Extreme ultraviolet light source device

US9867267B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9867267-B2
Application numberUS-201514817762-A
CountryUS
Kind codeB2
Filing dateAug 4, 2015
Priority dateNov 17, 2014
Publication dateJan 9, 2018
Grant dateJan 9, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An extreme ultraviolet (EUV) light source device includes a source droplet generator for generating source droplets as a target source for generating extreme ultraviolet (EUV) light and for injecting the source droplets to a collector, a light irradiator for directing a detection light to an injection path of the source droplets, a light detector for detecting the detection light blocked by the source droplet, and a source droplet controller electrically connected to the light detector and the source droplet generator for analyzing the detection light to determine whether a satellite of the source droplet is generated or to determine a size of the generated satellite and for controlling a formation of a stream of source droplets based on the determination result.

First claim

Opening claim text (preview).

What is claimed is: 1. An extreme ultraviolet (EUV) light source device, comprising: a source droplet generator configured to generate source droplets as a target source for generating extreme ultraviolet (EUV) light and configured to inject the source droplets to a collector; a light irradiator configured to direct a detection light to an injection path of the source droplets; a light detector configured to detect the detection light blocked by a respective source droplet; and a source droplet controller connected to the light detector and the source droplet generator and configured to: analyze the detection light to determine whether a satellite of the source droplet is generated or to determine a size of the generated satellite; and control a formation of a stream of source droplets based on the determination of whether a satellite of the source droplet is generated or based on the determination of a size of the generated satellite, wherein the source droplet controller comprises: a signal analyzer configured to analyze a light signal wave of the detection light to generate a control signal; and a driving controller configured to provide the control signal to the source droplet generator, wherein the signal analyzer is configured to compare the light signal wave with a reference wave. 2. The EUV light source device of claim 1 , wherein the light detector is configured to generate the light signal wave from a signal of the detection light blocked by the source droplet. 3. The EUV light source device of claim 1 , wherein the light detector comprises a photodiode. 4. The EUV light source device of claim 1 , wherein the signal analyzer comprises an integrator configured to integrate the light signal wave to provide an integrated value and a differentiator configured to compare the integrated value and a reference value of the reference wave. 5. The EUV light source device of claim 1 , wherein the source droplet generator comprises: a fuel supply configured to supply a liquid fuel; a nozzle connected to the fuel supply through a fuel supply line and configured to eject source droplets; and an actuator configured to oscillate the fuel supply line at an oscillatory frequency to form the stream of source droplets ejected from the nozzle. 6. The EUV light source device of claim 1 , wherein the source droplet controller is configured to generate a control signal comprising control values with respect to an oscillation frequency, a gain value or an uptime related to forming conditions of the source droplets. 7. An extreme ultraviolet (EUV) light source device, comprising: a source droplet generator configured to generate source droplets as a target source for generating extreme ultraviolet (EUV) light and configured to inject the source droplets to a collector; a light irradiator configured to direct a detection light to an injection path of the source droplets; a light detector configured to detect the detection light blocked by a respective source droplet; and a source droplet controller connected to the light detector and the source droplet generator and configured to: analyze the detection light to determine whether a satellite of the source droplet is generated or to determine a size of the generated satellite; and control a formation of a stream of source droplets based on the determination of whether a satellite of the source droplet is generated or based on the determination of a size of the generated satellite, wherein the source droplet controller comprises: a signal analyzer configured to analyze a light signal wave of the detection light to generate a control signal; and a driving controller configured to provide the control signal to the source droplet generator, wherein the signal analyzer is configured to analyze a width of the light signal wave to determine a size of the source droplet. 8. The EUV light source device of claim 7 , wherein the width of the light signal wave is the full width at half maximum of the light signal wave. 9. An extreme ultraviolet (EUV) light source device, comprising: a collector configured to collect and reflect extreme ultraviolet (BUY) light; a source droplet generator configured to generate source droplets and to inject the source droplets to the collector; a light irradiator configured to direct a detection light to an injection path of the source droplets; a light detector configured to detect the detection light blocked by a respective source droplet; a drive laser configured to irradiate the source droplet injected to the collector with a laser light to generate the EUV light; and a source droplet controller connected to the light detector and the source droplet generator and configured to: analyze the detection light to determine whether a satellite of the source droplet is generated and, if so, to determine a size of the generated satellite; and control a formation of a stream of source droplets in response to determining whether a satellite of the source droplet is generated and, if so, in response to determining a size of the generated satellite. 10. The EUV light source device of claim 9 , wherein the light detector is configured to generate a light signal wave from a signal of the detection light blocked by the source droplet. 11. The EUV light source device of claim 10 , wherein the source droplet controller comprises a signal analyzer that is configured to compare the light signal wave with a reference wave. 12. The EUV light source device of claim 11 , wherein the signal analyzer comprises an integrator configured to integrate the light signal wave to provide an integrated value and a differentiator configured to compare the integrated value and a reference value of the reference wave. 13. The EUV light source device of claim 11 , wherein the signal analyzer is configured to analyze a width of a detected the light signal wave to determine a size of the source droplet. 14. The EUV light source device of claim 13 , wherein the width of the light signal wave is the full width at half maximum of the light signal wave. 15. The EUV light source device of claim 9 , wherein the source droplet generator comprises: a fuel supply configured to supply a liquid fuel; a nozzle connected to the fuel supply through a fuel supply line and configured to eject source droplets; and an actuator configured to oscillate the fuel supply line at an oscillatory frequency to form the stream of source droplets ejected from the nozzle. 16. The EUV light source device of claim 9 , wherein the source droplet controller is configured to generate a control signal comprising control values with respect to an oscillation frequency, a gain value or an uptime related to forming conditions of the source droplets. 17. The EUV light source device of claim 9 , wherein the source droplet comprises at least one element of xenon, lithium and tin. 18. The EUV light source device of claim 9 , wherein the collector includes an elliptical reflection surface having a first focus position within or near an irradiation site to which the laser light is focused. 19. The EUV light source device of claim 9 , wherein: the light detector is configured to generate a light signal wave from a signal of the detection light blocked by the source droplet; and the source droplet controller is configured to compare the light signal wave with a reference wave. 20. The EUV light source device of claim 9 , wherein: the light detector is configured to generate a light signal wave

Assignees

Inventors

Classifications

  • H05G2/0027Primary

    Arrangements for controlling the supply; Arrangements for measurements · CPC title

  • using one transmitter and one receiver · CPC title

  • involving an energy-carrying beam in the process of plasma generation · CPC title

  • the plasma being generated from a material in a liquid or gas state · CPC title

  • using ultrasonic {or other kinds of} vibrations · CPC title

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What does patent US9867267B2 cover?
An extreme ultraviolet (EUV) light source device includes a source droplet generator for generating source droplets as a target source for generating extreme ultraviolet (EUV) light and for injecting the source droplets to a collector, a light irradiator for directing a detection light to an injection path of the source droplets, a light detector for detecting the detection light blocked by the…
Who is the assignee on this patent?
Lee Seung-Koo, Kim In-Sung, Park Jin-Hong, and 1 more
What technology area does this patent fall under?
Primary CPC classification H05G2/0027. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 09 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).