Photoelectric conversion device, method for manufacturing photoelectric conversion device, and electronic apparatus

US9876049B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9876049-B2
Application numberUS-201514950327-A
CountryUS
Kind codeB2
Filing dateNov 24, 2015
Priority dateDec 5, 2014
Publication dateJan 23, 2018
Grant dateJan 23, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

An image sensor as a photoelectric conversion device includes: a lower electrode containing a high-melting-point metal; an upper electrode disposed in a layer higher than the lower electrode; a p-type semiconductor layer and an n-type semiconductor layer disposed between the lower electrode and the upper electrode; and a relay electrode containing the high-melting-point metal. The lower electrode and the relay electrode are formed in the same layer. An intermediate layer as a selenized film of the high-melting-point metal is formed on the lower electrode.

First claim

Opening claim text (preview).

What is claimed is: 1. A photoelectric conversion device comprising: a first electrode containing a first metal; a second electrode disposed in a layer higher than the first electrode; a semiconductor layer disposed between the first electrode and the second electrode; and a third electrode containing the first metal, wherein the first electrode and the third electrode are formed in the same layer, and a selenized film of the first metal is formed directly on the first electrode, wherein an insulating layer and a protective layer are located between the first electrode and the second electrode, the protective layer being formed from a material including silicon, and wherein a layer thickness of the first electrode is thinner than a layer thickness of the third electrode. 2. The photoelectric conversion device according to claim 1 , wherein an insulating layer including an opening is formed on the first electrode and the third electrode, and the selenized film is disposed in a region overlapping the opening in a plan view. 3. An electronic apparatus comprising: the photoelectric conversion device according to claim 2 ; and a light-emitting device stacked on the photoelectric conversion device. 4. The photoelectric conversion device according to claim 1 , wherein a metal oxide layer including an opening is formed on the first electrode and the third electrode, and the selenized film is disposed in a region overlapping the opening in a plan view. 5. An electronic apparatus comprising: the photoelectric conversion device according to claim 4 ; and a light-emitting device stacked on the photoelectric conversion device. 6. The photoelectric conversion device according to claim 1 , wherein the second electrode and the third electrode are electrically connected. 7. The photoelectric conversion device according to claim 6 , further comprising a transistor, wherein the third electrode is electrically connected to a gate electrode of the transistor. 8. An electronic apparatus comprising: the photoelectric conversion device according to claim 7 ; and a light-emitting device stacked on the photoelectric conversion device. 9. An electronic apparatus comprising: the photoelectric conversion device according to claim 6 ; and a light-emitting device stacked on the photoelectric conversion device. 10. The photoelectric conversion device according to claim 1 , wherein the semiconductor layer includes a semiconductor film with chalcopyrite structure. 11. An electronic apparatus comprising: the photoelectric conversion device according to claim 10 ; and a light-emitting device stacked on the photoelectric conversion device. 12. An electronic apparatus comprising: the photoelectric conversion device according to claim 1 ; and a light-emitting device stacked on the photoelectric conversion device.

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What does patent US9876049B2 cover?
An image sensor as a photoelectric conversion device includes: a lower electrode containing a high-melting-point metal; an upper electrode disposed in a layer higher than the lower electrode; a p-type semiconductor layer and an n-type semiconductor layer disposed between the lower electrode and the upper electrode; and a relay electrode containing the high-melting-point metal. The lower electro…
Who is the assignee on this patent?
Seiko Epson Corp
What technology area does this patent fall under?
Primary CPC classification H01L27/14649. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 23 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).