Polymer, organic layer composition, and method of forming patterns

Patent metadata

Field	Value
Publication number	US-9873815-B2
Application number	US-201615062233-A
Country	US
Kind code	B2
Filing date	Mar 7, 2016
Priority date	Apr 30, 2015
Publication date	Jan 23, 2018
Grant date	Jan 23, 2018

Abstract

A polymer includes a first moiety represented by Chemical Formula 1, and a second moiety including a substituted or unsubstituted C6 to C60 cyclic group, a substituted or unsubstituted C6 to C60 hetero cyclic group, or a combination thereof:

In Chemical Formula 1, X is phosphorus (P), nitrogen (N), boron (B), or P═O, Y1 and Y2 are independently hydrogen or a moiety including at least one substituted or unsubstituted benzene ring, provided that at least one of Y1 and Y2 is the moiety including at least one substituted or unsubstituted benzene ring, Y3 is another moiety including at least one substituted or unsubstituted benzene ring, and * is a linking point.

First claim

What is claimed is:

1. A polymer, comprising:
a first moiety represented by Chemical Formula 1, and
a second moiety including a substituted or unsubstituted C6 to C60 cyclic group, a substituted or unsubstituted C6 to C60 hetero cyclic group, or a combination thereof:

wherein, in Chemical Formula 1,
the *s are linking points of C in a main chain of the polymer,
Y 3 —X—Y 1 Y 2 together form a pendant group from C,
X is phosphorus (P), nitrogen (N), boron (B), or P═O,
Y 1 and Y 2 are independently hydrogen or a moiety including at least one substituted or unsubstituted benzene ring, provided that at least one of Y 1 and Y 2 is the moiety including at least one substituted or unsubstituted benzene ring, and
Y 3 is another moiety including at least one substituted or unsubstituted benzene ring, and
wherein linking points of the second moiety in the main chain of the polymer extend from ring carbons of the second moiety, wherein the first moiety and the second moiety are linked to form a subunit such that the polymer is represented by one of Chemical Formulae 2 to 6:

wherein, in Chemical Formulae 2 to 6,
the *s are linking points of the subunit in the main chain of the polymer,
X is phosphorus (P), nitrogen (N), boron (B), or P═O,
Z 31 to Z 34 are independently C═O, oxygen (O), sulfur (S), CR b R c , NR d , or a combination thereof, wherein R b to R d are independently hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a halogen atom, or a combination thereof,
R 4 to R 8 are independently a hydroxy group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a halogen atom, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C1 to C30 alkoxy group, or a combination thereof, and
n is an integer ranging from 2 to 200.

2. An organic layer composition comprising:
a polymer that includes:
a first moiety represented by Chemical Formula 1, and
a second moiety including a substituted or unsubstituted C6 to C60 cyclic group, a substituted or unsubstituted C6 to C60 hetero cyclic group, or a combination thereof:

wherein, in Chemical Formula 1,
the *s are linking points of C in a main chain of the polymer,
Y 3 —X—Y 1 Y 2 together form a pendant group from C,
X is phosphorus (P), nitrogen (N), boron (B), or P═O,
Y 1 and Y 2 are independently hydrogen or a moiety including at least one substituted or unsubstituted benzene ring, provided that at least one of Y 1 and Y 2 is the moiety including at least one substituted or unsubstituted benzene ring, and
Y 3 is another moiety including at least one substituted or unsubstituted benzene ring, and
wherein linking points of the second moiety in the main chain of the polymer extend from ring carbons of the second moiety; and

a solvent,
wherein the first moiety and the second moiety are linked to form a subunit such that the polymer is represented by one of Chemical Formulae 2 to 6:

wherein, in Chemical Formulae 2 to 6,
the *s are linking points of the subunit in the main chain of the polymer,
X is phosphorus (P), nitrogen (N), boron (B), or P═O,
Z 31 to Z 34 are independently C═O, oxygen (O), sulfur (S), CR b R c , NR d , or a combination thereof, wherein R b to R d are independently hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a halogen atom, or a combination thereof,
R 4 to R 8 are independently a hydroxy group, a thionyl group, a thiol group, a cyano group, a substituted or unsubstituted amino group, a halogen atom, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C1 to C30 alkoxy group, or a combination thereof, and
n is an integer ranging from 2 to 200.

3. A method of forming a pattern, the method comprising providing a material layer on a substrate,
applying an organic layer composition on the material layer,
heat-treating the organic layer composition to provide a hardmask layer,
providing a silicon-containing thin layer on the hardmask layer,
providing a photoresist layer on the silicon-containing thin layer,
exposing and developing the photoresist layer to form a photoresist pattern,
selectively removing the silicon-containing thin layer and the hardmask layer using the photoresist pattern to expose a part of the material layer, and
etching an exposed part of the material layer to form the pattern, wherein:
the organic layer composition includes:
a polymer that includes:
a first moiety represented by Chemical Formula 1, and
a second moiety including a substituted or unsubstituted C6 to C60 cyclic group, a substituted or unsubstituted C6 to C60 hetero cyclic group, or a combination thereof:

wherein, in Chemical Formula 1,
the *s are linking points of C in a main chain of the polymer,
Y 3 —X—Y 1 Y 2 together form a pendant group from C,
X is phosphorus (P), nitrogen (N), boron (B), or P═O,
Y 1 and Y 2 are independently hydrogen or a moiety including at least one substituted or unsubstituted benzene ring, provided that at least one of Y 1 and Y 2 is the moiety including at least one substituted or unsubstituted benzene ring, and
Y 3 is another moiety including at least one substituted or unsubstituted benzene ring, and
wherein linking points of the second moiety in the main chain of the polymer extend from ring carbons of the second moiety; and

a solvent.

4. The method as claimed in claim 3 , wherein the organic layer composition is applied using a spin-on coating method.

5. The method as claimed in claim 3 , which further comprises providing a bottom antireflective coating (BARC) before providing the photoresist layer.

Assignees

• Samsung Sdi Co Ltd

Inventors

• Mun Soohyoun
• Kwon Hyo Young
• Namgung Ran
• Nam Younhee
• SONG Hyunji

Classifications

• H10P76/405

  characterised by their composition, e.g. multilayer masks · CPC title

• C08G73/0672

  with only one nitrogen atom in the ring · CPC title

• C09D161/26

  of aldehydes with heterocyclic compounds · CPC title

• C08G12/26

  with heterocyclic compounds · CPC title

• G03F7/0752

  in non photosensitive layers or as additives, e.g. for dry lithography · CPC title