31/06. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jan 30 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).