Extreme ultraviolet light generation device

US9872372B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9872372-B2
Application numberUS-201615379230-A
CountryUS
Kind codeB2
Filing dateDec 14, 2016
Priority dateJul 11, 2014
Publication dateJan 16, 2018
Grant dateJan 16, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit.

First claim

Opening claim text (preview).

The invention claimed is: 1. An extreme ultraviolet light generation device for generating extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma, comprising: a chamber; a magnet configured to form a magnetic field in the chamber; and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit, wherein the collision unit includes a plurality of collision surfaces disposed to be inclined with respect to the magnetic field. 2. The extreme ultraviolet light generation device according to claim 1 , further comprising a collector mirror configured to reflect extreme ultraviolet light generated in the chamber and thereby concentrate the extreme ultraviolet light, wherein the plurality of collision surfaces are disposed to be inclined toward an upstream side of the extreme ultraviolet light reflected by the collector mirror. 3. The extreme ultraviolet light generation device according to claim 1 , wherein the ion catcher includes a tubular member having a first end and a second end, the first end has an opening in a direction along the magnetic field, the collision unit is disposed between the first end and the second end, and the collision unit includes first and second collision units disposed near the first end and the second end, respectively. 4. The extreme ultraviolet light generation device according to claim 1 , wherein the ion catcher includes a tubular member having a first end and a second end, the first end has an opening in a direction along the magnetic field, the collision unit is disposed between the first end and the second end, and the ion catcher is configured to satisfy a relationship L/φ>3.55, where L is the length of the tubular member from the first end to the second end and φ is the maximum diameter of the opening of the tubular member. 5. The extreme ultraviolet light generation device according to claim 1 , wherein the ion catcher includes a tubular member having a first end and a second end, the first end has an opening in a direction along the magnetic field, the collision unit is disposed between the first end and the second end, and the tubular member has a polygonally-columnar shape. 6. The extreme ultraviolet light generation device according to claim 1 , wherein the ion catcher includes a tubular member having a first end and a second end, the first end has an opening in a direction along the magnetic field, the collision unit is disposed between the first end and the second end, the magnet is an electromagnet including a coil, and at least a part of the tubular member is disposed in a bore of the coil. 7. The extreme ultraviolet light generation device according to claim 1 , wherein the ion catcher includes a tubular member having a first end and a second end, the first end has an opening in a direction along the magnetic field, the collision unit is disposed between the first end and the second end, and at least a part of the tubular member is disposed to project outside from the chamber. 8. An extreme ultraviolet light generation device for generating extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma, comprising: a chamber; a magnet configured to form a magnetic field in the chamber; and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit; and an exhaust pump, wherein the ion catcher includes a tubular member having a first end and a second end, the first end has an opening in a direction along the magnetic field, the collision unit is disposed between the first end and the second end, and the exhaust pump is connected between the first end and the second end to exhaust gas out of the tubular member. 9. The extreme ultraviolet light generation device according to claim 8 , wherein the collision unit includes conical or polygonally-pyramidal surfaces. 10. The extreme ultraviolet light generation device according to claim 8 , wherein the collision unit includes first and second collision units disposed near the first end and the second end, respectively. 11. The extreme ultraviolet light generation device according to claim 8 , wherein the ion catcher is configured to satisfy a relationship L/φ>3.55, where L is the length of the tubular member from the first end to the second end and φ is the maximum diameter of the opening of the tubular member. 12. The extreme ultraviolet light generation device according to claim 8 , wherein the tubular member has a polygonally-columnar shape. 13. The extreme ultraviolet light generation device according to claim 8 , wherein the magnet is an electromagnet including a coil, and at least a part of the tubular member is disposed in a bore of the coil. 14. The extreme ultraviolet light generation device according to claim 8 , wherein at least a part of the tubular member is disposed to project outside from the chamber. 15. An extreme ultraviolet light generation device for generating extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma, comprising: a chamber; a magnet configured to form a magnetic field in the chamber; and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit, wherein the ion catcher includes a tubular member having a first end and a second end, the first end has an opening in a direction along the magnetic field, the collision unit is disposed between the first end and the second end, and the tubular member has a tapered shape. 16. The extreme ultraviolet light generation device according to claim 15 , wherein the collision unit includes first and second collision units disposed near the first end and the second end, respectively. 17. The extreme ultraviolet light generation device according to claim 15 , wherein the ion catcher is configured to satisfy a relationship L/φ>3.55, where L is the length of the tubular member from the first end to the second end and φ is the maximum diameter of the opening of the tubular member. 18. The extreme ultraviolet light generation device according to claim 15 , wherein the collision unit includes conical or polygonally-pyramidal surfaces. 19. The extreme ultraviolet light generation device according to claim 15 , wherein the magnet is an electromagnet including a coil, and at least a part of the tubular member is disposed in a bore of the coil. 20. The extreme ultraviolet light generation device according to claim 15 , wherein at least a part of the tubular member is disposed to project outside from the chamber.

Assignees

Inventors

Classifications

  • Auxiliary arrangements not involved in the plasma generation · CPC title

  • H05G2/007Primary

    involving electric or magnetic fields in the process of plasma generation · CPC title

  • using surface reflection, e.g. grazing incidence mirrors, gratings (multilayer mirrors G21K1/062) · CPC title

  • H05G2/008Primary

    involving an energy-carrying beam in the process of plasma generation · CPC title

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What does patent US9872372B2 cover?
An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collisio…
Who is the assignee on this patent?
Gigaphoton Inc
What technology area does this patent fall under?
Primary CPC classification H05G2/007. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 16 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).