System and method for treating water systems with high voltage discharge and ozone

US9868653B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9868653-B2
Application numberUS-201414260605-A
CountryUS
Kind codeB2
Filing dateApr 24, 2014
Priority dateMay 1, 2013
Publication dateJan 16, 2018
Grant dateJan 16, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. The system and method protect other components of the water system from being damaged by excess energy from the electrohydraulic treatment. The system and method also recycle ozone gas generated by a high voltage generator that powers the plasma discharge to further treat the water. A gas infusion system upstream of or inside a plasma reaction chamber may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation.

First claim

Opening claim text (preview).

What is claimed is: 1. A treatment system for treating water in a recirculating water system with a plasma discharge, the treatment system comprising: a reaction chamber comprising an inlet in fluid communication with part of the water system and configured to receive at least a portion of water from the recirculating water system, an outlet in fluid communication with part of the recirculating water system and configured to return the portion of water back to the recirculating water system, a body, a high voltage electrode, and a ground electrode; a gas infusion system disposed upstream of the inlet or within the body of the reaction chamber; a high voltage generator connected to the high voltage electrode; one or more grounding devices or electromagnetic interference suppressors connected to one or more components of the recirculating water system; wherein at least a part of the high voltage electrode is configured to contact the water in the body of the reaction chamber while voltage is transmitted from the high voltage generator to generate a plasma discharge in the water; and wherein a conductivity level of the water in the recirculating water system increases as it recirculates and the gas infusion system is configured to begin supplying or increase an amount of gas supplied into the reaction chamber to generate the plasma discharge in the water as the conductivity level increases. 2. The treatment system of claim 1 wherein the gas infusion system comprises one or more of a micro-bubbler, a venturi, a hydrodynamic cavitation system, or sonicating probes. 3. The treatment system of claim 1 further comprising a timer or other controller to periodically activate and deactivate the high voltage generator. 4. The treatment system of claim 1 wherein the high voltage generator comprises a zero volt switching circuit and a Marx generator and generates 200 kv or more for each discharge. 5. The treatment system of claim 4 wherein the plasma discharge is an arc discharge. 6. A treatment system for treating water in a water system with a plasma discharge, the treatment system comprising: a reaction chamber comprising an inlet in fluid communication with part of the water system and configured to receive at least a portion of water from the water system, an outlet in fluid communication with part of the water system and configured to return the portion of water back to the water system, a body, a high voltage electrode, and a ground electrode; a gas infusion system disposed upstream of the inlet or within the body of the reaction chamber; a high voltage generator connected to the high voltage electrode; an isolation transformer or uninterruptable power supply connected to the high voltage generator; a housing around the high voltage generator for capturing ozone gas produced by the high voltage generator and a conduit for directing the ozone gas to the gas infusion system. 7. A treatment system for treating water in a water system with a plasma discharge, the treatment system comprising: a reaction chamber comprising an inlet in fluid communication with part of the water system and configured to receive at least a portion of water from the water system, an outlet in fluid communication with part of the water system and configured to return the portion of water back to the water system, a body, a high voltage electrode, and a ground electrode; a gas infusion system disposed upstream of the inlet or within the body of the reaction chamber; a high voltage generator connected to the high voltage electrode; an isolation transformer or uninterruptable power supply connected to the high voltage generator; one or more grounding devices connected to one or more components of the water system; wherein the grounding device comprises at least one wire wrapped around a pipe in the water system and wherein the treatment system captures excess energy produced by a high voltage discharge from the high voltage generator to produce a current flow through the wire wrapped around the pipe to create a magnetic field in the water flowing through the pipe.

Assignees

Inventors

Classifications

  • Energy recovery · CPC title

  • Water in cooling circuits · CPC title

  • C02F1/4608Primary

    using electrical discharges · CPC title

  • with ozone {(C02F1/4672 takes precedence)} · CPC title

  • using high frequency electromagnetic fields, e.g. pulsed electromagnetic fields · CPC title

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Frequently asked questions

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What does patent US9868653B2 cover?
A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. The system and method protect other components of the water system from being damaged by excess energy from the electrohydraulic treatment. The system and method also recycle ozone gas generated by a high voltage generator that powers the plasma discharge to fur…
Who is the assignee on this patent?
Nch Corp
What technology area does this patent fall under?
Primary CPC classification C02F1/4608. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 16 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).