Resins for underlayers

US9880469B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9880469-B2
Application numberUS-201514792968-A
CountryUS
Kind codeB2
Filing dateJul 7, 2015
Priority dateJul 15, 2014
Publication dateJan 30, 2018
Grant dateJan 30, 2018

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  1. Title

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  2. Abstract

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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Polymeric reaction products of certain substituted tetraarylmethane monomers are useful as underlayers in semiconductor manufacturing processes.

First claim

Opening claim text (preview).

What is claimed is: 1. A polymeric reaction product comprising polymerized units of one or more tetraaryl monomers of formula (1) and one or more monomers chosen from formulae (2) and (3): wherein AG represents an activating group chosen from OR, NR 2 , and SR; Ar 1 , Ar 2 , Ar 3 and Ar 4 independently represent an aryl moiety; R is independently H, an optionally substituted C 1-30 alkyl, an optionally substituted C 2-30 alkenyl moiety, an optionally substituted C 2-30 alkynyl moiety, an optionally substituted C 7-30 aralkyl moiety, or an optionally substituted C 6-20 aryl moiety; R 1 , R 2 , R 3 , and R 4 are independently an optionally substituted C 1-30 alkyl, an optionally substituted C 2-30 alkenyl moiety, an optionally substituted C 2-30 alkynyl moiety, an optionally substituted C 7-30 aralkyl moiety, or an optionally substituted C 6-20 aryl moiety; a is an integer from 0 to 4; b, c, and d are independently integers from 0 to 5; R 5 is selected from the group consisting of H, optionally substituted C 1-60 aliphatic moiety, and optionally substituted C 5-60 aryl moiety; Ar 5 is an optionally substituted C 5-60 aryl moiety, each R 6 is independently chosen from H, optionally substituted C 1-60 aliphatic moiety, and optionally substituted C 5-60 aryl moiety, and X is OH, C 1-2 alkoxy group or a halogen; wherein at least one of Ar 1 , Ar 2 , Ar 3 and Ar 4 is an aryl moiety having 2 or more fused aromatic rings, and wherein none of Ar 1 , Ar 2 , Ar 3 and Ar 4 are taken together along with the carbon to which they are attached to form a 5 or 6-membered fused alicyclic ring. 2. The polymeric reaction product of claim 1 wherein AG is OR. 3. The polymeric reaction product of claim 1 wherein Ar 1 , Ar 2 , Ar 3 and Ar 4 are independently chosen from phenyl, biphenyl, naphthalenyl, anthracenyl, phenanthrenyl, pyrenyl, tetracenyl, triphenylenyl, tetraphenyl, benzo[f]tetraphenyl, benzo[m]tetraphenyl, benzo[k]tetraphenyl, pentacenyl, perylenyl, benzo[a]pyrenyl, benzo[e]pyrenyl, benzo[ghi]perylenyl, coronenyl, quinolonyl, 7,8-benzoquinolinyl, fluorenyl, chrysenyl, triphenylenyl, and 12H-dibenzo[b,h]fluorenyl. 4. A composition comprising the polymeric reaction product of claim 1 , an organic solvent, and optionally one or more additives chosen from curing agents and surfactants. 5. The composition of claim 4 wherein the curing agent is an acid or a thermal acid generator. 6. A method of forming a patterned layer comprising disposing a layer of the composition of claim 4 on a substrate; removing organic solvent to form a polymeric underlayer; disposing a layer of a photoresist on the polymeric underlayer; exposing the photoresist layer to actinic radiation through a mask; developing the exposed photoresist layer to form a resist pattern; and transferring the pattern to the polymeric underlayer to expose portions of the substrate. 7. A tetraaryl methane monomer having the formula (1) wherein AG represents an activating group chosen from OR, NR 2 , and SR; Ar 1 , Ar 2 , Ar 3 and Ar 4 independently represent an aryl moiety; R is independently H, an optionally substituted C 1-30 alkyl, an optionally substituted C 2-30 alkenyl moiety, an optionally substituted C 2-30 alkynyl moiety, an optionally substituted C 7-30 aralkyl moiety, or an optionally substituted C 6-20 aryl moiety; R 1 , R 2 , R 3 , and R 4 are independently an optionally substituted C 1-30 alkyl, an optionally substituted C 2-30 alkenyl moiety, an optionally substituted C 2-30 alkynyl moiety, an optionally substituted C 7-30 aralkyl moiety, or an optionally substituted C 6-20 aryl moiety; a is an integer from 0 to 4; and b, c, and d are independently integers from 0 to 5; wherein at least one of Ar 1 , Ar 2 , Ar 3 and Ar 4 is an aryl moiety having 2 or more fused aromatic rings, and wherein none of Ar 1 , Ar 2 , Ar 3 and Ar 4 are taken together along with the carbon to which they are attached to form a 5 or 6-membered fused alicyclic ring; wherein when AG is OR, R is not a H atom, and wherein when AG is NR 2 and one R is a H atom, the other R is not a C 6 aryl moiety. 8. A tetraaryl monomer having the general formula (1-2): AG represents an activating group chosen from OR, NR2, and SR; Ar 1 , Ar 2 , Ar 3 and Ar 4 independently represent an aryl moiety; R is independently H, an optionally substituted C 1-30 alkyl, an optionally substituted C 2-30 alkenyl moiety, an optionally substituted C 2-30 alkynyl moiety, an optionally substituted C 7-30 aralkyl moiety, or an optionally substituted C 6-20 aryl moiety; R 1 , R 2 , R 3 , and R 4 are independently an optionally substituted C 1-30 alkyl, an optionally substituted C 2-30 alkenyl moiety, an optionally substituted C 2-30 alkynyl moiety, an optionally substituted C 7-30 aralkyl moiety, or an optionally substituted C 6-20 aryl moiety; any 2 of Ar 1 , Ar 2 , Ar 3 and Ar 4 may be taken together along with the carbon to which they are attached to form a 5 or 6-membered fused alicyclic ring; a is an integer from 0 to 4; b is an integer from 0 to 5; and c″ and d″ are independently integers from 0 to 4; wherein when AG is NR 2 , the two groups are nor aryl moieties simultaneously. 9. A polymeric reaction product comprising polymerized units of one or more tetraaryl monomers of claim 8 and one or more monomers chosen from formulae (2) and (3): wherein R 5 is selected from the group consisting of H, optionally substituted C 1-60 aliphatic moiety, and optionally substituted C 5-60 aryl moiety; Ar 5 is an optionally substituted C 5-60 aryl moiety; each R 6 is independently selected from the group consisting of H, optionally substituted C 1-60 aliphatic moiety, and optionally substituted C 5-60 aryl moiety; and X is OH, C 1-2 alkoxy group or a halogen. 10. A composition comprising the polymeric reaction product of claim 9 , an organic solvent, and optionally one or more additives chosen from curing agents and surfactants. 11. A method of forming a patterned layer comprising disposing a layer of the composition of claim 10 on a substrate; removing organic solvent to form a polymeric underlayer; disposing a layer of a photoresist on the polymeric underlayer; exposing the photoresist layer to actinic radiation through a mask; developing the exposed photoresist layer to form a resist pattern; and transferring the pattern to the polymeric underlayer to expose portions of the substrate. 12. A polymer comprising a repeat unit of formula (4) wherein AG represents an activating group chosen from OR, NR 2 , and SR; Ar 1 , Ar 2 , Ar 3 and Ar 4 independently represent an aryl moiety; R is independently H, an optionally substituted C 1-30 alkyl, an optionally substituted C 2-30 alkenyl moiety, an optionally substituted C 2-30 alkynyl moiety, an optionally substituted C 7-30 aralkyl moiety, or an optionally substituted C 6-20 aryl moiety; R 1 , R 2 , R 3 , and R 4 are independently an optionally substituted C 1-30 alkyl, an optionally substituted C 2-30 alkenyl moiety, an optionally substituted C 2-30 a

Assignees

Inventors

Classifications

  • containing other rings in addition to the six-membered aromatic rings {, e.g. cyclohexylphenol} · CPC title

  • Fluorenes; Hydrogenated fluorenes · CPC title

  • G03F7/094Primary

    Multilayer resist systems, e.g. planarising layers · CPC title

  • containing five condensed rings · CPC title

  • Anthracenes; Hydrogenated anthracenes · CPC title

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What does patent US9880469B2 cover?
Polymeric reaction products of certain substituted tetraarylmethane monomers are useful as underlayers in semiconductor manufacturing processes.
Who is the assignee on this patent?
Rohm & Haas Elect Mat, Rohm & Haas Elect Materials Korea Ltd, Rohm & Haas Elect Materials Korea Ltd
What technology area does this patent fall under?
Primary CPC classification G03F7/094. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jan 30 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).