Protecting a target pump interior with an ALD coating

US9869020B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9869020-B2
Application numberUS-201314783516-A
CountryUS
Kind codeB2
Filing dateApr 10, 2013
Priority dateApr 10, 2013
Publication dateJan 16, 2018
Grant dateJan 16, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An apparatus and method for protecting a target pump interior, where a target pump ( 10 ) inlet is provided with an inlet manifold ( 20 ) and a target pump outlet with an exhaust manifold ( 30 ). The target pump interior is exposed to sequential self-saturating surface reactions by sequential inlet of reactive gases according to an ALD method via the inlet manifold into the target pump interior and outlet of reaction residue via the exhaust manifold, while the target pump is kept running or not running. A technical effect of the invention is protecting a pump interior, which can be also an assembled pump interior, by a conformal protective coating.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for protecting a target pump interior, the method comprising: providing a target pump inlet with an inlet manifold and a target pump outlet with an exhaust line by attaching the inlet manifold to the target pump inlet and attaching the exhaust line to the target pump outlet; exposing the target pump interior to sequential self-saturating surface reactions by sequential inlet of reactive gases via the inlet manifold into the target pump interior and outlet of reaction residue via the exhaust line while the target pump is kept running; and detaching the inlet manifold from the target pump inlet and detaching the exhaust line from the target pump outlet. 2. The method of claim 1 , comprising pumping reaction residue and purge gas from the target pump interior by a vacuum pump attached to the exhaust line. 3. The method of claim 1 , comprising providing a required processing temperature by keeping the target pump running without using other heating means. 4. The method of claim 1 , wherein the inlet manifold comprises one or more in-feed lines with their controlling elements controlled by a computer-implemented control system. 5. The method of claim 1 , comprising forming a flow channel via target pumps placed in a row, and providing simultaneous protection of the interiors of the target pumps by using the flow channel. 6. The method of claim 5 , comprising forming the flow channel by attaching the exhaust line of a previous pump to a pump inlet of the following pump in the row. 7. The method of claim 1 , comprising exposing the target pump interior to sequential self-saturating surface reactions within a temperature range extending from ambient temperature to 150° C. 8. The method of claim 1 , wherein the target pump is a vacuum pump. 9. The method of claim 1 , wherein the method is implemented by a mobile pump protection apparatus comprising the inlet manifold and exhaust line. 10. A method for protecting a target pump interior, the method comprising: providing a target pump inlet with an inlet manifold and a target pump outlet with an exhaust line by attaching the inlet manifold to the target pump inlet and attaching the exhaust line to the target pump outlet; exposing the target pump interior to sequential self-saturating surface reactions by sequential inlet of reactive gases via the inlet manifold into the target pump interior and outlet of reaction residue via the exhaust line while the target pump is not running; and detaching the inlet manifold from the target pump inlet and detaching the exhaust line from the target pump outlet. 11. An apparatus for protecting a target pump interior, comprising: an inlet manifold designed to be attached to a target pump inlet; and an exhaust line designed to be attached to a target pump outlet, the apparatus, when being used, carrying out the method as defined in claim 1 . 12. The apparatus of claim 11 , wherein the apparatus, when being used, is configured to expose the target pump interior to sequential self-saturating surface reactions by sequential inlet of reactive gases via the inlet manifold into the target pump interior and outlet of reaction residue via the exhaust line while the target pump is kept running. 13. The apparatus of claim 11 , wherein the inlet manifold comprises precursor vapor and purge gas in-feed lines and their controlling elements. 14. The apparatus of claim 11 , wherein the exhaust line comprises a vacuum pump. 15. The apparatus of claim 11 , wherein the inlet manifold comprises a target pump-specific attachment part configured to attach the inlet manifold into the target pump inlet. 16. The apparatus of claim 11 , wherein the apparatus is mobile.

Assignees

Inventors

Classifications

  • applied in non-semiconductor technology · CPC title

  • Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title

  • Coating · CPC title

  • Coating · CPC title

  • C23C16/045Primary

    Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates · CPC title

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What does patent US9869020B2 cover?
An apparatus and method for protecting a target pump interior, where a target pump ( 10 ) inlet is provided with an inlet manifold ( 20 ) and a target pump outlet with an exhaust manifold ( 30 ). The target pump interior is exposed to sequential self-saturating surface reactions by sequential inlet of reactive gases according to an ALD method via the inlet manifold into the target pump interior…
Who is the assignee on this patent?
Picosun Oy
What technology area does this patent fall under?
Primary CPC classification C23C16/045. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 16 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).